Metal substrates including metal oxide nanoporous thin films and methods of making the same

Patent metadata

Field	Value
Publication number	US-10145629-B2
Application number	US-201514669820-A
Country	US
Kind code	B2
Filing date	Mar 26, 2015
Priority date	Jul 16, 2008
Publication date	Dec 4, 2018
Grant date	Dec 4, 2018

Abstract

The present disclosure is directed to a metal-containing apparatus including a substrate member constructed of a metal that is highly resistant to pitting corrosion and wear in aggressive media. An exemplary metal-containing apparatus is a plate heat exchanger. The metal includes an oxidation layer on the surface thereof and a thin metal oxide nanoporous film on top of the oxidation layer. The nanoporous film is highly compliant and is comprised of oxygen and aluminum, titanium, silicon, zirconium and combinations thereof.

First claim

We claim:

1. A metal-containing apparatus comprising:
a substrate member constructed of a metal;
an oxidized layer on a surface of the substrate member; and
a first nanoporous film comprising zirconium dioxide, the first nanoporous film being chemically bonded to the oxidized layer, the first nanoporous film having a thickness of less than about 1 micrometer and having a porosity of from about 26% to about 80%, and a second nanoporous film comprising zirconium dioxide and at least one metal oxide selected from the group consisting of γ-AlOOH, TiO 2 , SiO 2 , and combinations thereof, on top of the first nanoporous film.

2. The metal-containing apparatus of claim 1 wherein the second nanoporous film has a thickness of less than about 1 micrometer and a porosity of from about 26% to about 80%.

3. The metal-containing apparatus of claim 1 wherein the oxidized layer has a thickness of less than about 200 nanometers.

4. The metal-containing apparatus of claim 1 wherein the first nanoporous film has a thickness of from about 0.01 micrometers to about 1.0 micrometers.

5. The metal-containing apparatus of claim 1 wherein the first nanoporous film has a thickness of from about 200 nanometers to about 300 nanometers.

6. The metal-containing apparatus of claim 1 wherein the oxidized layer has a thickness of less than about 200 nanometers, the first nanoporous film has a thickness of from about 0.01 micrometers to about 1.0 micrometers, and the second nanoporous film has a thickness of from about 0.01 micrometers to about 1.0 micrometers.

7. The metal-containing apparatus of claim 1 wherein the metal is selected from the group consisting of stainless steel, reinforcing rebars, carbon steel, and aluminum.

Assignees

• Wisconsin Alumni Res Found
• Wisconson Alumni Res Foundation

Inventors

• Anderson Marc A
• Tejedor M Isabel
• Christensen Ole

Classifications

• C23C18/04

  Pretreatment of the material to be coated (C23C18/06 takes precedence) · CPC title

• C23F11/185

  Refractory metal-containing compounds · CPC title

• C23C18/1241

  Metallic substrates · CPC title

• C23C24/00

  Coating starting from inorganic powder (spraying of the coating material in molten state C23C4/00; solid state diffusion C23C8/00 - C23C12/00) · CPC title

• Y10T428/24926

  including ceramic, glass, porcelain or quartz layer · CPC title