Adjustable spatial filter for laser scribing apparatus

US10096498B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10096498-B2
Application numberUS-201414513945-A
CountryUS
Kind codeB2
Filing dateOct 14, 2014
Priority dateOct 16, 2013
Publication dateOct 9, 2018
Grant dateOct 9, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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An apparatus for radiatively scribing a planar semiconductor substrate along a scribelane that extends between opposing rows of semiconductor devices on a target surface of the substrate. The scribelane extends parallel to a first direction parallel to a second direction, these first and second directions lying respectively parallel to X and Y axes of a Cartesian coordinate system. Such an apparatus may include an illuminator for producing an array of light beams; a projection system for focusing the light beams onto the target surface; an actuator system for causing relative displacement of a substrate holder with respect to light beams parallel to an XY plane; and an adjustable spatial filter located between the illuminator and the substrate holder, and including motorized plates whose position is adjustable so as to at least partially block selectable light beams of the light beam array.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus for radiatively scribing a substantially planar semiconductor substrate along a scribelane that extends between opposing rows of semiconductor devices on a target surface of the substrate, said scribelane having a length extending parallel to a first direction and a width extending parallel to a second direction, these first and second directions lying respectively parallel to X and Y axes on an XY plane of a Cartesian coordinate system, the apparatus comprising: a substrate holder for holding the substrate; an illuminator for producing an adjustable array of light beams, the array comprising a first plurality of light beams with mutually different X coordinates and a second plurality of light beams with mutually different Y coordinates; a projection system for focusing said light beams onto said target surface of the substrate when held on the substrate holder; an actuator system for causing relative displacement of the substrate holder with respect to said light beams parallel to the XY plane; and an adjustable spatial filter located between said illuminator and said substrate holder, and comprising a plurality of motorized plates positionable and oriented so as to block a first peripheral subset of said first plurality of light beams and a second peripheral subset of said second plurality of light beams located outside a chosen inner region of said array. 2. An apparatus according to claim 1 , wherein said adjustable spatial filter comprises at least two motorized plates that are independently movable parallel to said X direction and that are disposed on opposite sides of said array. 3. An apparatus according to claim 1 , wherein said adjustable spatial filter comprises at least two motorized plates that are independently movable parallel to said Y direction and that are disposed on opposite sides of said array. 4. An apparatus according to claim 1 , wherein at least one of the plates comprises a plurality of parallel fingers that are individually slidable relative to one another. 5. An apparatus according to claim 1 , wherein the illuminator produces said array with the aid of at least one Diffractive Optical Element. 6. An apparatus according to claim 5 , wherein the illuminator comprises: a holder for storing a plurality of different Diffractive Optical Elements; a exchanging mechanism for positioning a chosen one of said Diffractive Optical Elements upon an optical axis of said projection system. 7. An apparatus according to claim 6 , comprising a controller that can automatically adjust the position of said motorized plates in dependence upon which Diffractive Optical Element is chosen from said holder. 8. A method of radiatively scribing a substantially planar semiconductor substrate along a scribelane that extends between opposing rows of semiconductor devices on a target surface of the substrate, the method comprising: providing the substrate on a substrate holder; focusing onto the target surface of the substrate an adjustable array of plural light beams, such array including a first plurality of light beams with mutually different X coordinates and a second plurality of light beams with mutually different Y coordinates; causing relative displacement of said substrate holder relative to said array, so as to translate said array along said scribelane; and blocking selected light beams of said array before they impinge on said substrate, using an adjustable spatial filter comprising a plurality of motorized plates adjustable and oriented so as to block a first peripheral subset of said first plurality of light beams and a second peripheral subset of said second plurality of light beams located outside a chosen inner region of said array. 9. An apparatus for radiatively scribing a substantially planar semiconductor substrate along a scribelane that extends between opposing rows of semiconductor devices on a target surface of the substrate, the scribelane having a length extending parallel to a first direction and a width extending parallel to a second direction, the first and second directions lying respectively parallel to X and Y axes of a Cartesian coordinate system, the apparatus comprising: a substrate holder configured to hold the substrate; an illuminator configured to produce an adjustable array of several light beams; a projection system configured to focus said light beams onto the target surface of the substrate when held on the substrate holder; an actuator system configured to cause relative displacement of the substrate holder with respect to said light beams parallel to an XY plane; an adjustable spatial filter positioned between said illuminator and said substrate holder, and comprising a plurality of motorized plates adjustable so as to at least partially block selectable light beams of the array; and at least one motorized plate of the motorized plates comprises a plurality of parallel fingers that are individually slidable relative to one another.

Assignees

Inventors

Classifications

  • Cutting or separating of wafers, substrates or parts of devices · CPC title

  • mainly by radiation · CPC title

  • B23K26/083Primary

    Devices involving movement of the workpiece in at least one axial direction · CPC title

  • by means of optical elements, e.g. lenses, mirrors or prisms · CPC title

  • by using masks · CPC title

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What does patent US10096498B2 cover?
An apparatus for radiatively scribing a planar semiconductor substrate along a scribelane that extends between opposing rows of semiconductor devices on a target surface of the substrate. The scribelane extends parallel to a first direction parallel to a second direction, these first and second directions lying respectively parallel to X and Y axes of a Cartesian coordinate system. Such an appa…
Who is the assignee on this patent?
Asm Tech Singapore Pte Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0436. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 09 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).