Films and membranes of poly (aryl ketones) and methods of casting the same from solution

US10087295B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10087295-B2
Application numberUS-201214122306-A
CountryUS
Kind codeB2
Filing dateMay 15, 2012
Priority dateMay 27, 2011
Publication dateOct 2, 2018
Grant dateOct 2, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A method of manufacturing a film or membrane includes: (a) dissolving at least one polymer comprising a poly(aryl ketone) in at least one solvent to form a dope; (b) depositing the dope on a substrate to form a coated substrate at appropriate conditions; and (c) drying the coated substrate to form the film or membrane. The dope may also include additional polymers or fillers, such as carbon nanotubes.

First claim

Opening claim text (preview).

What is claimed: 1. A method of manufacturing a film or membrane using a solvent cast process comprising: dissolving at least one polymer comprising polyetherketoneketone (PEKK) in solvent to form a dope; wherein the solvent consists of solvents (A) and (B) which are different from each other, each having a boiling point at atmospheric pressure of not greater than 250° C., and optionally an aromatic solvent selected from the group consisting of 4-chloro-2-methyl phenol (4-Cl-o-cresol), 4-chloro-3-methyl phenol (4-Cl-m-cresol), 3-chloro phenol, 4-chlorophenol, 4-methyl-phenol (p-cresol) and mixtures thereof, where (A) is selected from the group consisting of brominated, iodinated and/or fluorinated organic acids having a pKa of from 1 to 3, and (B) is selected from the group consisting of dichloromethane (DCM), toluene, dichloroethane, ethyl acetate, or mixtures thereof, or where (A) is selected from the group consisting of chlorinated organic acids and (B) is selected from the group consisting of dichloromethane (DCM), toluene, dichloroethane, ethyl acetate, trifluoroacetic acid, or mixtures thereof, depositing the dope on a substrate to form a coated substrate; and drying the coated substrate to form the film or membrane. 2. A method of manufacturing a film or membrane according to claim 1 , wherein solvent (A) is a brominated, iodinated and/or fluorinated organic acid having a pKA of from 1 to 3 and solvent (B) is selected from the group consisting of dichloromethane (DCM), toluene, dichloroethane, ethyl acetate, or mixtures thereof. 3. A method of manufacturing a film or membrane according to claim 1 , wherein solvent (A) is a chlorinated organic acid and solvent (B) is selected from the group consisting of dichloromethane (DCM), toluene, dichloroethane, ethyl acetate, trifluoroacetic acid, or mixtures thereof. 4. A method of manufacturing a film or membrane according to claim 1 , wherein the solvent includes said aromatic solvent. 5. A method of manufacturing a film or membrane according to claim 1 , wherein solvent (A) is a chlorinated organic acid that is selected from at least one of monochloroacetic acid, dichloroacetic acid, trichloroacetic acid, tetrachlorophthalic acid or mixtures thereof. 6. A method of manufacturing a film or membrane according to claim 1 , wherein solvent (A) is dichloroacetic acid (DCAA). 7. A method of manufacturing a film or membrane according to claim 1 , wherein solvent (B) is dichloromethane (DCM). 8. A method of manufacturing a film or membrane according to claim 1 , wherein the solvent consists of solvent (A) which is dichloroacetic acid (DCAA) and solvent (B) which is dichloromethane (DCM). 9. A method of manufacturing a film or membrane according to claim 1 , wherein the dope comprises an additional component selected from the group consisting of additional polymers, additives, fillers, and mixtures thereof. 10. A method of manufacturing a film or membrane according to claim 1 , wherein the dope comprises carbon nanotubes. 11. A method of manufacturing a film or membrane according to claim 10 , wherein the dope comprises up to 45 wt. % carbon nanotubes. 12. A method of manufacturing a film or membrane according to claim 1 , wherein the substrate is selected from the group consisting of glass, polymer film, metal sheet, and silicon wafer. 13. A method of manufacturing a film or membrane according to claim 1 , wherein the at least one polymer is dissolved at or above room temperature. 14. A method of manufacturing a film or membrane according to claim 1 , wherein the coated substrate is dried at or above room temperature. 15. A method of manufacturing a film or membrane according to claim 11 , wherein the coated substrate is dried at a temperature below the boiling point of the highest boiling point solvent in the dope. 16. A method of manufacturing a film or membrane according to claim 1 further comprising depositing at least one additional coating of dope on the substrate.

Assignees

Inventors

Classifications

  • Post-polymerisation treatment, e.g. recovery, purification, drying · CPC title

  • C08J5/18Primary

    Manufacture of films or sheets · CPC title

  • characterised by the choice of material · CPC title

  • Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule · CPC title

  • C08L71/00Primary

    Compositions of polyethers obtained by reactions forming an ether link in the main chain (of polyacetals C08L59/00; of epoxy resins C08L63/00; of polythioether-ethers C08L81/02; of polyether-sulfones C08L81/06); Compositions of derivatives of such polymers · CPC title

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What does patent US10087295B2 cover?
A method of manufacturing a film or membrane includes: (a) dissolving at least one polymer comprising a poly(aryl ketone) in at least one solvent to form a dope; (b) depositing the dope on a substrate to form a coated substrate at appropriate conditions; and (c) drying the coated substrate to form the film or membrane. The dope may also include additional polymers or fillers, such as carbon nan…
Who is the assignee on this patent?
Roger Christophe, GARCIA LEINER Manuel A, Laffitte Jean Alex, and 4 more
What technology area does this patent fall under?
Primary CPC classification C08J5/18. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 02 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).