Mask plate, exposure device, and exposure method

Patent metadata

Field	Value
Publication number	US-10114283-B2
Application number	US-201615309008-A
Country	US
Kind code	B2
Filing date	Mar 9, 2016
Priority date	Sep 25, 2015
Publication date	Oct 30, 2018
Grant date	Oct 30, 2018

Abstract

The present disclosure provides a mask plate, an exposure device and an exposure method. The mask plate includes a base plate and a plurality of patterns with openings arranged on the base plate. The base plate includes a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed. In the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate.

First claim

What is claimed is:

1. A mask plate, comprising a base plate and a plurality of patterns with openings arranged on the base plate, wherein
the base plate comprises a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed; and
in the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate, to compensate for a critical dimension at a position corresponding to the second region through the excessive light beams at the first region, thereby to enable an evenness value of the critical dimension to be greater than a predetermined value.

2. The mask plate according to claim 1 , wherein an opening width of each pattern at the first region is greater than that of each pattern at the second region.

3. An exposure device, comprising a mask plate, wherein
the mask plate comprises a base plate and a plurality of patterns with openings arranged on the base plate;
the base plate comprises a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed; and
in the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate, to compensate for a critical dimension at a position corresponding to the second region through the excessive light beams at the first region, thereby to enable an evenness value of the critical dimension to be greater than a predetermined value.

4. The exposure device according to claim 3 , wherein an opening width of each pattern at the first region is greater than that of each pattern at the second region.

5. The exposure device according to claim 3 , further comprising a color filter arranged on each pattern, wherein a light transmittance of the color filter corresponding to the first region is greater than that of the color filter corresponding to the second region.

6. The exposure device according to claim 3 , further comprising a projection module configured to project the light beams toward the first region and the second region in such a manner that the amount of the light beams passing through each pattern at the first region of the base plate is greater than the amount of the light beams passing through each pattern at the second region of the base plate.

7. The exposure device according to claim 6 , wherein the base plate further comprises a third region and a fourth region, an opening width of each pattern at the third region of the base plate is greater than an opening width of each pattern at the fourth region of the base plate, and an intensity of the light beam projected by the projection module toward the third region is less than that of the light beam projected toward the fourth region.

8. An exposure method, comprising a step of exposing, by the exposure device according to claim 3 , a target substrate, wherein the target substrate comprises a fifth region and a sixth region, an amount of light beams received at the fifth region is greater than an amount of the light beams received at the sixth region, and the fifth region corresponds to the first region of the mask plate, and the sixth region corresponds to the second region of the mask plate.

9. The exposure method according to claim 8 , further comprising a developing step of developing the exposed target substrate.

10. The exposure method according to claim 9 , wherein the developing step comprises placing the target substrate into a developing agent in such a manner that a distance between the fifth region of the target substrate and a liquid level of the developing agent is greater than a distance between the sixth region of the target substrate and the liquid level of the developing agent.

Assignees

• Boe Technology Group Co Ltd
• Beijing Boe Display Tech Co
• Bijing Boe Display Tech Co Ltd

Inventors

• Qi Pengyu
• Zha Changjun
• Wang Yanping
• Wang Dong
• Yuan Jianfeng
• Shao Xibin
• Zhang Yan
• Xiao Jintao
• Guo Yangchen

Classifications

• G03F7/70191

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G03F1/38 Primary

  Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof · CPC title

• G02F1/1303

  Apparatus specially adapted to the manufacture of LCDs · CPC title

• G03F7/30

  Imagewise removal using liquid means · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title