Method for manufacturing master, transfer copy, and replica master

Patent metadata

Field	Value
Publication number	US-10095105-B2
Application number	US-201515326163-A
Country	US
Kind code	B2
Filing date	Jul 14, 2015
Priority date	Jul 25, 2014
Publication date	Oct 9, 2018
Grant date	Oct 9, 2018

Abstract

There is provided a method for manufacturing a master on which an arbitrary pattern is formed, the method including: forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape; generating a control signal corresponding to an object on the basis of an input image in which the object is depicted; irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer; and forming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed.

First claim

The invention claimed is:

1. A method for manufacturing a master, the method comprising:
forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape;
generating a control signal corresponding to an object on the basis of an input image in which the object is depicted, wherein the input image is divided into a plurality of small areas and the control signal is generated on the basis of a determination for each small area as to whether or not the depicted object is included therein;
irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer, wherein portions of the thin-film layer are either irradiated with the laser light or are not irradiated with the laser light, based on which small areas the object is determined to be included in; and
forming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed.

2. The method for manufacturing a master according to claim 1 , wherein
a size of the small area is smaller than a size of a spot of the laser light.

3. The method for manufacturing a master according to claim 1 , wherein
a light source of the laser light is a semiconductor laser, and
the thin-film pattern is formed on the thin-film layer by thermal lithography.

4. The method for manufacturing a master according to claim 1 , wherein
the forming the thin-film pattern on the thin-film layer includes irradiating the base material with the laser light while rotating the base material with a center axis of the base material as a rotation axis.

5. The method for manufacturing a master according to claim 4 , wherein
the control signal is generated so as to be synchronized with a signal that controls the rotation of the base material.

6. A transfer copy to which a pattern of a master manufactured by the manufacturing method according to claim 1 is transferred.

7. A replica master to which a pattern of the transfer copy according to claim 6 is transferred.

8. A transfer copy to which a pattern of the replica master according to claim 7 is transferred.

9. The method for manufacturing a master according to claim 1 , wherein
the thin-film layer includes an intermediate layer formed on the outer circumferential surface and a resist layer formed on the intermediate layer, and
the forming the thin-film pattern on the thin-film layer includes
developing the resist layer to form the thin-film pattern on the resist layer and
etching the intermediate layer using the resist layer as a mask.

10. The method for manufacturing a master according to claim 9 , wherein
an etching rate of the intermediate layer is higher than an etching rate of the resist layer, and
the etching rate of the intermediate layer is lower than an etching rate of the base material.

11. The method for manufacturing a master according to claim 9 , wherein
a thermal conductivity of the intermediate layer is less than or equal to 200 W/(m·K).

12. The method for manufacturing a master according to claim 9 , wherein
a difference between a reflectance of the laser light to the resist layer directly formed on the base material and a reflectance of the laser light to the resist layer formed on the base material via the intermediate layer is less than or equal to 5%.

13. The method for manufacturing a master according to claim 9 , wherein
the resist layer contains a metal oxide.

14. The method for manufacturing a master according to claim 9 , wherein
the intermediate layer contains diamond-like carbon.

Assignees

• Dexerials Corp

Inventors

• Muramoto Yutaka
• Kikuchi Masanao

Classifications

• C23C14/34

  Sputtering · CPC title

• C23C16/44

  characterised by the method of coating (C23C16/04 takes precedence) · CPC title

• C23C28/046

  with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not · CPC title

• G03F7/70025

  by lasers · CPC title

• G03F7/24

  Curved surfaces {(G03F7/70 takes precedence)} · CPC title