Photoresist polymers and methods of forming patterns

Patent metadata

Field	Value
Publication number	US-10113022-B2
Application number	US-201514804775-A
Country	US
Kind code	B2
Filing date	Jul 21, 2015
Priority date	Dec 5, 2014
Publication date	Oct 30, 2018
Grant date	Oct 30, 2018

Abstract

A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.

First claim

What is claimed is:

1. A photoresist polymer synthesized from a repeating unit, the repeating unit comprising:
a first leaving group including an ester group; and
a second leaving group capable of being removed with the first leaving group,
wherein the first leaving group and the second leaving group are positioned in one of a staggered conformation and an anti-periplanar configuration,
wherein the repeating unit is represented by one of Chemical Formula 3 and Chemical Formula 4:

wherein, in Chemical Formulae 3 and 4, R 1 and R 3 are independently one of hydrogen, a C 1 -C 20 alkyl group, a C 3 -C 10 cycloalkyl group, a C 6 -C 30 aromatic group and a combination thereof,
R 2 is a divalent group selected from one of styrene, hydroxystyrene, acrylate, C 1 -C 6 alkylene, arylene, carbonyl, oxy, a C 2 -C 30 unsaturated aliphatic group and a combination thereof, and
X is one of fluorine (F), chlorine (Cl), bromine (Br) and iodine (I).

2. The photoresist polymer of claim 1 , wherein R 2 and R 3 are fused to form a ring structure.

3. A photoresist polymer synthesized from a repeating unit, the repeating unit comprising:
a first leaving group including an ester group: and
a second leaving group capable of being removed with the first leaving group,
wherein the first leaving group and the second leaving group are positioned in one of a staggered conformation and an anti-periplanar configuration,
wherein the repeating unit is represented by Chemical Formula 5:

wherein, in Chemical Formula 5, each of R 1 , R 2 and R 5 are independently one of hydrogen, a C 1 -C 20 alkyl group, a C 3 -C 10 cycloalkyl group, a C 6 -C 30 aromatic group and a combination thereof, and R 1 , R 2 and R 5 are the same as or different from each other,
each of X 1 and X 2 are independently one of F, Cl, Br and I, and X 1 and X 2 are the same as or different from each other, and
n is an integer greater than 1.

4. The photoresist polymer of claim 3 , wherein at least one of R 1 and R 2 is connected to another repeating unit adjacent to the repeating unit.

5. The photoresist polymer of claim 3 , wherein the repeating unit is represented by Chemical Formula 6:

wherein, in Chemical Formula 6, each of R 1 , R 2 , R 3 , R 4 and R 5 are independently one of hydrogen, a C 1 -C 20 alkyl group, a C 3 -C 10 cycloalkyl group, a C 6 -C 30 aromatic group and a combination thereof, and R 1 , R 2 , R 3 , R 4 and R 5 are the same as or different from each other, and
X 1 , X 2 , X 3 , and X 4 are independently one of F, Cl, Br and I, and X 1 , X 2 , X 3 , and X 4 are the same as or different from each other.

6. A photoresist polymer synthesized from a repeating unit, the repeating unit comprising:
a first leaving group including an ester group; and
a second leaving group capable of being removed with the first leaving group,
wherein the first leaving group and the second leaving group are positioned in one of a staggered conformation and an anti-periplanar configuration,
wherein the second leaving group includes a tosylate group.

Assignees

• Park Jin
• Kim Hyun Woo
• Samsung Electronics Co Ltd

Inventors

• Park Jin
• Kim Hyun-Woo

Classifications

• C08F214/16

  Monomers containing bromine or iodine · CPC title

• G03F7/34

  Imagewise removal by selective transfer, e.g. peeling away · CPC title

• G03F7/038 Primary

  Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

• C08F214/18

  Monomers containing fluorine · CPC title

• C08G75/26

  Polythioesters · CPC title