Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method

Patent metadata

Field	Value
Publication number	US-10133195-B2
Application number	US-201414489154-A
Country	US
Kind code	B2
Filing date	Sep 17, 2014
Priority date	Jan 19, 2006
Publication date	Nov 20, 2018
Grant date	Nov 20, 2018

Abstract

An exposure apparatus exposes a substrate with illumination light via a projection optical system, and includes a frame member, a mark detection system that detects a mark of the substrate, a mask stage system having a first movable body to hold a mask, a first encoder system having first heads that each irradiate a first measurement beam to a first grating section, a substrate stage system having a second movable body to hold the substrate, a second encoder system having second heads that each irradiate a second measurement beam to a second grating section, and a controller that controls driving of the first movable body and of the second movable body, based on measurement information of the first and second encoder systems. In each of an exposure operation and a detection operation, the positional information of the second movable body is measured by the second encoder system.

First claim

What is claimed is:

1. An exposure apparatus that exposes a substrate with an illumination light via a projection optical system, the apparatus comprising:
a frame member that supports the projection optical system;
a mark detection system arranged away from the projection optical system, that detects a mark of the substrate;
a mask stage system arranged above the projection optical system and having a first movable body to hold a mask and a first electromagnetic motor to drive the first movable body;
a first encoder system which has a plurality of first heads that each irradiate a first measurement beam to a first grating section having a reflection-type grating, and which measures positional information of the first movable body that is moved by the first electromagnetic motor, the first grating section being provided to one of the frame member and the first movable body and the plurality of first heads being provided to the other of the frame member and the first movable body;
a substrate stage system arranged under the projection optical system and having a second movable body to hold the substrate and a second electromagnetic motor to drive the second movable body;
a second encoder system which has a plurality of second heads that each irradiate a second measurement beam to a second grating section having a reflection-type grating, and which measures positional information of the second movable body that is moved by the second electromagnetic motor, the second grating section being arranged substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system; and
a controller coupled to the mask stage system and the substrate stage system, that controls driving of the first movable body by the first electromagnetic motor and driving of the second movable body by the second electromagnetic motor, based on measurement information of the first encoder system and measurement information of the second encoder system, respectively, wherein
in each of an exposure operation of the substrate and a detection operation of the mark of the substrate, the positional information of the second movable body is measured by the second encoder system.

2. The exposure apparatus according to claim 1 , wherein
the controller controls the driving of the first movable body and the driving of the second movable body while correcting a measurement error of the second encoder system that occurs due to at least one of the second grating section and the second heads.

3. The exposure apparatus according to claim 2 , wherein
the controller corrects the measurement error that occurs due to at least one of a pitch or an arrangement of a grating formed in the second grating section and a deformation of the grating.

4. The exposure apparatus according to claim 2 , wherein
the controller corrects the measurement error that occurs due to at least one of a tilt and an optical characteristic of the second heads.

5. The exposure apparatus according to claim 1 , wherein
the substrate stage system has a plurality of second movable bodies including the second movable body, each of which holds a substrate, and
the second encoder system measures positional information of the plurality of second movable bodies.

6. The exposure apparatus according to claim 1 , wherein
the positional information of the second movable body is measured by three or four second heads that face the second grating section, of the plurality of second heads, and
by a movement of the second movable body, the second heads that face the second grating section are changed from one of the three second heads and the four second heads to the other of the three second heads and the four second heads.

7. The exposure apparatus according to claim 1 , wherein
the second grating section includes a plurality of scales each having a grating, and
the positional information of the second movable body is measured by second heads that face the plurality of scales, respectively, of the plurality of second heads.

8. The exposure apparatus according to claim 7 , wherein
the second grating section includes four of the scales, and
the positional information of the second movable body is measured by the second heads, of the plurality of second heads, that face at least three of the four scales, respectively.

9. The exposure apparatus according to claim 8 , wherein
as the second movable body moves, a relationship between the second grating section and the second heads changes between a first state and a second state,
in the first state, the positional information of the second movable body is measured by the four second heads which face the four scales of the second grating section, respectively,
in the second state, the positional information of the second movable body is measured by only three of the second heads which face three of the four scales, respectively, such that none of the second heads faces a fourth one of the four scales, and
at least three scales of the four scales are always faced by three of the second heads at least during the exposure of the substrate.

10. The exposure apparatus according to claim 9 , wherein
the relationship between the second grating section and the second heads changes between the first state and the second state at least during an exposure operation of the substrate.

11. The exposure apparatus according to claim 10 , wherein
when the relationship changes from the first state to the second state, the fourth one of the four scales in the second state is determined based on a position of the second movable body.

12. The exposure apparatus according to claim 10 , wherein
when the relationship changes from the first state to the second state, the three second heads that respectively face the three scales in the second state are determined based on a position of the second movable body.

13. The exposure apparatus according to claim 10 , wherein
the driving of the second movable body is controlled based on the positional information measured by three of the second heads in each of the first state and the second state.

14. The exposure apparatus according to claim 10 , wherein
one of the second heads used in controlling the driving of the second movable body is changed to a different head of the second heads from the one head based on a position of the second movable body.

15. The exposure apparatus according to claim 14 , wherein
the change of second head is performed in a state in which both of the one second head and the different second head face the second grating section.

16. The exposure apparatus according to claim 15 , wherein
both of the one second head and the different second head face a same scale of the four scales in the state in which the change of second head is performed.

17. The exposure apparatus according to claim 15 , wherein
the change of second head is performed after the different second head faces the second grating section and before the one second head comes into a state not facing the second grating section.

18. The exposure apparatus according to claim 17 , wherein
the change of second head is performed at least during an exposure operation of the substrate.

19. A device manufacturing method comprising:
a lithography process of transferring a pattern onto a substrate using the exposure apparatus according to claim 1 .

20. A method of making an exposure apparatus that exposes a substrate with an illumination light via a projection optical system, the

Assignees

• Nikon Corp

Inventors

• Shibazaki Yuichi

Classifications

• G03F7/70775

  Position control, e.g. interferometers or encoders for determining the stage position · CPC title

• Y10T29/49826

  Assembling or joining · CPC title

• G03F7/70716

  Stages · CPC title

• G01D5/266

  by interferometric means (G01D5/353 takes precedence) · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title