Phototunable thermoplastic elastomer hydrogel networks

US10125228B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10125228-B2
Application numberUS-201715612463-A
CountryUS
Kind codeB2
Filing dateJun 2, 2017
Priority dateAug 22, 2016
Publication dateNov 13, 2018
Grant dateNov 13, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided herein is a thermoplastic elastomer hydrogel and methods of making such. The hydrogel comprises a glass formed from poly(styrene)-b-poly(ethylene oxide) in which the coronal chain end has been functionalized with photodimerizable groups (AB-photo) and a liquid medium at a concentration between about 32:1 and about 2:1 liquid medium/AB-photo by weight. The hydrogel has a fatigue resistance to at least 500,000 compression cycles.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for preparing a block copolymer hydrogel, comprising: heating a dry blend comprising poly(styrene)-b-poly(ethylene oxide) diblock copolymer in which the coronal chain end has been functionalized with photo-dimerizable anthracene groups (SO-anth) to form an SO-anth melt; exposing the SO-anth melt to ultraviolet light (UV light) wherein, when exposed to UV light, the components of the SO-anth melt consisting essentially of SO-anth dimerize; and contacting the UV exposed SO-anth melt with a liquid medium to form a block copolymer hydrogel, the block copolymer hydrogel having a fatigue resistance to at least 500,000compression cycles. 2. The method of claim 1 , further comprising allowing the SO-anth melt to attain ambient temperature before contacting with liquid medium. 3. The method of claim 1 , wherein the dry blend is heated to 150° C. and then cooled to a temperature of about 70° C. to about 100° C. 4. The method of claim 1 , wherein the SO-anth melt is exposed to UV light from about 1 to about 25 minutes. 5. The method of claim 1 , wherein the SO-anth glass is exposed to UV light having a wavelength of about 320-380 nm. 6. The method of claim 1 , wherein the block copolymer hydrogel has a liquid medium concentration between about 32:1 and 2:1 liquid medium/SO-anth by weight. 7. The method of claim 1 , wherein the block copolymer hydrogel has a liquid medium concentration between about 16:1 and about 4:1 liquid medium/SO-anth by weight. 8. The method of claim 1 , wherein the liquid medium is selected from an aqueous medium, a room-temperature ionic liquid (RTIL), a dialkylcarbonate, an alkylenecarbonate, or combinations thereof. 9. The method of claim 1 , further comprising hydrogenating the polystyrene fully or partially. 10. The method of claim 1 , wherein the compression cycles operate with at least 12% compression at a frequency of about 1 Hz. 11. The method of claim 10 , wherein the compression cycles operate with at least 50% compression at least every eleventh cycle. 12. The method of claim 1 , wherein the fatigue resistance is characterized by a modulus recoverable to at least 80% of its value before the compression cycles were run. 13. The method of claim 1 , wherein the fatigue resistance is characterized by a modulus recoverable to at least 92% of its value before the compression cycles were run. 14. A method for preparing a block copolymer hydrogel, comprising: heating a dry blend comprising poly(styrene)-b-poly(ethylene oxide) diblock copolymer in which the coronal chain end has been functionalized with photo-dimerizable anthracene groups (SO-anth) to form an SO-anth melt; allowing the SO-anth melt to attain ambient temperature to form an SO-anth glass; adding a liquid medium to the SO-anth diblock glass to form a SO-anth diblock solution; and exposing the SO-anth diblock solution to ultraviolet light (UV light), wherein when exposed to UV light, the components of the SO-anth melt consisting essentially of SO-anth dimerize. 15. The method of claim 14 , further comprising contacting the SO-anth diblock solution with the liquid medium after exposure to UV light. 16. The method of claim 14 , further comprising contacting the SO-anth diblock solution with a second liquid medium after exposure to UV light. 17. The method of claim 14 , further comprising placing the SO-anth diblock solution in a mold. 18. The method of claim 14 , wherein the SO-anth diblock solution is exposed to UV light from about 1 to about 25 minutes. 19. The method of claim 14 , wherein the SO-anth diblock solution is exposed to UV light having a wavelength of about 320-380 nm. 20. The method of claim 14 , wherein the block copolymer hydrogel has a liquid medium concentration between about 32:1 and 2:1 liquid medium/SO-anth by weight. 21. The method of claim 14 , wherein the block copolymer hydrogel has a liquid medium concentration between about 16:1 and about 4:1 liquid medium/SO-anth by weight. 22. The method of claim 14 , wherein the liquid medium is selected from an aqueous medium, a room-temperature ionic liquid (RTIL), a dialkylcarbonate, an alkylenecarbonate, or combinations thereof. 23. The method of claim 14 , further comprising hydrogenating the polystyrene fully or partially.

Assignees

Inventors

Classifications

  • Treatment by wave energy or particle radiation · CPC title

  • Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers · CPC title

  • Oxygen containing compounds · CPC title

  • Compositions of unspecified macromolecular compounds · CPC title

  • C08J3/075Primary

    Macromolecular gels · CPC title

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What does patent US10125228B2 cover?
Provided herein is a thermoplastic elastomer hydrogel and methods of making such. The hydrogel comprises a glass formed from poly(styrene)-b-poly(ethylene oxide) in which the coronal chain end has been functionalized with photodimerizable groups (AB-photo) and a liquid medium at a concentration between about 32:1 and about 2:1 liquid medium/AB-photo by weight. The hydrogel has a fatigue resista…
Who is the assignee on this patent?
Univ Colorado State Res Found
What technology area does this patent fall under?
Primary CPC classification C08J3/075. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 13 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).