Optical systems with improved signal to noise ratio

Patent metadata

Field	Value
Publication number	US-10107684-B1
Application number	US-201715824407-A
Country	US
Kind code	B1
Filing date	Nov 28, 2017
Priority date	Nov 29, 2016
Publication date	Oct 23, 2018
Grant date	Oct 23, 2018

Abstract

Systems and methods for increasing the overall throughput, decreasing the overall background radiation, or a combination thereof for imaging systems.

First claim

What is claimed is:

1. An imaging optical system comprising:
a first imaging optical sub-system having at least one optical element;
said first imaging optical sub-system being optically disposed to receive light from a source;
said first imaging optical sub-system having a first optical speed;
a slit element;
said first imaging optical sub-system being configured to substantially focus a portion of said light onto said slit element;
said slit element being optically disposed to receive a portion of said light;
said slit aperture being configured to substantially diffract said light;
a second imaging optical sub-system having at least one optical element;
said second imaging optical sub-system being optically disposed to receive a portion of diffracted light from said slit element;
said second imaging optical sub-system having an optical stop;
said optical stop of said second imaging optical sub-system being configured to provide a second optical speed that is larger than said first optical speed of said first optical sub-system;
said second optical sub-system being configured to substantially focus a portion of said diffracted light to an image plane; and
said image plane being optically disposed to receive a portion of said diffracted light.

2. The optical imaging system of claim 1 wherein at least one optical element is refractive.

3. The optical imaging system of claim 1 wherein at least one optical element is reflective.

4. The optical imaging system of claim 1 wherein said second imaging sub-system is a spectrometer.

5. An imaging optical system comprising:
a first imaging optical sub-system having at least one optical element;
said first imaging optical sub-system being optically disposed to receive light from a first source;
a shield element;
said shield element being optically disposed to block light from a second source;
said shield element being configured to emit or reflect low amounts of light relative to said first source;
said first imaging optical sub-system being configured to substantially focus a portion of said light onto said slit element;
said slit element being optically disposed to receive a portion of said light;
said slit aperture being configured to substantially diffract said light;
a second imaging optical sub-system having at least one optical element;
said second imaging optical sub-system being optically disposed to receive a portion of diffracted light from said slit element;
said second optical sub-system being configured to substantially focus a portion of said diffracted light to an image plane; and
said image plane being optically disposed to receive a portion of said diffracted light.

6. The optical imaging system of claim 5 wherein at least one optical element is refractive.

7. The optical imaging system of claim 5 wherein at least one optical element is reflective.

8. The optical imaging system of claim 5 wherein said second imaging sub-system is a spectrometer.

9. The optical imaging system of claim 5 wherein said shield element is substantially reflective.

10. The optical imaging system of claim 5 wherein said shield element is substantially emissive.

11. The optical imaging system of claim 5 wherein said shield element is optically disposed between said first source and said first imaging optical sub-system and said first optical sub-system is configured to receive a portion of said light from said shield element.

12. The optical imaging system of claim 11 wherein said shield element is substantially reflective.

13. The optical imaging system of claim 12 further comprising:
a Dewar;
said Dewar being configured to provide a cryogenic environment; and
said shield element being configured to substantially reflect light emitted by said cryogenic environment to said first optical imaging sub-system.

14. The optical imaging system of claim 11 wherein said shield element is substantially emissive.

15. The optical imaging system of claim 14 further comprising:
a Dewar;
said Dewar being configured to provide a cryogenic environment; and
said shield element being optically disposed within said cryogenic environment.

16. The optical imaging system of claim 5 wherein said shield element is optically disposed between said first imaging optical sub-system and said slit element.

17. The optical imaging system of claim 16 wherein said shield element is substantially reflective.

18. The optical imaging system of claim 17 further comprising:
a Dewar;
said Dewar being configured to provide a cryogenic environment; and
said shield element being configured to substantially reflect light emitted by said cryogenic environment to said first optical imaging sub-system.

19. The optical imaging system of claim 16 wherein said shield element is substantially emissive.

20. The optical imaging system of claim 19 further comprising:
a Dewar;
said Dewar being configured to provide a cryogenic environment; and
said shield element being optically disposed within said cryogenic environment.

21. The optical imaging system of claim 5 wherein said second imaging optical sub-system has an optical stop configured to provide a second optical speed that is substantially larger than said first optical speed of said first optical sub-system.

22. The optical imaging system of claim 21 wherein said shield element is substantially reflective.

23. The optical imaging system of claim 22 further comprising:
a Dewar;
said Dewar being configured to provide a cryogenic environment; and
said shield element being configured to substantially reflect light emitted by said cryogenic environment to said first optical imaging sub-system.

24. The optical imaging system of claim 21 wherein said shield element is substantially emissive.

25. The optical imaging system of claim 24 further comprising:
a Dewar;
said Dewar being configured to provide a cryogenic environment; and
said shield element, said first optical sub-system, and said second optical sub-system being optically disposed within said cryogenic environment.

26. A method for improving throughput in sensors, the method comprising:
imaging electromagnetic radiation emanating from a source through a first optical sub-system having a first optical speed;
configuring a slit element, the slit element being configured to substantially diffract light;
imaging electromagnetic radiation diffracted by said slit element through a second optical sub-system having a second optical speed;
detecting the diffracted electromagnetic radiation with a detecting element;
wherein the second optical speed is substantially larger than said first optical speed;
wherein throughput through a sensor is improved, the sensor comprising the first and second optical sub-systems.

27. The method of claim 26 wherein the second optical sub-system is a spectrometer.

28. A method for decreasing background radiation in sensors, the method comprising:
imaging electromagnetic radiation emanating from a source through a first optical sub-system having a first optical speed;
substantially blocking background radiation outside of said first optical speed with a shield element;
wherein said shield element emits or reflects less background radiation than is blocked by said shield element;
configuring a slit element, the slit element being configured to

Assignees

• Wavefront Res Inc

Inventors

• Mitchell Thomas A

Classifications

• G01J3/14

  using refracting elements, e.g. prisms (G01J3/18, G01J3/26 take precedence {prisms per se G02B5/04}) · CPC title

• G01J3/18 Primary

  using diffraction elements, e.g. grating (gratings per se G02B) · CPC title

• G01J3/42

  Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry (beam switching arrangements G01J3/08) · CPC title

• G01J3/04

  Slit arrangements {slit adjustment} · CPC title

• G02B27/0025

  for optical correction, e.g. distorsion, aberration · CPC title