Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral radiant flux and system having the apparatus

Patent metadata

Field	Value
Publication number	US-10109451-B2
Application number	US-201715431098-A
Country	US
Kind code	B2
Filing date	Feb 13, 2017
Priority date	Feb 13, 2017
Publication date	Oct 23, 2018
Grant date	Oct 23, 2018

Abstract

A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation; and a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies the direction of the beam of radiation.

First claim

The invention claimed is:

1. A charge control apparatus for controlling charge on a large area substrate in a vacuum chamber, comprising:
a light source emitting a beam of radiation having a divergence;
a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the mirror is configured to reduce the divergence of the beam of radiation to substantially collimate the reflected beam of radiation; and
a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies a direction of the reflected beam of radiation to sweep over the large area substrate for reducing charges.

2. The charge control apparatus according to claim 1 , wherein the mirror is a parabolic mirror having a focal point.

3. The charge control apparatus according to claim 2 , wherein the parabolic mirror is an off-axis parabolic mirror.

4. The charge control apparatus according to claim 2 , wherein the light source and the mirror are arranged with respect to each other such that a crossover of the beam of radiations is provided at the focal point of the parabolic mirror.

5. The charge control apparatus according to claim 1 ,
wherein the mirror support is configured for a rotation of the mirror by at least 90°, and
wherein the mirror can be rotated in an idle position.

6. The charge control apparatus according to claim 1 , further comprising:
a crank-rocker mechanism for rotating the mirror support clockwise and counterclockwise.

7. The charge control apparatus according to claim 1 , wherein the light source is a VUV source with a radiation wavelength having a spectral energy distribution of 50% or more below 200 nm.

8. The charge control apparatus according to claim 1 , wherein the mirror and the mirror support are arranged in a vacuum chamber.

9. The charge control apparatus according to claim 8 , wherein the vacuum chamber has a slit valve configured for loading of a large area substrate.

10. A charge control apparatus for controlling charge on a substrate in a vacuum chamber, comprising:
a light source emitting a beam of radiation having a divergence;
a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the mirror is configured to reduce the divergence of the beam of radiation;
a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies a direction of the beam of radiation, wherein the mirror support is configured for a rotation of the mirror by at least 90°, and wherein the mirror can be rotated in an idle position; and
a beam blanker at the idle position.

11. A charged particle beam device, comprising:
a charged particle beam microscope configured for imaging a portion of a substrate provided in a vacuum chamber; and
a charge control apparatus for controlling charge on the substrate in the vacuum chamber, wherein the charged control apparatus comprises:
a light source emitting a beam of radiation having a divergence;
a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the mirror is configured to reduce the divergence of the beam of radiation; and
a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies a direction of the reflected beam of radiation to sweep over the substrate for reducing charges thereon.

12. The charged particle beam device according to claim 11 , wherein the mirror is a parabolic mirror having a focal point.

13. The charged particle beam device according to claim 12 , wherein the parabolic mirror is an off-axis parabolic mirror.

14. The charged particle beam device according to claim 12 , wherein the light source and the mirror are arranged with respect to each other such that a crossover of the beam of radiations is provided at the focal point of the parabolic mirror.

15. The charged particle beam device according to claim 11 , wherein the mirror support is configured for a rotation of the mirror by at least 90°, and wherein the mirror can be rotated in an idle position.

16. A charged particle beam device, comprising:
a charged particle beam microscope configured for imaging a portion of a substrate provided in a vacuum chamber; and
a charge control apparatus for controlling charge on the substrate in the vacuum chamber, wherein the charged control apparatus comprises:
a light source emitting a beam of radiation having a divergence;
a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the mirror is configured to reduce the divergence of the beam of radiation;
a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies a direction of the beam of radiation, wherein the mirror support is configured for a rotation of the mirror by at least 90°, and wherein the mirror can be rotated in an idle position; and
a beam blanker at the idle position.

17. A method of controlling charge on a substrate, comprising:
reducing a divergence of a beam of radiation of a light source with a curved surface of a mirror; and
moving a reflected beam of radiation reflected from the curved surface over the substrate by rotation of the mirror; and
removing charge on the substrate by irradiating the substrate with the reflected beam of radiation for charge control.

18. The method of claim 17 , further comprising:
handling the substrate to be released from a substrate support after removal of electrostatic charge due to the charge control.

19. The method of claim 17 , further comprising:
moving the reflected beam in an idle position.

20. A method of controlling charge on a substrate, comprising:
reducing a divergence of a beam of radiation of a light source with a curved surface of a mirror; and
moving a reflected beam of radiation reflected from the curved surface over the substrate by rotation of the mirror;
irradiating the substrate for charge control;
moving the reflected beam in an idle position; and
imaging a portion of the substrate with a charged particle beam while the reflected beam is in the idle position.

Assignees

• Applied Materials Inc

Inventors

• Jost Georg
• Ledl Ludwig
• Mueller Bernhard G
• Tzeng George

Classifications

• H01J2237/0047

  using electromagnetic radiations, e.g. UV, X-rays, light · CPC title

• H01J37/026 Primary

  Means for avoiding or neutralising unwanted electrical charges on tube components · CPC title

• H01J37/26

  Electron or ion microscopes; Electron or ion diffraction tubes · CPC title

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/18

  Vacuum locks {; Means for obtaining or maintaining the desired pressure within the vessel} · CPC title