Coil filament for plasma enhanced chemical vapor deposition source

Patent metadata

Field	Value
Publication number	US-10109465-B2
Application number	US-201515533265-A
Country	US
Kind code	B2
Filing date	Nov 20, 2015
Priority date	Dec 5, 2014
Publication date	Oct 23, 2018
Grant date	Oct 23, 2018

Abstract

A vapor deposition source that includes a substantially vertical plate to which first and second filament posts are coupled. The vapor deposition source also includes a filament having a first end and a second end. The filament provides a substantially concentric source of electrons. The first end of the filament is connected to the first filament post and the second end of the filament is connected to the second filament post. The first end of the filament is substantially vertically aligned with the second end of the filament when the filament is connected to the first and second posts.

First claim

What is claimed is:

1. A chemical vapor deposition source comprising:
a substantially vertical plate;
first and second filament posts coupled to the plate;
a filament having a first end and a second end,
wherein the filament is configured to provide a substantially concentric source of electrons, and
wherein the first end of the filament is connected to the first filament post and the second end of the filament is connected to the second filament post, and wherein the filament is unsupported between the first and second ends, and
wherein the first end of the filament is substantially vertically aligned with the second end of the filament when the filament is connected to the first and second posts.

2. The chemical vapor deposition source of claim 1 and wherein the filament comprises a first curved arm and a second curved arm.

3. The chemical vapor deposition source of claim 2 and wherein the first curved arm is connected to the first end of the filament and wherein the second curved arm is connected to the second end of the filament.

4. The chemical vapor deposition source of claim 3 and wherein the filament further comprises a transition region between the first curved arm and the second curved arm, and wherein a first end of the transition region is connected to the first curved arm and a second end of the transition region is connected to the second curved arm.

5. The chemical vapor deposition source of claim 4 and wherein the transition region comprises a step feature.

6. The chemical vapor deposition source of claim 2 and further comprising:
a first filament post extension coupled between the first filament post and the first end of the filament; and
a second filament post extension coupled between the second filament post and the second end of the filament.

7. The chemical vapor deposition source of claim 1 and wherein each of the first end of the filament and the second end of the filament comprises a hook.

8. The chemical vapor deposition source of claim 2 and wherein the first curved arm and the second curved arm are disposed substantially in a same plane.

9. The chemical vapor deposition source of claim 8 and wherein the first curved arm and the second curved arm, disposed substantially in the same plane, are substantially parallel to the substantially vertical plate.

10. A filament comprising:
a holeless wire comprisng:
a first end configured to couple to a first filament post of a chemical vapor deposition source;
a second end configured to couple to a second filament post of the chemical vapor deposition source;
a first curved arm connected to the first end of the holeless wire;
a second curved arm connected to the second end of the holeless wire; and
a transition region between the first curved arm and the second curved arm, and wherein a first end of the transition region is connected to the first curved arm and a second end of the transition region is connected to the second curved arm.

11. The filament of claim 10 and wherein the first curved arm and the second curved arm, connected via the transition region, are configured to provide a substantially concentric source of electrons.

12. The filament of claim 10 and wherein the transition region comprises a step feature.

13. The filament of claim 10 and wherein each of the first end of the holeless wire and the second end of the holeless wire comprises a hook.

14. The filament of claim 10 and wherein the first curved arm and the second curved arm are disposed substantially in a same plane.

15. A vapor deposition tool comprising:
a plasma enhanced chemical vapor deposition source having a vertically positioned cathode filament that is separate from an anode of the vapor deposition tool, the cathode filament provides a substantially concentric source of electrons,
wherein the vertically positioned cathode filament comprises a first end and a second end, and
wherein the first end of the cathode filament is substantially vertically aligned with the second end of the cathode filament.

16. The vapor deposition tool of claim 15 and wherein the cathode filament comprises a first curved arm and a second curved arm.

17. The vapor deposition tool of claim 16 and wherein the first curved arm is connected to the first end of the cathode filament and wherein the second curved arm is connected to the second end of the cathode filament.

18. The vapor deposition tool of claim 17 and wherein the cathode filament further comprises a transition region between the first curved arm and the second curved arm, and wherein a first end of the transition region is connected to the first curved arm and a second end of the transition region is connected to the second curved arm.

19. The vapor deposition tool of claim 18 and wherein the transition region comprises a step feature.

20. The filament of claim 16 and wherein the first curved arm and the second curved arm are disposed substantially in a same plane.

Assignees

• Seagate Technology Llc

Inventors

• Ata Romulo
• Fan Zhaohui
• Tanaka Samuel
• Platt Christopher
• Ma Xiaoding

Classifications

• H01J37/3244

  Gas supply means · CPC title

• H01J37/32403 Primary

  Treating multiple sides of workpieces, e.g. 3D workpieces · CPC title

• H01K1/18

  Mountings or supports for the incandescent body · CPC title

• H01J37/32541

  Shape · CPC title

• H01J2237/3321

  CVD [Chemical Vapor Deposition] · CPC title