Film growing method
US-2015368779-A1 · Dec 24, 2015 · US
US10092926B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10092926-B2 |
| Application number | US-201715611627-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 1, 2017 |
| Priority date | Jun 1, 2016 |
| Publication date | Oct 9, 2018 |
| Grant date | Oct 9, 2018 |
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A particle deposition system can have a particle source providing a nanomaterial at a controlled rate and a gas distribution system coupled with the particle source and operable to receive the nanomaterial aerosol. A high pressure chamber can be coupled with the gas distribution system, and a nozzle can be disposed between the high pressure chamber and a low pressure chamber. The nozzle can have a nozzle opening allowing fluidic communication of a nanomaterial aerosol between the high pressure chamber and the low pressure chamber and the opening can have a length exceeding a width.
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What is claimed is: 1. A particle deposition system comprising: a particle source operable to provide a plurality of nanomaterials at a controlled rate; a gas distribution system coupled with the particle source and operable to receive the nanomaterials; a high pressure chamber coupled with the gas distribution system; a nozzle, having an entrance and an exit, coupled to the high pressure chamber at the entrance; and a low pressure chamber coupled to the nozzle at the exit, wherein a nozzle opening allows fluidic communication of a nanomaterial aerosol between the high pressure chamber and the low pressure chamber, the nozzle opening having a length exceeding a width; wherein the width of the nozzle opening is formed from two opposing edges, at least one of the opposing edges movable relative to the other of the opposing edges and changing the width of the nozzle opening. 2. The particle deposition system of claim 1 , wherein the low pressure chamber is operable to receive a substrate and the nozzle is operable to accelerate the nanomaterial aerosol onto the substrate at hypersonic speeds. 3. The particle deposition system of claim 1 , wherein the nozzle opening has an adjustable cross-sectional area. 4. The particle deposition system of claim 1 , wherein one of the two opposing edges is coupled with a servo motor, the servo motor is operable to move the opposing edge relative to the other of the two opposing edges. 5. The particle deposition system of claim 1 , wherein the low pressure chamber includes a substrate receiving element. 6. The particle deposition system of claim 5 , wherein the substrate receiving element has an adjustable separation relative to the nozzle. 7. The particle deposition system of claim 5 , wherein the substrate receiving element includes two rollers disposed at opposing ends of the low pressure chamber, one roller couplable with a first end of the substrate and the other roller couplable with a second end of the substrate, the substrate transitionable from one roller to the other roller. 8. The particle deposition system of claim 1 , wherein the nozzle is movable relative to the substrate receiving element. 9. The particle deposition system of claim 1 , wherein the particle source is an atomizer. 10. The particle deposition system of claim 1 , wherein the particle source is one of a plasma reactor or flame reactor. 11. The particle deposition system of claim 1 , wherein a pressure of the low pressure chamber is maintained between 0.001 Torr and 100 Torr. 12. The particle deposition system of claim 1 , wherein the gas distribution system comprises a gas showerhead.
for controlling time, or sequence, of delivery · CPC title
Impact or kinetic deposition of particles · CPC title
Plasma spraying · CPC title
Apparatus for achieving spraying before discharge from the apparatus · CPC title
Applying particulate materials (B05D1/06, B05D1/10 take precedence) · CPC title
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