Chip support substrate, chip support method, three-dimensional integrated circuit, assembly device, and fabrication method of three-dimensional integrated circuit
US-2015228622-A1 · Aug 13, 2015 · US
US10141287B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10141287-B2 |
| Application number | US-201515531194-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 14, 2015 |
| Priority date | Jul 14, 2015 |
| Publication date | Nov 27, 2018 |
| Grant date | Nov 27, 2018 |
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The present invention discloses a transferring method, a manufacturing method, a device and an electronic apparatus of micro-LED. The method for transferring micro-LED comprises: forming micro-LEDs on a laser-transparent original substrate, wherein the micro-LEDs are lateral micro-LEDs whose P electrodes and N electrodes are located on one side; bringing the P electrodes and N electrodes of the lateral micro-LEDs into contact with pads preset on a receiving substrate; and irradiating the original substrate with laser from the original substrate side to lift-off the lateral micro-LEDs from the original substrate. A technical effect of using lateral micro-LEDs lies in that the processing for N metal electrode after the micro-LED transfer can be omitted.
Opening claim text (preview).
What is claimed is: 1. A method for transferring micro-LED, comprising: forming micro-LEDs on a laser-transparent original substrate, wherein the micro-LEDs are lateral micro-LEDs whose P electrodes and N electrodes are located on one side; bringing the P electrodes and the N electrodes of the lateral micro-LEDs into contact with pads preset on a receiving substrate; and irradiating the original substrate with laser from an original substrate side to lift-off the lateral micro-LEDs from the original substrate; wherein the lateral micro-LEDs contain magnetic substance, and the P electrodes and the N electrodes of the lateral micro-LEDs are brought into contact with the pads preset on the receiving substrate by means of an action of electromagnetic force. 2. The method according to claim 1 , further comprising: providing an anisotropic conductive layer on the receiving substrate; wherein the P electrodes and the N electrodes of the lateral micro-LEDs are brought into contact with the pads preset on the receiving substrate via the anisotropic conductive layer; wherein the method further comprises: processing the anisotropic conductive layer, to electrically connect the P electrodes and the N electrodes of the lateral micro-LEDs with the pads on the receiving substrate. 3. The method according to claim 2 , wherein the anisotropic conductive layer is at least one of an anisotropic conductive film, an anisotropic conductive paste and an anisotropic conductive tape. 4. The method according to claim 1 , wherein the P electrodes and the N electrodes of the lateral micro-LEDs are brought into contact with the pads preset on the receiving substrate by means of an action of gravity. 5. The method according to claim 1 , wherein the P electrodes and the N electrodes of the lateral micro-LEDs are brought into contact with the pads preset on the receiving substrate by means of an action of electrostatic force. 6. The method according to claim 5 , wherein the electrostatic force is applied by applying voltage to the pads. 7. The method according to claim 1 , wherein the P electrodes and the N electrodes of the lateral micro-LEDs include solder bumps, and the method further comprises: bonding the solder bumps with the pads. 8. A method for manufacturing a micro-LED device, comprising transferring lateral micro-LEDs to a receiving substrate by using the method according to claim 1 . 9. A micro-LED device, which is manufactured by using the method according to claim 8 . 10. An electronic apparatus, containing a micro-LED device according to claim 9 .
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