Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-10115623-B2
Application number	US-201815867204-A
Country	US
Kind code	B2
Filing date	Jan 10, 2018
Priority date	Mar 26, 2014
Publication date	Oct 30, 2018
Grant date	Oct 30, 2018

Abstract

In a substrate processing apparatus, a shield plate includes a first chucking magnetic material ( 441 ). The shield plate is moved up and down by a chamber opening-and-closing mechanism. A substrate holding part includes a movable chuck member ( 412 ) and a fixed chuck member. The movable chuck member ( 412 ) includes a second chucking magnetic material ( 442 ). When the shield plate is moved down, the shield plate comes in close proximity to the upper surface of a substrate ( 9 ), and the first chucking magnetic material ( 441 ) comes in close proximity to the second chucking magnetic material ( 442 ). The substrate ( 9 ) is held by magnetic action between the first chucking magnetic material ( 441 ) and the second chucking magnetic material ( 442 ). It is thus possible to hold the substrate ( 9 ) with a simple structure.

First claim

The invention claimed is:

1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holding part for holding a substrate;
a substrate rotation mechanism for rotating said substrate holding part about a central axis perpendicular to said substrate; and
a magnetic-material movement mechanism for moving a first chucking magnetic material into close proximity to said substrate holding part and moving said first chucking magnetic material away from said substrate holding part,
wherein said substrate holding part includes:
a chuck support part; and
at least three chuck members supported on said chuck support part,
said at least three chuck members includes at least one movable chuck member whose position can be changed between a chuck position and an unchuck position,
each movable chuck member included in said at least one movable chuck member includes a second chucking magnetic material that applies a force that holds an outer edge portion of said substrate on said each movable chuck member by magnetic action between said first chucking magnetic material and said second chucking magnetic material when said first chucking magnetic material is moved into close proximity to said substrate holding part, and
said substrate rotation mechanism includes:
a rotor that has an annular shape centered about said central axis and includes a permanent magnet; and
a stator that has an annular shape centered about said central axis and rotates said rotor that is in a floating state.

2. The substrate processing apparatus according to claim 1 , wherein
said substrate holding part includes an unchucking part for applying an unchucking force that holds said at least one movable chuck member at said unchuck position on said at least one movable chuck member when said first chucking magnetic material and said second chucking magnetic material are away from each other.

3. The substrate processing apparatus according to claim 2 , wherein
said unchucking part includes first and second unchucking magnetic materials, and
said unchucking force is magnetic action produced between said first and second unchucking magnetic materials.

4. The substrate processing apparatus according to claim 1 , wherein
each movable chuck member included in said at least one movable chuck member is turnable about a turning axis, and
a force that turns said each movable chuck member in a direction for holding said substrate is exerted on said each movable chuck member by a centrifugal force produced by rotation of said substrate holding part.

5. The substrate processing apparatus according to claim 1 , wherein
when the position of said at least one movable chuck member is changed from said chuck position to said unchuck position while said first chucking magnetic material is in close proximity to said substrate holding part, said at least one movable chuck member comes in contact with said first chucking magnetic material before the hold on said substrate is released.

6. A substrate processing apparatus for processing a substrate, comprising:
a substrate holding part for holding a substrate;
a substrate rotation mechanism for rotating said substrate holding part about a central axis perpendicular to said substrate; and
a magnetic-material movement mechanism for moving a first chucking magnetic material into close proximity to said substrate holding part and moving said first chucking magnetic material away from said substrate holding part,
wherein said substrate holding part includes:
a chuck support part; and
at least three chuck members supported on said chuck support part,
said at least three chuck members includes at least one movable chuck member whose position can be changed between a chuck position and an unchuck position,
each movable chuck member included in said at least one movable chuck member includes a second chucking magnetic material that applies a force that holds an outer edge portion of said substrate on said each movable chuck member by magnetic action between said first chucking magnetic material and said second chucking magnetic material when said first chucking magnetic material is moved into close proximity to said substrate holding part, and
each movable chuck member included in said at least one movable chuck member is turnable about a turning axis, and
a force that turns said each movable chuck member in a direction for holding said substrate is exerted on said each movable chuck member by a centrifugal force produced by rotation of said substrate holding part.

7. The substrate processing apparatus according to claim 6 , wherein
said substrate holding part includes an unchucking part for applying an unchucking force that holds said at least one movable chuck member at said unchuck position on said at least one movable chuck member when said first chucking magnetic material and said second chucking magnetic material are away from each other.

8. The substrate processing apparatus according to claim 7 , wherein
said unchucking part includes first and second unchucking magnetic materials, and
said unchucking force is magnetic action produced between said first and second unchucking magnetic materials.

9. The substrate processing apparatus according to claim 6 , wherein
when the position of said at least one movable chuck member is changed from said chuck position to said unchuck position while said first chucking magnetic material is in close proximity to said substrate holding part, said at least one movable chuck member comes in contact with said first chucking magnetic material before the hold on said substrate is released.

Assignees

• Screen Holdings Co Ltd

Inventors

• Kikumoto Noriyuki
• Honsho Kazuhiro

Classifications

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

• H10P72/7624 Primary

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H05K999/99

  Electricity · mapped topic

• H01L21/68785 Primary

  Electricity · mapped topic

• Y10T279/23

  with magnetic or electrostatic means · CPC title