Capacitive touch screen and manufacturing method thereof

Patent metadata

Field	Value
Publication number	US-10133424-B2
Application number	US-201514785459-A
Country	US
Kind code	B2
Filing date	Feb 27, 2015
Priority date	Oct 29, 2014
Publication date	Nov 20, 2018
Grant date	Nov 20, 2018

Abstract

The present disclosure discloses a capacitive touch screen and a manufacturing method thereof. The capacitive touch screen comprises a substrate, a photoresist layer formed on the substrate, a reflective layer formed on the photoresist layer and a lead for a metal touch layer formed above the reflective layer and shielded by the photoresist layer in use, wherein a projection of the reflective layer on the substrate covers a projection of the lead for the metal touch layer on the substrate. With the present disclosure, the problem that the white photoresist in the existing capacitive touch screen has a high transmittance and cannot shield the lead for the metal touch layer, can be solved.

First claim

What is claimed is:

1. A capacitive touch screen, comprising:
a substrate;
a photoresist layer formed on the substrate;
a reflective layer formed on the photoresist layer; and
a lead for a metal touch layer formed above the reflective layer and shielded by the photoresist layer in use;
wherein a projection of the reflective layer on the substrate covers a projection of the lead for the metal touch layer on the substrate, and
wherein a distance between a projection of an inner edge of the reflective layer on the substrate and a projection of an inner edge of the lead for the metal touch layer on the substrate is not less than 0.5 mm.

2. The capacitive touch screen according to claim 1 , wherein a projection of the photoresist layer on the substrate covers the projection of the reflective layer on the substrate.

3. The capacitive touch screen according to claim 2 , wherein a distance between a projection of an inner edge of the photoresist layer on the substrate and the projection of the inner edge of the reflective layer on the substrate is in a range of 10 to 20 μm.

4. The capacitive touch screen according to claim 1 , wherein the lead for the metal touch layer is formed on the reflective layer.

5. The capacitive touch screen according to claim 4 , wherein the reflective layer is made of a non-conductive material.

6. The capacitive touch screen according to claim 1 , further comprising an insulation layer, wherein the insulation layer is formed on a surface of the substrate on which the photoresist layer and the reflective layer are formed and covers the photoresist layer and the reflective layer, and the lead for the metal touch layer is provided on the insulation layer.

7. The capacitive touch screen according to claim 6 , wherein the reflective layer is made of a conductive metal material.

8. The capacitive touch screen according to claim 1 , wherein the photoresist layer is a white photoresist layer.

9. A touch display device, comprising a capacitive touch screen, wherein the capacitive touch screen comprises:
a substrate;
a photoresist layer formed on the substrate;
a reflective layer formed on the photoresist layer; and
a lead for a metal touch layer formed above the reflective layer and shielded by the photoresist layer in use;
wherein a projection of the reflective layer on the substrate covers a projection of the lead of the metal touch layer on the substrate, and
wherein a distance between a projection of an inner edge of the reflective layer on the substrate and a projection of an inner edge of the lead for the metal touch layer on the substrate is not less than 0.5 mm.

10. A method of manufacturing a capacitive touch screen, comprising the following steps of:
forming a layer of photoresist material on a substrate, and forming a photoresist layer by a single patterning process;
forming a layer of reflective material on the substrate formed with the photoresist layer, and forming a reflective layer by a single patterning process, so that the reflective layer is formed on the photoresist layer;
forming a lead for a metal touch layer on the substrate formed with the reflective layer;
wherein a projection of the reflective layer on the substrate covers a projection of the lead for the metal touch layer on the substrate, and
wherein a distance between a projection of an inner edge of the reflective layer on the substrate and a projection of an inner edge of the lead for the metal touch layer on the substrate is not less than 0.5 mm.

11. The method according to claim 10 , wherein the step of forming the lead for a metal touch layer on the substrate formed with the reflective layer comprises:
forming a layer of metal touch material on a surface of the substrate on which the photoresist layer and the reflective layer are formed; and
forming the lead for the metal touch layer by a single patterning process.

12. The method according to claim 10 , wherein the step of forming the lead for a metal touch layer on the substrate formed with the reflective layer comprises:
forming an insulation layer on a surface of the substrate on which the photoresist layer and the reflective layer are formed, wherein the insulation layer covers the photoresist layer and the reflective layer;
forming the layer of metal touch material on the insulation layer; and
forming the lead for the metal touch layer by a single patterning process.

13. The method according to claim 10 , wherein the photoresist layer is a white photoresist layer.

14. The touch display device according to claim 9 , wherein a projection of the photoresist layer on the substrate covers the projection of the reflective layer on the substrate.

15. The touch display device according to claim 14 , wherein a distance between a projection of an inner edge of the photoresist layer on the substrate and the projection of the inner edge of the reflective layer on the substrate is in a range of 10 to 20 μm.

16. The touch display device according to claim 9 , wherein the lead for the metal touch layer is formed on the reflective layer, and the reflective layer is made of a non-conductive material.

17. The touch display device according to claim 9 , further comprising an insulation layer, wherein the insulation layer is formed on a surface of the substrate on which the photoresist layer and the reflective layer are formed and covers the photoresist layer and the reflective layer, and the lead for the metal touch layer is provided on the insulation layer.

18. The touch display device according to claim 17 , wherein the reflective layer is made of a conductive metal material.

Assignees

• Boe Technology Group Co Ltd
• Hefei Xinsheng Optoelectronics Technology Co Ltd

Inventors

• Xie Taofeng
• Zhang Lei
• Wu Lingyan
• Liu Yang

Classifications

• H05K3/108

  by semi-additive methods; masks therefor (characterised by metallic etch mask H05K3/062; electroplating methods or apparatus H05K3/241) · CPC title

• G06F2203/04103

  Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices · CPC title

• H05K2201/10128

  Display · CPC title

• G06F3/044 Primary

  by capacitive means · CPC title

• H05K3/10

  in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern · CPC title