Substrate processing method and substrate processing system
US-2024173742-A1 · May 30, 2024 · US
US10103020B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10103020-B2 |
| Application number | US-201515125423-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 3, 2015 |
| Priority date | Mar 13, 2014 |
| Publication date | Oct 16, 2018 |
| Grant date | Oct 16, 2018 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, a processing liquid supply part for supplying a processing liquid onto the substrate, a cup part for receiving the processing liquid spattering from the substrate being rotated, by its inner peripheral surface, a top plate disposed above the substrate, and a liquid film forming part for forming a rotating liquid film which rotates in the same direction as the substrate does, on the inner peripheral surface of the cup part, by supplying a liquid onto an upper surface of the top plate rotating in the same direction as the substrate rotates, in parallel with a processing of the substrate with the processing liquid. It is possible to prevent droplets caused by collision of the processing liquid spattering from the substrate against the cup part from being deposited on the substrate.
Opening claim text (preview).
The invention claimed is: 1. A substrate processing apparatus for processing a substrate, comprising: a substrate holding part for holding a substrate in a horizontal state; a substrate rotating mechanism for rotating said substrate holding part together with said substrate about a central axis oriented in a vertical direction; a processing liquid supply part for supplying a processing liquid onto said substrate; a cup part disposed around said substrate holding part, for receiving said processing liquid spattering from said substrate being rotated, by its inner peripheral surface; a plate having an annular disk-like shape about said central axis, disposed above said substrate, extending toward the outside of an outer peripheral edge of said substrate in a radial direction about said central axis; and a liquid film forming part for forming a rotating liquid film which rotates in the same direction as said substrate does, on said inner peripheral surface of said cup part, by supplying a liquid onto an upper surface of said plate rotating in the same direction as said substrate rotates about said central axis, to thereby supply said liquid from said upper surface of said plate to said inner peripheral surface of said cup part by centrifugal force, in parallel with a processing of said substrate with said processing liquid. 2. The substrate processing apparatus according to claim 1 , further comprising: a position fixing member for fixing a relative position of said plate relative to said substrate holding part in a circumferential direction about said central axis during rotation of said plate, wherein said plate is rotated together with said substrate holding part by said substrate rotating mechanism. 3. The substrate processing apparatus according to claim 2 , wherein said liquid film forming part comprises a plurality of discharge ports arranged in a circumferential direction about said central axis, each of which discharges said liquid toward said upper surface of said plate. 4. The substrate processing apparatus according to claim 3 , wherein said liquid supplied from said liquid film forming part to said plate goes outward in a radial direction about said central axis as said liquid comes nearer to said plate. 5. The substrate processing apparatus according to claim 4 , wherein said inner peripheral surface of said cup part has a lyophilic property to said liquid supplied from said liquid film forming part. 6. The substrate processing apparatus according to claim 5 , wherein said upper surface of said plate has a lyophilic property to said liquid supplied from said liquid film forming part. 7. The substrate processing apparatus according to claim 1 , wherein said liquid film forming part comprises a plurality of discharge ports arranged in a circumferential direction about said central axis, each of which discharges said liquid toward said upper surface of said plate. 8. The substrate processing apparatus according to claim 7 , wherein said liquid supplied from said liquid film forming part to said plate goes outward in a radial direction about said central axis as said liquid comes nearer to said plate. 9. The substrate processing apparatus according to claim 8 , wherein said inner peripheral surface of said cup part has a lyophilic property to said liquid supplied from said liquid film forming part. 10. The substrate processing apparatus according to claim 9 , wherein said upper surface of said plate has a lyophilic property to said liquid supplied from said liquid film forming part. 11. The substrate processing apparatus according to claim 1 , wherein said liquid supplied from said liquid film forming part to said plate goes outward in a radial direction about said central axis as said liquid comes nearer to said plate. 12. The substrate processing apparatus according to claim 11 , wherein said inner peripheral surface of said cup part has a lyophilic property to said liquid supplied from said liquid film forming part. 13. The substrate processing apparatus according to claim 12 , wherein said upper surface of said plate has a lyophilic property to said liquid supplied from said liquid film forming part. 14. The substrate processing apparatus according to claim 1 , wherein said inner peripheral surface of said cup part has a lyophilic property to said liquid supplied from said liquid film forming part. 15. The substrate processing apparatus according to claim 14 , wherein said upper surface of said plate has a lyophilic property to said liquid supplied from said liquid film forming part. 16. The substrate processing apparatus according to claim 1 , wherein said upper surface of said plate has a lyophilic property to said liquid supplied from said liquid film forming part. 17. The substrate processing apparatus according to claim 1 , wherein said processing liquid supplied from said processing liquid supply part and said liquid supplied from said liquid film forming part are liquids of the same kind.
characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title
using mainly spraying means, e.g. nozzles · CPC title
by wet cleaning only (H10P70/52 takes precedence) · CPC title
the liquid having chemical or dissolving effect · CPC title
Electricity · mapped topic
Related publications grouped by family.
Answers are generated from the same data shown on this page.