Methods of forming coating layers

US10090135B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10090135-B2
Application numberUS-201615015158-A
CountryUS
Kind codeB2
Filing dateFeb 4, 2016
Priority dateMay 29, 2015
Publication dateOct 2, 2018
Grant dateOct 2, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A method of forming a coating layer, including preparing hollow inorganic particles, each hollow inorganic particle including a shell surrounding a hollow core; preparing inorganic coating particles of a solid structure; forming a mixture of the hollow inorganic particles and the inorganic coating particles; and spraying the mixture on a surface of a base by a plasma spray coating process.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a coating layer on a base, the method comprising: preparing hollow inorganic particles, each hollow inorganic particle including a shell surrounding a hollow core; preparing inorganic coating particles of a solid structure; forming a mixture of the hollow inorganic particles and the inorganic coating particles; and spraying the mixture on a surface of the base by a plasma spray coating process such that the coating layer has a varying concentration, in a thickness direction of the coating layer, of the hollow inorganic particles relative to the inorganic coating particles, wherein the coating layer includes a first region including a contact surface of the coating layer with the base, a second region including an outer surface of the coating layer and a midregion between the first region and the second region, wherein the concentration of the hollow inorganic particles relative to the inorganic coating particles in the first region is higher than that in the midregion. 2. The method as claimed in claim 1 , wherein the inorganic coating particles include one or more of yttria, alumina, zirconia, silica, yttrium fluoride, silicon carbide, or yttria-stabilized zirconia. 3. The method as claimed in claim 1 , wherein preparing the hollow inorganic particles includes: synthesizing a core layer including a polymeric material; surface-treating the core layer; forming the shell including an inorganic material on a surface of the core layer; and removing the core layer. 4. The method as claimed in claim 3 , wherein the shell is formed using powder of one or more of yttria, alumina, zirconia, silica, yttrium fluoride, silicon carbide, or yttria-stabilized zirconia. 5. The method as claimed in claim 3 , wherein synthesizing the core layer includes a liquid-phase polymerization of monomers. 6. The method as claimed in claim 3 , wherein surface-treating the core layer includes forming a surface activation layer on the surface of the core layer. 7. The method as claimed in claim 3 , wherein removing the core layer includes a thermal decomposition or an evaporation of the core layer by a thermal treatment. 8. The method as claimed in claim 1 , wherein spraying the mixture on the surface of the base by the plasma spray coating process is divided into a plurality of cycles, the cycles having different concentrations of the hollow inorganic particles relative to the inorganic coating particles. 9. The method as claimed in claim 8 , wherein the mixture is injected in a plasma spray coating apparatus as a plurality of mixture batches, the mixture batches having different mixture ratios of the hollow inorganic particles and the inorganic coating particles. 10. The method as claimed in claim 9 , further comprising varying the mixture ratio of the hollow inorganic particles to the inorganic coating particles included in each mixture batch such that the concentration of the hollow inorganic particles in the coating layer formed on the surface of the base is varied as the coating layer is formed. 11. The method as claimed in claim 10 , wherein the concentration of the hollow inorganic particles relative to the inorganic coating particles is greatest in the first region, the concentration of the hollow inorganic particles relative to the inorganic coating particles diminishing towards the outer surface of the coating layer. 12. The method as claimed in claim 10 , wherein the concentration of the hollow inorganic particles relative to the inorganic coating particles is least in the midregion. 13. The method as claimed in claim 12 , wherein the midregion consists essentially of the inorganic coating particles. 14. The method as claimed in claim 1 , wherein an amount of the hollow inorganic particles in the coating layer is in a range from about 5 weight percent to about 60 weight percent based on a total weight of the coating layer. 15. A method of forming a coating layer, the method comprising: preparing hollow inorganic particle precursors, each hollow inorganic particle precursor including a polymer core layer and a shell surrounding the polymer core layer; preparing inorganic coating particles of a solid structure; forming a mixture of the hollow inorganic particle precursors and the inorganic coating particles; and spraying the mixture on a surface of a base by a plasma spray coating process, wherein spraying the mixture includes transforming the hollow inorganic particle precursors into hollow inorganic particles from which the polymer core layer is removed. 16. The method as claimed in claim 15 , further comprising injecting the mixture into a powder injection port of a plasma spray coating apparatus, wherein the mixture passes a spraying port of the plasma spray coating apparatus to form the hollow inorganic particles. 17. The method as claimed in claim 15 , wherein the shell and the inorganic coating particles include one or more of yttria, alumina, zirconia, silica, yttrium fluoride, silicon carbide, or yttria-stabilized zirconia. 18. A method of forming a coating layer, the method comprising: forming multiple spray coatings using one or more of hollow inorganic particles or solid inorganic coating particles, the multiple spray coatings having different weight ratios of the hollow inorganic particles and the solid inorganic coating particles; and spraying the multiple spray coatings having different weight ratios in a plurality of cycles to form a coating layer including the hollow inorganic particles and the solid inorganic coating particles on an inner wall of a plasma treatment apparatus chamber by a plasma spray coating process such that the coating layer has a varying concentration, in a thickness direction of coating layer, of the hollow inorganic particles relative to the inorganic coating particles, wherein the coating layer includes a first region including a contact surface of the coating layer with the base, a second region including an outer surface of the coating layer and a midregion between the first region and the second region, wherein the concentration of the hollow inorganic particles relative to the inorganic coating particles in the first region is higher than that in the midregion. 19. The method as claimed in claim 18 , wherein the concentration of the hollow inorganic particles relative to the inorganic coating particles decreases, in a thickness direction of the coating layer, from at the contact surface of the coating layer with the inner wall of the plasma treatment apparatus chamber, for at least a portion of a thickness of the coating layer.

Assignees

Inventors

Classifications

  • Plasma spraying · CPC title

  • followed by coating of the granules (to prevent the granules sticking together B01J2/30) · CPC title

  • Oxides, borides, carbides, nitrides or silicides; Mixtures thereof · CPC title

  • Means for protecting the vessel against plasma · CPC title

  • in a liquid medium · CPC title

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What does patent US10090135B2 cover?
A method of forming a coating layer, including preparing hollow inorganic particles, each hollow inorganic particle including a shell surrounding a hollow core; preparing inorganic coating particles of a solid structure; forming a mixture of the hollow inorganic particles and the inorganic coating particles; and spraying the mixture on a surface of a base by a plasma spray coating process.
Who is the assignee on this patent?
Samsung Electronics Co Ltd, Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01J37/32495. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 02 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).