Liquid photoreactive composition and method of fabricating structures

Patent metadata

Field	Value
Publication number	US-10133174-B2
Application number	US-201415100577-A
Country	US
Kind code	B2
Filing date	Dec 1, 2014
Priority date	Dec 6, 2013
Publication date	Nov 20, 2018
Grant date	Nov 20, 2018

Abstract

A method of fabricating a structure includes disposing a liquid photoreactive composition on a substrate, exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and developing the exposed composition to provide the structure. The liquid composition includes: at least one cationically polymerizable polyepoxide; at least one compound comprising free-radically polymerizable groups; an effective amount of a two-photon photoinitiator system, wherein the weight ratio of component (a) to component (b) is from 25:75 to 75:25, inclusive. The two-photon photoinitiator system includes a two-photon sensitizer and an aromatic onium salt. The liquid photoreactive composition may contain less than about one percent by weight of organic solvent.

First claim

What is claimed is:

1. A method of fabricating a structure, the method comprising steps:
disposing a liquid photoreactive composition on a substrate, wherein the liquid photoreactive composition comprises components:
(a) at least one cationically polymerizable aliphatic epoxide having an epoxy group functionality of 2;
(b) at least one free-radically polymerizable compound having a free-radically polymerizable group functionality of 3; and
(c) an effective amount of a two-photon photoinitiator system comprising:
a two-photon sensitizer; and
an aromatic onium salt,

wherein component (a) and component (b) are present in a respective weight ratio of from 25:75 to 75:25, inclusive; and

(ii) exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and
(iii) developing the exposed composition to provide the structure.

2. The method of claim 1 , wherein the liquid photoreactive composition contains less than one weight percent of organic solvent, based on the total weight of the liquid photoreactive composition.

3. The method of claim 1 , wherein the liquid photoreactive composition is free of organic solvent.

4. The method of claim 1 , wherein the liquid photoreactive composition further comprises at least one cationically polymerizable aliphatic epoxide having an epoxy group functionality other than 2, and wherein the average cationically polymerizable aliphatic epoxide functionality is 1.8 to 2.2.

5. The method of claim 1 , wherein the liquid photoreactive composition further comprises at least one free-radically polymerizable compound having a free-radically polymerizable group functionality other than 3, and wherein the average free-radically polymerizable group functionality is 2.8 to 3.2.

6. The method of claim 1 , wherein the liquid photoreactive composition is free of metallic particles.

7. The method of claim 1 , wherein component (a) and component (b) are present in a respective weight ratio of from 30:70 to 70:30, inclusive.

8. The method of claim 1 , wherein component (a) and component (b) are present in a respective weight ratio of from 35:65 to 65:35, inclusive.

9. The method of claim 1 , wherein component (a) and component (b) are present in a respective weight ratio of from 40:60 to 60:40, inclusive.

10. The method of claim 1 , wherein the at least one cationically polymerizable aliphatic epoxide having an epoxy group functionality of 2 comprises 3,4-epoxycyclohexylmethyl 3,4-epoxycyclohexylcarboxylate.

11. The method of claim 1 , wherein at least one free-radically polymerizable compound having a free-radically polymerizable group functionality of 3 comprises trimethylolpropane triacrylate.

12. The method of claim 1 , wherein the aromatic onium salt comprises at least one of a diaryliodonium salt or a triarylsulfonium salt.

13. The method of claim 1 , wherein the two-photon sensitizer comprises 2,5-bis[4-(diphenylamino)stryl]-1-(2-ethylhexyloxy)-4-methoxybenzene.

14. The method of claim 1 , wherein steps (i), (ii), and (iii) are consecutive.

15. A liquid photoreactive composition comprising components:
(a) at least one cationically polymerizable aliphatic epoxide having an epoxy group functionality of 2;
(b) at least one free-radically polymerizable compound having a free-radically polymerizable group functionality of 3; and
(c) a photochemically effective amount of a two-photon photoinitiator system comprising:
a two-photon sensitizer; and
an aromatic onium salt,

wherein the liquid photoreactive composition contains less than one percent by weight of organic solvent, and wherein component (a) and component (b) are present in a respective weight ratio of from 25:75 to 75:25, inclusive.

16. The liquid photoreactive composition of claim 15 , wherein the liquid photoreactive composition is free of organic solvent.

17. The liquid photoreactive composition of claim 15 , wherein the liquid photoreactive composition further comprises at least one cationically polymerizable aliphatic epoxide having an epoxy group functionality other than 2, and wherein the average cationically polymerizable aliphatic epoxide functionality is 1.8 to 2.2.

18. The liquid photoreactive composition of claim 15 , wherein the liquid photoreactive composition further comprises at least one free-radically polymerizable compound having a free-radically polymerizable group functionality other than 3, and wherein the average free-radically polymerizable group functionality is 2.8 to 3.2.

19. The liquid photoreactive composition of claim 15 , wherein the liquid photoreactive composition is free of metallic particles.

20. The liquid photoreactive composition of claim 15 , wherein component (a) and component (b) are present in a respective weight ratio of from 30:70 to 70:30, inclusive.

21. The liquid photoreactive composition of claim 15 , wherein component (a) and component (b) are present in a respective weight ratio of from 35:65 to 65:35, inclusive.

22. The liquid photoreactive composition of claim 15 , wherein component (a) and component (b) are present in a respective weight ratio of from 40:60 to 60:40, inclusive.

23. The liquid photoreactive composition of claim 15 , wherein the at least one cationically polymerizable aliphatic epoxide having an epoxy group functionality of 2 comprises 3 ,4-epoxycyclohexylmethyl 3,4-epoxycyclohexylcarboxylate.

24. The liquid photoreactive composition of claim 15 , wherein the at least one free-radically polymerizable compound having a free-radically polymerizable group functionality of 3 comprises trimethylolpropane triacrylate.

25. The liquid photoreactive composition of claim 15 , wherein the aromatic onium salt comprises at least one of a diaryliodonium salt or a triarylsulfonium salt.

26. The liquid photoreactive composition of claim 15 , wherein the two-photon sensitizer comprises 2,5-bis[4-(diphenylamino)stryl]-1-(2-ethylhexyloxy)-4-methoxybenzene.

Assignees

• 3M Innovative Properties Co

Inventors

• Lee Tzu-Chen
• Devoe Robert J
• Nelson Brian K
• Gates Brian J

Classifications

• C08F222/103

  of trialcohols, e.g. trimethylolpropane tri(meth)acrylate · CPC title

• G03F7/70416 Primary

  2.5D lithography · CPC title

• G03F7/031

  Organic compounds not covered by group G03F7/029 · CPC title

• G03F7/027

  Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title

• C08F2/50

  with sensitising agents · CPC title