Imprint apparatus

Patent metadata

Field	Value
Publication number	US-10095117-B2
Application number	US-201615191715-A
Country	US
Kind code	B2
Filing date	Jun 24, 2016
Priority date	Sep 7, 2011
Publication date	Oct 9, 2018
Grant date	Oct 9, 2018

Abstract

An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

First claim

What is claimed is:

1. An imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the imprint apparatus comprising:
an imaging device configured to obtain an image of the imprint material of a contact region at which the mold is brought into contact with the imprint material; and
a control unit configured to change an angle of a pattern section of the mold with respect to a surface of the substrate, based on the image obtained by the imaging device during a releasing operation in which the mold is released from the imprint material,
wherein the control unit is further configured to change the angle based on a plane coordinate position of a centroid of the contact region and a plane coordinate position of the center of a pattern-forming region on the substrate.

2. The imprint apparatus according to claim 1 , further comprising:
a deforming unit configured to deform the mold into a convex shape toward the substrate.

3. The imprint apparatus according to claim 1 , further comprising:
a driving unit configured to change the angle of the pattern section of the mold with respect to the surface of the substrate;
wherein the control unit is further configured to calculate a moving speed of a boundary of the contact region of the imprint material during the releasing operation based on the image and to control the driving unit such that the moving speed is kept constant.

4. The imprint apparatus according to claim 1 , further comprising:
a driving unit configured to change the angle of the pattern section of the mold with respect to the surface of the substrate;
wherein the driving unit is an actuator that is provided in a mold holding mechanism and is configured to change an angle of a holding surface of the mold in the mold holding mechanism.

5. The imprint apparatus according to claim 1 , further comprising:
a driving unit configured to change an angle of a pattern section of the mold with respect to the surface of the substrate;
wherein the driving unit is an actuator that is provided in a substrate holding unit and is configured to change an angle of a holding surface of the substrate in the substrate holding unit.

6. The imprint apparatus according to claim 1 , further comprising:
a driving unit configured to change the angle of the pattern section of the mold with respect to the surface of the substrate;
wherein the driving unit includes a mold holding mechanism and comprises a plurality of suction grooves configured to hold the mold by suction and a switching mechanism configured to switch a suction state of each of the plurality of the suction grooves independently of one another.

7. The imprint apparatus according to claim 1 , further comprising:
a load measurement unit configured to measure a load applied to the mold,
wherein the control unit is further configured to calculate an area of the contact region during the releasing operation based on the image, and control a relative speed between the substrate and the mold during the releasing operation such that the load does not exceed a value in which a suction pressure applied by a substrate holding unit is multiplied by the area of the contact region.

8. An imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the imprint apparatus comprising:
a mold holding mechanism configured to hold the mold;
a substrate holding unit configured to hold the substrate;
an imaging device configured to obtain an image of a contact region at which the mold deformed into a convex shape toward the substrate is brought into contact with the imprint material;
a driving unit configured to change an angle of a holding surface of the mold in the mold holding mechanism with respect to a holding surface of the substrate in the substrate holding unit; and
a control unit configured to control the driving unit such that the angle is changed, based on the image obtained by the imaging device during a releasing operation in which the mold is released from the imprint material,
wherein the control unit is further configured to control the driving unit such that the angle is changed, based on a plane coordinate position of a centroid of the contact region and a plane coordinate position of the center of a pattern-forming region on the substrate.

9. The imprint apparatus according to claim 1 , wherein the control unit is configured to determine the angle of the pattern section of the mold with respect to the surface of the substrate, based on the image obtained by the imaging device, and change the angle based on the determined angle.

10. The imprint apparatus according to claim 8 , further comprising:
a load measurement unit configured to measure a load applied to the mold,
wherein the control unit is further configured to calculate an area of the contact region during the releasing operation based on the image, and control a relative speed between the substrate and the mold during the releasing operation such that the load does not exceed a value in which a suction pressure applied by the substrate holding unit is multiplied by the area of the contact region.

11. The imprint apparatus according to claim 8 , further comprising:
a deforming unit configured to deform the mold held by the mold holding mechanism into the convex shape toward the substrate.

12. The imprint apparatus according to claim 8 ,
wherein the control unit is further configured to calculate a moving speed of a boundary of the contact region during the releasing operation based on the image and to control the driving unit such that the moving speed is kept constant.

13. The imprint apparatus according to claim 8 ,
wherein the driving unit is an actuator that is provided in the mold holding mechanism and is configured to change the angle of the holding surface of the mold in the mold holding mechanism.

14. The imprint apparatus according to claim 8 ,
wherein the driving unit is an actuator that is provided in the substrate holding unit and is configured to change the angle of the holding surface of the substrate in the substrate holding unit.

15. The imprint apparatus according to claim 8 ,
wherein the driving unit includes the mold holding mechanism and comprises a plurality of suction grooves configured to hold the mold by suction and a switching mechanism configured to switch a suction state of each of the plurality of the suction grooves independently of one another.

16. The imprint apparatus according to claim 8 , wherein the control unit is configured to determine the angle of a holding surface of the mold in the mold holding mechanism with respect to a holding surface of the substrate in the substrate holding unit, based on the image obtained by the imaging device, and control the driving unit to change the angle, based on the determined angle.

17. An imprint method for forming a pattern of an imprint material on a substrate using a mold, the imprint method comprising steps of:
obtaining an image of the imprint material of a contact region at which the mold is brought into contact with the imprint material; and
changing an angle of a pattern section of the mold with respect to a surface of the substrate, based on the obtained image during a releasing operation in which the mold is released from the imprint material,
wherein the angle is changed based on a plane coordinate position of a centroid of the contact region and a plane coordinate position of the center of a pattern-forming region on the substrate.

18. An article manufacturing method comprisin

Assignees

• Canon Kk

Inventors

• Hamaya Zenichi
• Hasegawa Noriyasu
• Yoshida Setsuo
• Shiode Yoshihiro

Classifications

• G03F7/0002 Primary

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• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B29K2909/08

  Glass · CPC title

• B29C2059/023

  Microembossing · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title