Electron injector and free electron laser

Patent metadata

Field	Value
Publication number	US-10103508-B2
Application number	US-201715600149-A
Country	US
Kind code	B2
Filing date	May 19, 2017
Priority date	Dec 5, 2013
Publication date	Oct 16, 2018
Grant date	Oct 16, 2018

Abstract

A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.

First claim

The invention claimed is:

1. A photocathode comprising:
a substrate in which a cavity is formed; and
a film of material disposed on the substrate, wherein the film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation at an impact region, wherein the impact region is configured to receive ions during operation of the photocathode,
wherein the electron emitting surface is on an opposite side of the film of material from the cavity,
wherein the cavity is substantially aligned with the impact region, and
wherein the cavity is configured to reduce effects of ion collisions with the photocathode.

2. The photocathode of claim 1 , wherein the thickness of a portion of the photocathode disposed between the electron emitting surface and the cavity is sufficiently thin that the majority of positively charged ions incident at that portion of the photocathode pass through that portion of the photocathode and into the cavity.

3. The photocathode of claim 2 , wherein the thickness of the portion of the photocathode disposed between the electron emitting surface and the cavity is less than 10 microns.

4. The photocathode of claim 1 , wherein the photocathode is configured to take on a desired shape after a deformation of the photocathode which is brought about by an electrostatic pressure applied to the photocathode when the photocathode is held at a voltage.

5. The photocathode of claim 4 , wherein the photocathode is configured such that after the deformation of the photocathode, electric field lines associated with the voltage applied to the photocathode are substantially uniform.

6. The photocathode of claim 4 , wherein the substrate comprises an indentation in the substrate.

7. The photocathode of claim 4 , wherein the cavity in the substrate comprises a chamfer.

8. The photocathode of any of claim 1 , wherein the substrate comprises one or more ribs.

9. The photocathode of claim 8 , wherein the one or more ribs are arranged to strengthen the photocathode to resist an electrostatic pressure applied to the photocathode when the photocathode is held at a voltage.

10. The photocathode of claim 8 , wherein the ribs are arranged in a honeycomb structure.

11. The photocathode of claim 8 , wherein the ribs have a thickness of less than approximately 1 micron.

12. The photocathode of claim 1 , wherein the substrate comprises silicon.

13. The photocathode of claim 1 , wherein the film of material comprises one or more alkali metals.

14. The photocathode of claim 13 , wherein the film of material comprises sodium potassium antimonide.

15. An electron injector comprising:
a photocathode arranged to receive a beam of radiation from a radiation source, the photocathode comprising:
a substrate in which a cavity is formed;
a film of material disposed on the substrate, wherein the film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation at an impact region, wherein the impact region is configured to receive ions during operation of the photocathode,
wherein the electron emitting surface is on an opposite side of the film of material from the cavity,
wherein the cavity is substantially aligned with the impact region, and
wherein the cavity is configured to reduce effects of ion collisions with the photocathode, and

an electron booster operable to accelerate a beam of electrons emitted from the photocathode.

16. A free electron laser comprising:
an electron injector comprising;
a photocathode arranged to receive a beam of radiation from a radiation source, the photocathode comprising:
a substrate in which a cavity is formed;
a film of material disposed on the substrate, wherein the film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation at an impact region, wherein the impact region is configured to receive ions during operation of the photocathode,
wherein the electron emitting surface is on an opposite side of the film of material from the cavity,
wherein the cavity is substantially aligned with the impact region, and
wherein the cavity is configured to reduce effects of ion collisions with the photocathode, and
an electron booster operable to accelerate a beam of electrons emitted from the photocathode,

a linear accelerator operable to accelerate the beam of electrons to relativistic speeds; and
an undulator operable to cause the relativistic electrons to follow an oscillating path thereby causing them to stimulate emission of coherent radiation.

17. The free electron laser of claim 16 , wherein the undulator is configured to cause the electrons to emit EUV radiation.

18. The free electron laser of claim 16 , wherein the linear accelerator is an energy recovery linear accelerator, and wherein the free electron laser further comprises a merging unit configured to combine the electron beam output from the electron injector with a recirculating electron beam.

19. A lithographic system comprising:
an illumination system configured to provide a beam of radiation;
a support configured to support a patterning device that is configured to impart a pattern on the beam of radiation;
a projection system configured to direct the patterned beam of radiation onto a target portion of a substrate;
a free electron laser comprising an electron injector comprising a photocathode, arranged to receive a beam of radiation from a radiation source, the photocathode comprising:
a substrate in which a cavity is formed;
a film of material disposed on the substrate, wherein the film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation at an impact region, wherein the impact region is configured to receive ions during operation of the photocathode,
wherein the electron emitting surface is on an opposite side of the film of material from the cavity,
wherein the cavity is substantially aligned with the impact region, and
wherein the cavity is configured to reduce effects of ion collisions with the photocathode,
an electron booster operable to accelerate a beam of electrons emitted from the photocathode,

a linear accelerator operable to accelerate the beam of electrons to relativistic speeds; and
an undulator operable to cause the relativistic electrons to follow an oscillating path thereby causing them to stimulate emission of coherent radiation.

20. A method of producing an electron beam comprising:
directing a beam of radiation to be incident on an impact region of a photocathode, the impact region receiving ions during operation of the photocathode, thereby causing the photocathode to emit a beam of electrons, the photocathode comprising a substrate in which a cavity is formed, the cavity being substantially aligned with the impact region to reduce the effects of ion collisions with the photocathode, and a film of material disposed on the substrate; and
emitting electrons from an electron emitting surface of the film when illuminated by the beam of radiation, the electron emitting surface being on an opposite side of the film of material from the cavity.

Assignees

• Asml Netherlands Bv

Inventors

• Nikipelov Andrey Alexandrovich
• Banine Vadim Yevgenyevich
• De Jager Pieter Willem Herman
• De Vries Gosse Charles
• Frijns Olav Waldemar Vladimir
• Grimminck Leonardus Adrianus Gerardus
• Katalenic Andelko
• Akkermans Johannes Antonius Gerardus
• Loopstra Erik
• Engelen Wouter Joep
• Bartraij Petrus Rutgerus
• Coenen Teis Johan
• Op 'T Root Wilhelmus Patrick Elisabeth Maria

Classifications

• H05H7/08

  Arrangements for injecting particles into orbits · CPC title

• H05H2007/084

  Electron sources · CPC title

• H01J1/34

  Photo-emissive cathodes (H01J1/35 takes precedence) · CPC title

• H01S3/0903 Primary

  Free-electron laser · CPC title