Laser dicing glass wafers using advanced laser sources
US-2024409449-A1 · Dec 12, 2024 · US
US10112340B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10112340-B2 |
| Application number | US-201414917113-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 19, 2014 |
| Priority date | Sep 20, 2013 |
| Publication date | Oct 30, 2018 |
| Grant date | Oct 30, 2018 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A device for marking an ophthalmic lens (3), the lens (3) being made of at least one preset material, includes a laser (1) configured to produce permanent engravings on the lens (3) and configured to emit a focused beam of pulsed ultraviolet laser radiation that includes at least one radiation wavelength ranging between 200 nm and 300 nm, has a pulse length ranging between about 0.1 ns and about 5 ns, and has an energy per pulse ranging between about 5 μJ and about 100 μJ. A laser marking process configured to produce permanent engravings on an ophthalmic lens (3) via this device is also described.
Opening claim text (preview).
The invention claimed is: 1. A device for marking an ophthalmic lens, said ophthalmic lens being produced from at least one predetermined material, the device comprising: a laser configured to produce permanent engravings on the ophthalmic lens, the laser being configured to emit a focused pulsed beam of ultraviolet laser radiation, the focused beam having at least the following parameters: a radiation wavelength comprised between 200 nm and 300 nm, a pulse duration comprised between about 0.1 ns and about 5 ns, and an energy per pulse comprised between about 5 μJ and about 100 μJ; an optical assembly comprising an F-theta lens disposed at an output of the optical assembly, the F-theta lens being configured to focus a beam of ultraviolet laser radiation onto a focal plane of the F-theta lens with a focused beam diameter in the focal plane of the order of about 20 μm to about 50 μm, and an energy attenuator configured to regulate a fluence of the beam of ultraviolet radiation focused on a surface of the ophthalmic lens to be marked according to a plurality of operating modes of the attenuator that each define a determined fluence value; and an afocal system disposed between the laser and the energy attenuator. 2. The device as claimed in claim 1 , wherein the focused beam additionally has at least one of the following parameters: a peak power comprised between about 2.5 kW and about 1 MW, and/or a pulse frequency comprised between about 100 Hz and about 10 kHz. 3. The device as claimed in claim 1 , wherein the radiation wavelength of the focused ultraviolet laser beam is comprised between about 230 nm and about 290 nm. 4. The device as claimed in claim 1 , further comprising a solid-state laser source configured to emit a pulsed infrared radiation beam; and a multiplier positioned at the output of the laser source and configured to multiply a radiation frequency of the infrared beam emitted as output from the laser source. 5. The device as claimed in claim 4 , wherein the laser source is an Nd-YAG laser, and the multiplier is configured to quadruple the frequency of pulses output from the Nd-YAG laser. 6. The device as claimed in claim 4 , wherein the laser source is configured to emit a pulsed beam of laser radiation having an energy per pulse comprised between about 30 μJ and about 80 μJ. 7. The device as claimed in claim 1 , wherein the operating modes of the attenuator and/or the fluence values determined for said operating modes are defined on at least one parameter of the material of the ophthalmic lens, the at least one parameter being chosen from a degradation parameter and an absorbance at the wavelength of the ultraviolet radiation. 8. The device as claimed in claim 1 , wherein the device is configured to calibrate the attenuator by determining a curve representing an energy per pulse of the focused beam, as a function of an angle of orientation of a polarized filter that the attenuator includes, for a given energy per pulse at the input of the attenuator. 9. The device as claimed in claim 1 , wherein the optical assembly further comprises a scanner head configured to pilot an orientation of the beam of ultraviolet laser radiation toward the F-theta lens, and to pilot a position of the focused laser beam in the focal plane of the F-theta lens. 10. The device as claimed in claim 1 , further comprising a mechanism configured to modify a distance between the optical assembly and a holder of the ophthalmic lens to be marked, the mechanism being configured to modify an altitude of the ophthalmic lens to be marked. 11. The device as claimed in claim 1 , wherein the laser is configured to produce at least one of the engravings to define a marking formed by a plurality of spots produced at a distance from one another with a predetermined separation between two consecutive spots. 12. The device as claimed in claim 1 , wherein the laser is configured to produce at least one of the engravings to define a technical marking on a surface of the ophthalmic lens, the ophthalmic lens having a predetermined prescription. 13. The device as claimed in claim 1 , wherein the laser is configured to produce at least one of the engravings to define a commercial marking on a surface of the ophthalmic lens, the ophthalmic lens having a predetermined prescription. 14. A process for marking an ophthalmic lens produced from at least one predetermined material, the process being implemented by the device as claimed in claim 1 , the process comprising: laser marking permanent engravings on the lens by emitting a focused pulsed beam of ultraviolet laser radiation having at least the following parameters: a radiation wavelength comprised between 200 nm and 300 nm, a pulse duration comprised between about 0.1 ns and about 5 ns, and an energy per pulse comprised between about 5 μJ and about 100 μJ. 15. The process as claimed in claim 14 , wherein at least one of the engravings is produced on a surface of the ophthalmic lens, the ophthalmic lens having a predetermined prescription and said surface being devoid of functional treatment. 16. The process as claimed in claim 14 , wherein at least one of the engravings is produced on a surface of the ophthalmic lens, the ophthalmic lens having a predetermined prescription and being provided with at least one functional treatment. 17. The device as claimed in claim 4 , wherein the multiplier is configured to multiply the radiation frequency of the infrared beam emitted as output from the laser source by a factor comprised between three and ten. 18. The device as claimed in claim 3 , wherein the radiation wavelength of the focused ultraviolet laser beam is comprised between about 230 nm and about 266 nm. 19. The device as claimed in claim 1 , wherein the laser is configured to produce at least one of the engravings to define a commercial marking on a surface of the ophthalmic lens, the ophthalmic lens having a predetermined prescription and a functional treatment. 20. The device as claimed in claim 14 , wherein the energy per pulse is at the focal point and is comprised between about 10 μJ and about 80 μJ.
Organic materials · CPC title
Inorganic materials other than metals or composite materials · CPC title
by shaping pulses · CPC title
comprising lenses · CPC title
taking account of the properties of the material involved (B23K26/32, B23K26/40 take precedence) · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.