Optical device and excimer laser annealing equipment

Patent metadata

Field	Value
Publication number	US-10135217-B2
Application number	US-201715796514-A
Country	US
Kind code	B2
Filing date	Oct 27, 2017
Priority date	Mar 24, 2017
Publication date	Nov 20, 2018
Grant date	Nov 20, 2018

Abstract

The embodiments of the present disclosure provide an optical device and an excimer laser annealing equipment. The optical device includes: a light source; a transparent window spaced apart from the light source by a distance; and an optical system disposed between the light source and the transparent window. The transparent window is configured such that emergent light of the light source is vertically incident onto the transparent window after passing through the optical system.

First claim

What is claimed is:

1. An optical device, comprising:
a light source;
a transparent window spaced apart from the light source by a distance; and
an optical system disposed between the light source and the transparent window,
wherein the transparent window is configured such that emergent light of the light source is vertically incident onto the transparent window after passing through the optical system,
wherein the transparent window has a structure of cambered surface.

2. The optical device according to claim 1 , wherein the emergent light of the light source becomes convergent light after it passes through the optical system; and
the transparent window has a structure of cambered surface recessed towards the optical system.

3. The optical device according to claim 1 , wherein the emergent light of the light source becomes divergent light after it passes through the optical system; and
the transparent window has a structure of cambered surface protruding away from the optical system.

4. The optical device according to claim 1 , wherein the transparent window has a uniform thickness.

5. The optical device according to claim 1 , wherein the transparent window has a uniform thickness.

6. The optical device according to claim 2 , wherein the transparent window has a uniform thickness.

7. The optical device according to claim 3 , wherein the transparent window has a uniform thickness.

8. The optical device according to claim 1 , wherein an antireflection film is provided on a light entrance surface of the transparent window.

9. The optical device according to claim 1 , wherein an antireflection film is provided on a light entrance surface of the transparent window.

10. The optical device according to claim 2 , wherein an antireflection film is provided on a light entrance surface of the transparent window.

11. The optical device according to claim 3 , wherein an antireflection film is provided on a light entrance surface of the transparent window.

12. The optical device according to claim 1 , wherein the light source and the optical system are both disposed within an enclosed working chamber having the transparent window.

13. The optical device according to claim 1 , wherein the light source and the optical system are both disposed within an enclosed working chamber having the transparent window.

14. The optical device according to claim 2 , wherein the light source and the optical system are both disposed within an enclosed working chamber having the transparent window.

15. The optical device according to claim 1 , wherein the optical device is an excimer laser annealing device; and
the light source is a laser source, and the transparent window is an annealing window.

16. The optical device according to claim 15 , wherein an optical element in the optical system that is closest to the annealing window is a converging lens group; and
the annealing window has a structure of cambered surface recessed towards the converging lens group.

17. The optical device according to claim 16 , wherein a distance between the converging lens group and the annealing window is less than a focal length of the converging lens group.

18. The optical device according to claim 16 , wherein the annealing window has a curvature of 0.015-0.02.

19. An excimer laser annealing equipment, comprising the optical device according to claim 1 .

Assignees

• Boe Technology Group Co Ltd

Inventors

• Tian Xiangjun
• Chen Yan
• Wang Xueyong
• Wang Zhi

Classifications

• H10P95/90

  Thermal treatments, e.g. annealing or sintering · CPC title

• H10P72/0431

  Apparatus for thermal treatment · CPC title

• H10P34/422

  using incoherent radiation · CPC title

• H10P14/3456

  Polycrystalline · CPC title

• H10P14/2922

  being non-crystalline insulating materials, e.g. glass or polymers · CPC title