System and methods for deposition spray of particulate coatings

US10092926B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10092926-B2
Application numberUS-201715611627-A
CountryUS
Kind codeB2
Filing dateJun 1, 2017
Priority dateJun 1, 2016
Publication dateOct 9, 2018
Grant dateOct 9, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A particle deposition system can have a particle source providing a nanomaterial at a controlled rate and a gas distribution system coupled with the particle source and operable to receive the nanomaterial aerosol. A high pressure chamber can be coupled with the gas distribution system, and a nozzle can be disposed between the high pressure chamber and a low pressure chamber. The nozzle can have a nozzle opening allowing fluidic communication of a nanomaterial aerosol between the high pressure chamber and the low pressure chamber and the opening can have a length exceeding a width.

First claim

Opening claim text (preview).

What is claimed is: 1. A particle deposition system comprising: a particle source operable to provide a plurality of nanomaterials at a controlled rate; a gas distribution system coupled with the particle source and operable to receive the nanomaterials; a high pressure chamber coupled with the gas distribution system; a nozzle, having an entrance and an exit, coupled to the high pressure chamber at the entrance; and a low pressure chamber coupled to the nozzle at the exit, wherein a nozzle opening allows fluidic communication of a nanomaterial aerosol between the high pressure chamber and the low pressure chamber, the nozzle opening having a length exceeding a width; wherein the width of the nozzle opening is formed from two opposing edges, at least one of the opposing edges movable relative to the other of the opposing edges and changing the width of the nozzle opening. 2. The particle deposition system of claim 1 , wherein the low pressure chamber is operable to receive a substrate and the nozzle is operable to accelerate the nanomaterial aerosol onto the substrate at hypersonic speeds. 3. The particle deposition system of claim 1 , wherein the nozzle opening has an adjustable cross-sectional area. 4. The particle deposition system of claim 1 , wherein one of the two opposing edges is coupled with a servo motor, the servo motor is operable to move the opposing edge relative to the other of the two opposing edges. 5. The particle deposition system of claim 1 , wherein the low pressure chamber includes a substrate receiving element. 6. The particle deposition system of claim 5 , wherein the substrate receiving element has an adjustable separation relative to the nozzle. 7. The particle deposition system of claim 5 , wherein the substrate receiving element includes two rollers disposed at opposing ends of the low pressure chamber, one roller couplable with a first end of the substrate and the other roller couplable with a second end of the substrate, the substrate transitionable from one roller to the other roller. 8. The particle deposition system of claim 1 , wherein the nozzle is movable relative to the substrate receiving element. 9. The particle deposition system of claim 1 , wherein the particle source is an atomizer. 10. The particle deposition system of claim 1 , wherein the particle source is one of a plasma reactor or flame reactor. 11. The particle deposition system of claim 1 , wherein a pressure of the low pressure chamber is maintained between 0.001 Torr and 100 Torr. 12. The particle deposition system of claim 1 , wherein the gas distribution system comprises a gas showerhead.

Assignees

Inventors

Classifications

  • for controlling time, or sequence, of delivery · CPC title

  • C23C24/04Primary

    Impact or kinetic deposition of particles · CPC title

  • Plasma spraying · CPC title

  • Apparatus for achieving spraying before discharge from the apparatus · CPC title

  • B05D1/12Primary

    Applying particulate materials (B05D1/06, B05D1/10 take precedence) · CPC title

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What does patent US10092926B2 cover?
A particle deposition system can have a particle source providing a nanomaterial at a controlled rate and a gas distribution system coupled with the particle source and operable to receive the nanomaterial aerosol. A high pressure chamber can be coupled with the gas distribution system, and a nozzle can be disposed between the high pressure chamber and a low pressure chamber. The nozzle can hav…
Who is the assignee on this patent?
Univ Arizona State
What technology area does this patent fall under?
Primary CPC classification C23C24/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 09 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).