Molecular tunnel junctions and their use as sources of electronic plasmons

US10094957B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10094957-B2
Application numberUS-201715470030-A
CountryUS
Kind codeB2
Filing dateMar 27, 2017
Priority dateMar 30, 2016
Publication dateOct 9, 2018
Grant dateOct 9, 2018

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Abstract

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A method of producing electronic plasmons by applying a bias to a molecular tunnel junction to excite plasmons, in which the molecular tunnel junction contains a top metallic electrode formed of a eutectic metal alloy and a metal oxide, a bottom metallic electrode formed of a transition metal, and a self-assembled monolayer formed of a plurality of organic molecules disposed between the top metallic electrode and the bottom metallic electrode. Also disclosed are a molecular tunnel junction for producing electronic plasmons and a method for preparing such a molecular tunnel junction.

First claim

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What is claimed is: 1. A method of producing electronic plasmons, the method comprising: providing a molecular tunnel junction, applying a bias to the molecular tunnel junction to excite plasmons, and detecting the plasmons thus produced, wherein the molecular tunnel junction contains a top metallic electrode formed of a eutectic metal alloy and a metal oxide, a bottom metallic electrode formed of a transition metal, and a self-assembled monolayer formed of a plurality of organic molecules disposed between the top metallic electrode and the bottom metallic electrode. 2. The method of claim 1 , wherein the plurality of organic molecules each contain a —SR thiolate moiety, in which R is a molecular chain formed of an alkyl group, an alkynyl group, an aryl group, a heteroaryl group, a metallocene group, a redox-active group, an optically active group, or a combination thereof. 3. The method of claim 2 , wherein the SR thiolate moiety contains an alkyl chain. 4. The method of claim 3 , wherein the —SR thiolate moiety is —S(CH 2 ) n-1 CH 3 , n being 10, 12, 14, 16, or 18. 5. The method of claim 2 , wherein the plurality of organic molecules are a plurality of molecular diodes each formed of a —SR thiolate moiety, in which R is a molecular chain containing an aryl group, a heteroaryl group, or a metallocene group; and the plurality of molecular diodes enable bias selective plasmon excitation. 6. The method of claim 5 , wherein the —SR thiolate moiety is 7. The method of claim 1 , wherein the molecular tunnel junction contains a self-assembled monolayer formed of a plurality of molecular diodes that enable either direct plasmon excitation or directional plasmon excitation. 8. The method of claim 1 , wherein the plasmon excitation is enabled via direct quantum mechanical tunneling. 9. The method of claim 1 , wherein the plasmon excitation has a metal-insulator-metal surface plasmon polariton (SPP) mode, a surface propagating plasmon mode, or a localized surface plasmon mode. 10. The method of claim 1 , wherein the plurality of organic molecules enable direct propagating SPP excitation by using a gold strip bottom electrode. 11. The method of claim 1 , wherein the plurality of organic molecules enable direct plasmon excitation or directional plasmon excitation by using a gold waveguide bottom electrode. 12. The method of claim 1 , wherein the plurality of organic molecules enable bias selective plasmon excitation via direct quantum mechanical tunneling. 13. The method of claim 12 , wherein the bias selective plasmon excitation has a metal-insulator-metal SPP mode, a surface propagating plasmon mode, or a localized surface plasmon mode. 14. The method of claim 1 , wherein the top metallic electrode is formed of a eutectic metal alloy and a metal oxide, in which the eutectic metal alloy is EGaIn and the metal oxide is Ga 2 O 3 . 15. The method of claim 1 , wherein the bottom metallic electrode is formed of a transition metal selected from the group consisting of Au, Ag, Cu, Ni, Pt, and Pd. 16. The method of claim 1 , wherein the plurality of organic molecules each contain a —SR thiolate moiety, the —SR thiolate moiety being covalently bond to the bottom metallic electrode through a metal-thiolate bond and being non-covalently bond to the top metallic electrode through van der Waals interactions. 17. The method of claim 1 , wherein the plasmon excitation is enabled via directional tunneling that is modulated by the tilt angle of the self-assembled monolayer with respect to the bottom metallic electrode. 18. The method of claim 17 , wherein the tilt angle is modulated by interactions between the plurality of organic molecules and the bottom metallic electrode. 19. The method of claim 17 , wherein the self-assembled monolayer has a tilt angle of 10°-30°, inclusive, with respect to the bottom metallic electrode. 20. A molecular tunnel junction for producing electronic plasmons, comprising: a top metallic electrode formed of an eutectic metal alloy and a metal oxide, a bottom metallic electrode formed of a template-striped metal, and a self-assembled monolayer formed of a plurality of molecular diodes disposed between the top metallic electrode and the bottom metallic electrode, wherein the plurality of molecular diodes each contain a —SR thiolate moiety, in which R is a molecular chain containing an aryl group, a heteroaryl group, or a metallocene group, and an alkynyl group; and the plurality of molecular diodes enable bias selective plasmon excitation. 21. The molecular tunnel junction of claim 20 , further comprising an optical adhesive layer and a substrate layer, the substrate layer attached to the bottom metallic electrode via the optical adhesive layer. 22. The molecular tunnel junction of claim 20 , wherein the top metallic electrode is formed of a eutectic metal alloy and a metal oxide, in which the eutectic metal alloy is EGaIn and the metal oxide is Ga 2 O 3 . 23. The molecular tunnel junction of claim 20 , wherein the bottom metallic electrode is formed of a transition metal selected from the group consisting of Au, Ag, Cu, Ni, Pt, and Pd. 24. The molecular tunnel junction of claim 20 , wherein the plurality of molecular diodes each contain a —SR thiolate moiety, the —SR thiolate moiety being covalently bond to the bottom metallic electrode through a metal-thiolate bond and being non-covalently bond to the top metallic electrode through van der Waals interactions. 25. The molecular tunnel junction of claim 24 , wherein the —SR thiolate moiety is 26. The molecular tunnel junction of claim 25 , wherein the self-assembled monolayer has a tilt angle of 10°-30°, inclusive, with respect to the bottom metallic electrode. 27. A method of fabricating a molecular tunnel junction of claim 20 , the method comprising: providing a bottom metallic electrode formed of a template-striped metal, depositing onto the bottom metallic electrode a plurality of molecular diodes to form a self-assembled monolayer, and forming a top metallic electrode onto the self-assembled monolayer, wherein the plurality of molecular diodes each contain a —SR thiolate moiety, in which R is a molecular chain containing an aryl group, a heteroaryl group, or a metallocene group, and an alkynyl group; and the plurality of molecular diodes enable bias selective plasmon excitation without the need of an optical element.

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Classifications

  • Liquid phase deposition · CPC title

  • Nanooptics, e.g. quantum optics or photonic crystals · CPC title

  • Manufacture or treatment of nanostructures · CPC title

  • Of specified metal or metal alloy composition · CPC title

  • Of specified metal oxide composition, e.g. conducting or semiconducting compositions such as ITO, ZnOx · CPC title

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What does patent US10094957B2 cover?
A method of producing electronic plasmons by applying a bias to a molecular tunnel junction to excite plasmons, in which the molecular tunnel junction contains a top metallic electrode formed of a eutectic metal alloy and a metal oxide, a bottom metallic electrode formed of a transition metal, and a self-assembled monolayer formed of a plurality of organic molecules disposed between the top met…
Who is the assignee on this patent?
Nat Univ Singapore, Agency Science Tech & Res
What technology area does this patent fall under?
Primary CPC classification G02B5/008. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 09 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).