Method for microwave processing of photosensitive polyimides

US10139728B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10139728-B2
Application numberUS-201615375773-A
CountryUS
Kind codeB2
Filing dateDec 12, 2016
Priority dateJan 13, 2014
Publication dateNov 27, 2018
Grant dateNov 27, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method for curing photosensitive polyimide (PSPI) films includes the steps of: depositing a PSPI film on a selected substrate, and curing the film by microwave heating at a selected temperature from about 200 to 340° C. in a selected atmosphere containing an oxygen concentration from about 20 to 200,000 ppm. The process atmosphere may be static or flowing. The addition of oxygen improves the removal of acrylate residue and improves the T g of the cured film, while the low processing temperature characteristic of the microwave process prevents the oxygen from damaging the polyimide backbone. The method may further include the steps of photopatterning and developing the PSPI film prior to curing. The process is particularly suitable for dielectric films on silicon for electronic applications.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for curing photopolymer films, comprising: depositing a photopolymer film on a substrate; supplying a known amount of oxygen gas (O 2 ) or adjusting a pressure to provide a selected atmosphere containing an oxygen concentration in a range from about 20 to 200,000 ppm; and curing the photopolymer film by microwave heating for a selected time in the selected atmosphere. 2. The method of claim 1 , wherein the photopolymer is a photosensitive polyimide (PSPI). 3. The method of claim 2 , wherein the PSPI comprises a polyamic acid (PAA) precursor resin modified with a photosensitive methacrylate alcohol to form a photosensitive polyamic ester (PAE). 4. The method of claim 3 , wherein the photosensitive methacrylate alcohol comprises one or more compositions in the methacrylate family (R—CH 2 CH 2 OC(O)CH═C(CH 3 ) 2 ) of monomers and oligomers, where R indicates any selected organic moiety attached at the indicated position. 5. The method of claim 1 , wherein the selected time is from about 60 to about 180 minutes. 6. The method of claim 1 , wherein the selected atmosphere contains an oxygen concentration in the range from about 200 to 200,000 ppm. 7. The method of claim 1 , wherein the photopolymer is a polybenzoxazole (PBO). 8. A method for curing photopolymer films, comprising: depositing a photopolymer film on a substrate; photopatterning the photopolymer film; developing the photopatterned photopolymer film; and curing the developed photopolymer film by microwave heating for a selected time in a selected atmosphere containing an oxygen concentration from about 20 to 200,000 ppm, wherein the oxygen concentration is maintained by at least one of supplying a known amount of oxygen gas to the atmosphere or adjusting the pressure of the atmosphere. 9. The method of claim 8 , wherein the photopolymer is a photosensitive polyimide (PSPI). 10. The method of claim 9 , wherein the PSPI comprises a polyamic acid (PAA) precursor resin modified with a photosensitive methacrylate alcohol to form a photosensitive polyamic ester (PAE). 11. The method of claim 10 , wherein the methacrylate alcohol comprises one or more compositions in the methacrylate family (R—CH 2 CH 2 OC(O)CH═C(CH 3 ) 2 ) of monomers and oligomers, where R indicates any selected organic moiety attached at the indicated position. 12. The method of claim 8 , wherein the selected time is from about 60 to about 180 minutes. 13. The method of claim 8 , wherein the selected atmosphere contains an oxygen concentration in the range from about 200 to 200,000 ppm. 14. The method of claim 8 , wherein the photopolymer is a polybenzoxazole (PBO).

Assignees

Inventors

Classifications

  • of insulating materials · CPC title

  • by exposure to a gas or vapour · CPC title

  • carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title

  • G03F7/0387Primary

    Polyamides or polyimides · CPC title

  • Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10139728B2 cover?
A method for curing photosensitive polyimide (PSPI) films includes the steps of: depositing a PSPI film on a selected substrate, and curing the film by microwave heating at a selected temperature from about 200 to 340° C. in a selected atmosphere containing an oxygen concentration from about 20 to 200,000 ppm. The process atmosphere may be static or flowing. The addition of oxygen improves the …
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification G03F7/0387. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 27 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).