Material comprising a functional layer made from silver, crystallised on a nickel oxide layer

US10099958B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10099958-B2
Application numberUS-201515313773-A
CountryUS
Kind codeB2
Filing dateMay 27, 2015
Priority dateMay 28, 2014
Publication dateOct 16, 2018
Grant dateOct 16, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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A process for obtaining a material including a transparent substrate coated with a stack of thin layers which are deposited by cathode sputtering, optionally assisted by a magnetic field, including at least one silver-based functional metal layer and at least two antireflective coatings, each antireflective coating including at least one dielectric layer, so that each functional metal layer is positioned between two antireflective coatings, the process includes the sequence of following stages: (a) an antireflective coating including at least one thin layer based on crystalline nickel oxide is deposited, then (b) at least one silver-based functional metal layer is deposited above and in contact with the thin layer based on crystalline nickel oxide.

First claim

Opening claim text (preview).

The invention claimed is: 1. A process for obtaining a material comprising a transparent substrate coated with a stack of thin layers which are deposited by cathode sputtering, the stack of thin layers comprising at least one silver-based functional metal layer and at least two antireflective coatings, each antireflective coating comprising at least one dielectric layer, so that each functional metal layer is positioned between two antireflective coatings, the process comprising: (a) depositing an antireflective coating comprising at least one thin layer based on crystalline or noncrystalline nickel oxide, then (b) depositing at least one silver-based functional metal layer above and in contact with the thin layer based on crystalline nickel oxide, wherein stage (a) comprises subjecting the at least one thin layer based on crystalline or noncrystalline nickel oxide to a crystallization heat treatment, before deposition of the silver-based functional metal layer, the heat treatment being carried out so that each point of the layer is brought to a temperature of at least 300° C. while maintaining, at every point, the face of the substrate opposite that comprising the stack at a temperature of less than or equal to 150° C. 2. The process for obtaining a material as claimed in claim 1 , comprising, during stage (a): depositing a layer capable of inducing crystallization by epitaxy and then depositing a layer based on nickel oxide above and in contact with the layer capable of inducing crystallization by epitaxy. 3. The process for obtaining a material as claimed in claim 1 , comprising, during stage (a): depositing a layer based on crystalline zinc oxide and then depositing a layer based on nickel oxide above and in contact with the layer based on crystalline zinc oxide. 4. The process for obtaining a material as claimed in claim 1 , wherein the crystallization heat treatment is carried out by contributing energy capable of carrying each point of the thin layer based on crystalline or noncrystalline nickel oxide to a temperature of greater than or equal to 300° C. 5. The process for obtaining a material as claimed in claim 1 , wherein all the layers of the stack are produced and a crystallization heat treatment is carried out in a chamber for deposition by cathode sputtering. 6. The process for obtaining a material as claimed in claim 1 , further comprising stage (c) during which the substrate coated with the stack of thin layers is subjected to a heat treatment at a temperature greater than 400° C. 7. The process for obtaining a material as claimed in claim 6 , wherein the temperature is greater than 500° C. 8. The process for obtaining a material as claimed in claim 1 , wherein the cathode sputtering is assisted by a magnetic field. 9. The process for obtaining a material as claimed in claim 1 , wherein the at least one thin layer based on crystalline nickel oxide is devoid of a nickel and chromium alloy.

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What does patent US10099958B2 cover?
A process for obtaining a material including a transparent substrate coated with a stack of thin layers which are deposited by cathode sputtering, optionally assisted by a magnetic field, including at least one silver-based functional metal layer and at least two antireflective coatings, each antireflective coating including at least one dielectric layer, so that each functional metal layer is …
Who is the assignee on this patent?
Saint Gobain
What technology area does this patent fall under?
Primary CPC classification C03C17/36. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 16 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).