Borate-based base generator, and base-reactive composition comprising such base generator

US10100070B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10100070-B2
Application numberUS-201515114048-A
CountryUS
Kind codeB2
Filing dateJan 22, 2015
Priority dateJan 24, 2014
Publication dateOct 16, 2018
Grant dateOct 16, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A compound capable of providing a composition having high storage stability without reacting with a base-reactive compound, even when stored in a mixed state with the base-reactive compound, as well as capable of generating a strong base by irradiation of light (active energy rays) or heating. A base generator comprises the compound and a base-reactive composition comprises the base generator and the base-reactive compound. The compound is represented by the general formula (A).

First claim

Opening claim text (preview).

The invention claimed is: 1. A compound represented by the following general formula (A): wherein R 1 represents an alkyl group having 1 to 12 carbon atoms; an arylalkynyl group having 8 to 16 carbon atoms which may be substituted with a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkylthio group having 1 to 6 carbon atoms; an alkenyl group having 2 to 12 carbon atoms; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R 2 to R 4 each independently represent an alkyl group having 1 to 12 carbon atoms; an arylalkynyl group having 8 to 16 carbon atoms which may be substituted with a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkylthio group having 1 to 6 carbon atoms; an aryl group having 6 to 14 carbon atoms which may be substituted with a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkylthio group having 1 to 6 carbon atoms; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; and Z + represents an ammonium cation having a biguanidium group. 2. The compound according to claim 1 , wherein the ammonium cation having, the biguanidium group, represented by Z + in the general formula (A), is an ammonium cation having a biguanidium group represented by the following general formula (B 2 ) wherein R 11 to R 15 and R 18 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, R 16 and R 17 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms which may be substituted with a nitro group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, or a dialkylamino group having 1 to 12 carbon atoms; R 16 together with R 17 may form an alkylene group having 2 to 4 carbon atoms, and number of hydrogen atoms among R 11 to R 18 is 0 to 2. 3. The compound according to claim 1 , wherein R 1 in the general formula (A) is an alkyl group having 1 to 12 carbon atoms, or a phenylethynyl group which may be substituted with a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkylthio group having 1 to 6 carbon atoms, and all of R 2 to R 4 are the same phenyl group which may be substituted with a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkylthio group having 1 to 6 carbon atoms. 4. The compound according to claim 2 , wherein, in the compound represented by the general formula (B 2 ), R 11 to R 14 each independently represent an alkyl group having 1 to 12 carbon atoms, R 15 and R 18 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and R 16 and R 17 each independently represent an alkyl group having 1 to 12 carbon atoms, or a phenyl group substituted with only a nitro group or only an alkyl group having 1 to 6 carbon atoms, or R 16 together with R 17 may form an alkylene group having 2 to 4 carbon atoms. 5. The compound according to claim 1 , wherein the ammonium cation having the biguanidium group, represented by Z + in the general formula (A), is an ammonium cation having a biguanidium group represented by one of the following formula (B-4), (B-5), (B-6), (B-17), and (B-18): 6. A base generator comprising the compound according to claim 1 . 7. A base-reactive composition comprising the base generator according to claim 6 and a base-reactive compound. 8. The base-reactive composition according to claim 7 , wherein the composition further comprises a sensitizer. 9. The base-reactive composition according to claim 7 , wherein the composition further comprises an organic solvent. 10. The base-reactive composition according to claim 7 , wherein the base-reactive compound is selected from the group consisting of an epoxy-based compound, a silicon-based compound, an isocyanate-based compound, and a polyamic acid-based compound.

Assignees

Inventors

Classifications

  • with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

  • Cyclic amide derivatives of acids of phosphorus, in which two nitrogen atoms belong to the ring · CPC title

  • having one phosphorus atom as ring hetero atom · CPC title

  • C07F5/027Primary

    Organoboranes and organoborohydrides · CPC title

  • C07C229/26Primary

    having more than one amino group bound to the carbon skeleton, e.g. lysine · CPC title

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What does patent US10100070B2 cover?
A compound capable of providing a composition having high storage stability without reacting with a base-reactive compound, even when stored in a mixed state with the base-reactive compound, as well as capable of generating a strong base by irradiation of light (active energy rays) or heating. A base generator comprises the compound and a base-reactive composition comprises the base generator a…
Who is the assignee on this patent?
Fujifilm Wako Pure Chemical Corp
What technology area does this patent fall under?
Primary CPC classification C07F5/027. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 16 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).