Film forming apparatus

Patent metadata

Field	Value
Publication number	US-10118191-B2
Application number	US-201415509006-A
Country	US
Kind code	B2
Filing date	Oct 1, 2014
Priority date	Oct 1, 2014
Publication date	Nov 6, 2018
Grant date	Nov 6, 2018

Abstract

A film forming apparatus includes a mist spray head for spraying a raw material. The mist spray head includes a raw material spray nozzle and a raw material ejection part for ejecting an atomized raw material, and the raw material spray nozzle includes a cavity and a raw material discharge part which is drilled in a side surface of the cavity, being away from a bottom surface of the cavity, and is connected to the raw material ejection part.

First claim

The invention claimed is:

1. A film forming apparatus which sprays a first material which is atomized to an atmosphere so as to form a film on a substrate, comprising:
a mounting part on which said substrate is mounted; and
a mist spray head which sprays said first material to an upper surface of a substrate mounted on said mounting part, wherein
said mist spray head includes:
a first material spray nozzle which sprays said first material and
a first material ejection part which is provided in a side of said mist spray head facing said substrate, so that said first material which is atomized is sprayed to said substrate, and
said first material spray nozzle includes:
a first cavity;
a first material supply part which supplies said first material which is atomized into said first cavity; and
a first material discharge part which is drilled in a side surface of said first cavity, being away from a bottom surface of said first cavity, and is connected to said first material ejection part;
said first material spray nozzle further includes a first straightening plate provided in said first cavity to straighten a flow of said first material, and which extends at an oblique angle from one side edge to an opposite side edge of said first material spray nozzle and to divide a space in the first material spray nozzle into the first cavity and a lower second cavity.

2. The film forming apparatus according to claim 1 , wherein
said first material ejection part forms an elongated opening hole having a slit-like shape.

3. The film forming apparatus according to claim 1 , wherein
said mist spray head further includes a reaction material spray nozzle which is provided adjacent to said first material spray nozzle to eject a reaction material which contributes to a reaction with said first material to said substrate.

4. The film forming apparatus according to claim 3 , wherein
said reaction material spray nozzle includes two reaction material spray nozzles, and
said first material spray nozzle is sandwiched between one of said two reaction material spray nozzles and other one of said two reaction material spray nozzles from a lateral side.

5. The film forming apparatus according to claim 3 , wherein
said mist spray head further includes a reaction material ejection part which is provided in a side of said mist spray head facing said substrate to eject said reaction material to said substrate, and
said reaction material spray nozzle includes:
a second cavity;
a reaction material supply part which supplies said reaction material into said second cavity; and
a reaction material discharge part which is drilled in a side surface of said second cavity, being away from a bottom surface of said second cavity, and is connected to said reaction material ejection part.

6. The film forming apparatus according to claim 5 , wherein
said reaction material spray nozzle further includes a second straightening plate which is provided in said second cavity to straighten a flow of said reaction material.

7. The film forming apparatus according to claim 5 , wherein
said reaction material ejection part forms an elongated opening hole having a slit-like shape.

8. The film forming apparatus according to claim 3 , wherein
said reaction material includes two reaction materials,
said mist spray head further includes:
one reaction material ejection part which is provided in a side of said mist spray head facing said substrate to eject one of said two reaction materials to said substrate; and
other reaction material ejection part which is provided in a side of said mist spray head facing said substrate to eject other one of said two reaction materials to said substrate, and
said reaction material spray nozzle includes:
one cavity;
other cavity which is formed separately from the one cavity;
one reaction material supply part which supplies said one of said two reaction materials into said one cavity;
other reaction material supply part which supplies said other one of said two reaction materials into said other cavity;
one reaction material discharge part which is drilled in a side surface of said one cavity, being away from a bottom surface of said one cavity, and is connected to said one reaction material ejection part; and
other reaction material discharge part which is drilled in a side surface of said other cavity, being away from a bottom surface of said other cavity, and is connected to said other reaction material ejection part.

9. The film forming apparatus according to claim 8 , wherein
said reaction material spray nozzle further includes:
one straightening plate which is provided in said one cavity to straighten a flow of said one of said two reaction materials; and
other straightening plate which is provided in said other cavity to straighten a flow of said other one of said two reaction materials.

10. The film forming apparatus according to claim 8 , wherein
each of said one reaction material ejection part and said other reaction material ejection part forms an elongated opening hole having a slit-like shape.

11. The film forming apparatus according to claim 3 , wherein
said reaction material spray nozzle further includes a temperature adjustment part which adjusts a temperature.

12. The film forming apparatus according to claim 3 , wherein
said mist spray head further includes an exhaust nozzle which performs an exhaust processing.

13. The film forming apparatus according to claim 12 , wherein
said exhaust nozzle is configured to perform exhaust processing at a flow rate which is equal to or larger than a sum of a flow rate at which said first material spray nozzle ejects said first material and a flow rate at which said reaction material spray nozzle ejects said reaction material.

14. The film forming apparatus according to claim 12 , wherein
said first material spray nozzle, said reaction material spray nozzle, and said exhaust nozzle are arranged side by side in a horizontal direction, and
at least said exhaust nozzle is located on an outermost side of said mist spray head.

15. The film forming apparatus according to claim 12 , wherein
said mist spray head further includes an exhaust part which is provided in a side of said mist spray head facing said substrate to perform said exhaust processing on a space between said substrate and said mist spray head, and
said exhaust nozzle includes:
a third cavity;
an exhaust material introduction part which is drilled in a side surface of said third cavity, being away from a bottom surface of said third cavity, and is connected to said exhaust part; and
an exhaust material outlet which is provided superior to said exhaust material introduction part to discharge said exhaust material outside said exhaust nozzle from said third cavity.

16. The film forming apparatus according to claim 15 , wherein
said exhaust nozzle further includes a third straightening part which is provided in said third cavity to straighten a flow of said exhaust material.

17. The film forming apparatus according to claim 15 , wherein
said exhaust part forms an elongated opening hole having a slit-like shape.

18. The film forming apparatus according to claim 12 , wherein
said mist spray head further includes:
an open ceiling part which is provided between said first material spray nozzle and said exhaust nozzle; and
a base plate part which covers said open ceiling part from a side where said substrate is located.

19. The film forming apparatus according to claim 18 ,

Assignees

• Toshiba Mitsubishi Electric Industrial Systems Corp

Inventors

• Shirahata Takahiro
• Orita Hiroyuki

Classifications

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P14/60

  of insulating materials · CPC title

• B05C9/14

  the auxiliary operation involving heating {or cooling} · CPC title

• C23C16/45517

  Confinement of gases to vicinity of substrate · CPC title

• B05C5/0254

  Coating heads with slot-shaped outlet (B05C5/0283 takes precedence) · CPC title