Optical measurement element for alignment in wafer-level testing and method for aligning an optical probe using the same

US10088299B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10088299-B2
Application numberUS-201715641384-A
CountryUS
Kind codeB2
Filing dateJul 5, 2017
Priority dateJul 6, 2016
Publication dateOct 2, 2018
Grant dateOct 2, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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An alignment optical measurement element includes a grating coupler, and a reflector coupled to the grating coupler. The alignment optical measurement element is arranged so that: the grating coupler diffracts an incident light in a first direction into a first diffracted light to propagate the first diffracted light as a first propagating light in a second direction, the reflector reflects the first propagating light into a second propagating light in a third direction opposite to the second direction; and the grating coupler diffracts the second propagating light into a second diffracted light to emit the second diffracted light as an emitted light in a fourth direction opposite to the first direction.

First claim

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What is claimed is: 1. A method for aligning an optical probe using an alignment optical measurement element, the alignment optical measurement element comprising: a grating coupler comprising a core and a coupler grating; and a reflector coupled to the grating coupler; wherein the alignment optical measurement element is arranged so that: the grating coupler diffracts an incident light in a first direction by the coupler grating into a first diffracted light to propagate the first diffracted light as a first propagating light along the core in a second direction, the reflector reflects the first propagating light into a second propagating light along the core in a third direction opposite to the second direction; and the grating coupler diffracts the second propagating light by the coupler grating into a second diffracted light to emit the second diffracted light as an emitted light in a fourth direction opposite to the first direction, the method comprising: bringing the optical probe in the vicinity of the grating coupler of the alignment optical measurement element; inputting an emitted light from the optical probe to the grating coupler as an incident light; collecting, in the optical probe, an emitted light from the grating coupler as a collected light; measuring the intensity of the collected light with a photo detector to produce a measured value indicative of the light intensity; and adjusting a relative position of the optical probe with respect to a wafer so that the measured value is maximized. 2. The method as claimed in claim 1 , wherein said reflector comprises a grating, a directional coupler, or a reflective component of metal. 3. The method as claimed in claim 1 , wherein the optical probe comprises an optical fiber or a focusing optical system. 4. The method as claimed in claim 1 , wherein the optical probe comprises arrayed fibers. 5. The method as claimed in claim 4 , wherein the number of the arrayed fibers is equal to that of optical input/output grating couplers of an optical circuit included in a single optical chip. 6. The method as claimed in claim 5 , wherein said method further comprises carrying out alignment using at least one of said arrayed fibers and at least one of alignment optical measurement elements. 7. The method as claimed in claim 6 , wherein the arrangement of the arrayed fibers is identical with that of the plurality of optical input/output grating couplers of the optical circuit included in the single optical chip, wherein the method further comprising, after carrying out alignment using the alignment optical measurement elements, aligning all of the plurality of optical input/output grating couplers of the optical circuit included in said single optical chip with said arrayed fibers using known data about relative positions with respect to the alignment optical measurement elements. 8. The method as claimed in claim 7 , wherein the method further comprising, after aligning all of the plurality of optical input/output grating couplers of the optical circuit included in said single optical chip with said arrayed fibers, fixing said arrayed fibers to said single optical chip.

Assignees

Inventors

Classifications

  • using photoelectric detection means · CPC title

  • G01B11/14Primary

    for measuring distance or clearance between spaced objects or spaced apertures (G01B11/26 takes precedence; rangefinders G01C3/00) · CPC title

  • for microlithography (measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775) · CPC title

  • G02B6/34Primary

    utilising prism or grating {(G02B6/293 takes precedence)} · CPC title

  • by observing back-reflected light · CPC title

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What does patent US10088299B2 cover?
An alignment optical measurement element includes a grating coupler, and a reflector coupled to the grating coupler. The alignment optical measurement element is arranged so that: the grating coupler diffracts an incident light in a first direction into a first diffracted light to propagate the first diffracted light as a first propagating light in a second direction, the reflector reflects the…
Who is the assignee on this patent?
Nec Corp, Photonics Electronics Technology Res Ass
What technology area does this patent fall under?
Primary CPC classification G01B11/14. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 02 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).