Transparent pane with electrically conductive coating
US-9215760-B2 · Dec 15, 2015 · US
US10099958B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10099958-B2 |
| Application number | US-201515313773-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 27, 2015 |
| Priority date | May 28, 2014 |
| Publication date | Oct 16, 2018 |
| Grant date | Oct 16, 2018 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A process for obtaining a material including a transparent substrate coated with a stack of thin layers which are deposited by cathode sputtering, optionally assisted by a magnetic field, including at least one silver-based functional metal layer and at least two antireflective coatings, each antireflective coating including at least one dielectric layer, so that each functional metal layer is positioned between two antireflective coatings, the process includes the sequence of following stages: (a) an antireflective coating including at least one thin layer based on crystalline nickel oxide is deposited, then (b) at least one silver-based functional metal layer is deposited above and in contact with the thin layer based on crystalline nickel oxide.
Opening claim text (preview).
The invention claimed is: 1. A process for obtaining a material comprising a transparent substrate coated with a stack of thin layers which are deposited by cathode sputtering, the stack of thin layers comprising at least one silver-based functional metal layer and at least two antireflective coatings, each antireflective coating comprising at least one dielectric layer, so that each functional metal layer is positioned between two antireflective coatings, the process comprising: (a) depositing an antireflective coating comprising at least one thin layer based on crystalline or noncrystalline nickel oxide, then (b) depositing at least one silver-based functional metal layer above and in contact with the thin layer based on crystalline nickel oxide, wherein stage (a) comprises subjecting the at least one thin layer based on crystalline or noncrystalline nickel oxide to a crystallization heat treatment, before deposition of the silver-based functional metal layer, the heat treatment being carried out so that each point of the layer is brought to a temperature of at least 300° C. while maintaining, at every point, the face of the substrate opposite that comprising the stack at a temperature of less than or equal to 150° C. 2. The process for obtaining a material as claimed in claim 1 , comprising, during stage (a): depositing a layer capable of inducing crystallization by epitaxy and then depositing a layer based on nickel oxide above and in contact with the layer capable of inducing crystallization by epitaxy. 3. The process for obtaining a material as claimed in claim 1 , comprising, during stage (a): depositing a layer based on crystalline zinc oxide and then depositing a layer based on nickel oxide above and in contact with the layer based on crystalline zinc oxide. 4. The process for obtaining a material as claimed in claim 1 , wherein the crystallization heat treatment is carried out by contributing energy capable of carrying each point of the thin layer based on crystalline or noncrystalline nickel oxide to a temperature of greater than or equal to 300° C. 5. The process for obtaining a material as claimed in claim 1 , wherein all the layers of the stack are produced and a crystallization heat treatment is carried out in a chamber for deposition by cathode sputtering. 6. The process for obtaining a material as claimed in claim 1 , further comprising stage (c) during which the substrate coated with the stack of thin layers is subjected to a heat treatment at a temperature greater than 400° C. 7. The process for obtaining a material as claimed in claim 6 , wherein the temperature is greater than 500° C. 8. The process for obtaining a material as claimed in claim 1 , wherein the cathode sputtering is assisted by a magnetic field. 9. The process for obtaining a material as claimed in claim 1 , wherein the at least one thin layer based on crystalline nickel oxide is devoid of a nickel and chromium alloy.
Ag · CPC title
Thermal treatment · CPC title
at least one coating being a metal · CPC title
Glass or silica · CPC title
the metal being silver · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.