Infrared communication method and apparatus, storage medium and electronic apparatus
US-2024305382-A1 · Sep 12, 2024 · US
US10135539B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10135539-B2 |
| Application number | US-201314436613-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 15, 2013 |
| Priority date | Oct 19, 2012 |
| Publication date | Nov 20, 2018 |
| Grant date | Nov 20, 2018 |
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Devices and techniques for integrated optical data communication. A method of encoding symbols in an optical signal may include encoding a first symbol by injecting charge carriers, at a first rate, into a semiconductor device, such as a PIN diode. The method may also include encoding a second symbol by injecting charge carriers, at a second rate, into the semiconductor device. The first rate may exceed the second rate. A modulator driver circuit may include a resistive circuit coupled between supply terminal and drive terminals. The modulator driver circuit may also include a control circuit coupled between a data terminal and the resistive circuit. The control circuit may modulate a resistance of the resistive circuit by selectively coupling one or more of a plurality of portions of the resistive circuit to the drive terminal based on data to be optically encoded. In some embodiments, a modulator driver circuit and an optical modulator may be integrated on the same die or stacked (3D integrated) die and connected with through-oxide or through-silicon vias.
Opening claim text (preview).
What is claimed is: 1. A method of fabricating an integrated circuit in a manufacturing process, comprising: in a silicon layer of the manufacturing process, fabricating a body of a transistor of a modulator driver circuit configured to control an optical modulator, the transistor being configured to modulate a resistance between an optical modulator and a supply, wherein the silicon layer is a first layer of the manufacturing process; in a second layer of the manufacturing process, fabricating a gate of the transistor of the modulator driver circuit; fabricating an optical waveguide core in the silicon layer of the manufacturing process; and fabricating a diode in the silicon layer of the manufacturing process, wherein a portion of the optical waveguide core is embedded in a portion of the diode. 2. The method of claim 1 , wherein the manufacturing process is a bulk silicon process. 3. The method of claim 1 , wherein the manufacturing process is a 65 nm process, a 45 nm process, a 32 nm process, or a 28 nm process. 4. The method of claim 1 , wherein the manufacturing process is a silicon-on-insulator (SOI) process. 5. The method of claim 1 , wherein the silicon layer is doped. 6. The method of claim 1 , wherein the second layer of the manufacturing process comprises a poly-silicon layer. 7. The method of claim 1 , further comprising capping the second layer of the manufacturing process with a layer of nickel silicide. 8. The method of claim 1 , wherein the second layer of the manufacturing process has a thickness that is between 65 nm and 200 nm. 9. The method of claim 1 , further comprising fabricating an optical resonator in the silicon layer of the manufacturing process. 10. The method of claim 1 , wherein fabricating the optical waveguide core comprises fabricating at least one waveguide core selected from the group consisting of a rib waveguide core and a strip waveguide core. 11. The method of claim 1 , wherein fabricating the diode comprises fabricating at least one diode selected from the group consisting of a PIN diode and a PN junction diode.
in an optical waveguide structure (G02F1/017, {G02F1/2257} take precedence) · CPC title
Circuits for the control or stabilisation of the bias voltage, e.g. automatic bias control [ABC] feedback loops · CPC title
Operation of devices; Circuit arrangements, not otherwise provided for in this subclass · CPC title
involving resonance effects, e.g. resonantly enhanced interaction · CPC title
Details of coding or modulation · CPC title
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