Method for producing aryl-functional silanes

Patent metadata

Field	Value
Publication number	US-10081643-B2
Application number	US-201515508563-A
Country	US
Kind code	B2
Filing date	Nov 6, 2015
Priority date	Dec 18, 2014
Publication date	Sep 25, 2018
Grant date	Sep 25, 2018

Abstract

A method for preparing a reaction product including an aryl-functional silane includes sequential steps (1) and (2). Step (1) is contacting, under silicon deposition conditions, (A) an ingredient including (I) a halosilane such as silicon tetrahalide and optionally (II) hydrogen (H 2 ); and (B) a metal combination comprising copper (Cu) and at least one other metal, where the at least one other metal is selected from the group consisting of gold (Au), cobalt (Co), chromium (Cr), iron (Fe), magnesium (Mg), manganese (Mn), nickel (Ni), palladium (Pd), and silver (Ag); thereby forming a silicon alloy catalyst comprising Si, Cu and the at least one other metal. Step (2) is contacting the silicon alloy catalyst and (C) a reactant including an aryl halide under silicon etching conditions.

First claim

The invention claimed is:

1. A method for preparing a reaction product comprising an aryl-functional silane comprises sequential steps (1) and (2), where:
step (1) is contacting, under silicon deposition conditions
(A) an ingredient comprising (I) a halosilane of formula H a SiX (4-a) , where each X is independently a halogen atom, and 0<a<1; and optionally (II) H 2 , with the proviso that when a=0, then the hydrogen is present; and
(B) a metal combination comprising copper and at least one other metal, where the at least one other metal is selected from the group consisting of cobalt, chromium, iron, manganese, nickel, palladium, and silver; thereby forming a silicon alloy catalyst comprising silicon, copper and the at least one other metal; and

step (2) is contacting the silicon alloy catalyst and (C) a reactant comprising an aryl halide under silicon etching conditions; thereby forming the reaction product, where the reaction product comprises the aryl-functional silane and a spent catalyst;
where the method may optionally further comprise step (3) and step (4), where
step (3) is contacting, under silicon deposition conditions, an additional ingredient comprising (I) an additional halosilane of formula H a SiX (4-a) and optionally (II) additional H 2 ; thereby re-forming the silicon alloy catalyst, and
step (4) is contacting the silicon alloy catalyst re-formed in step (3) with an additional reactant comprising an additional aryl halide; thereby forming an additional amount of the reaction product, where the reaction product comprises the aryl-functional silane and the spent catalyst; and
where the method, when further comprising steps (3) and (4), optionally further comprises step (5), where step (5) is repeating steps (3) and (4) at least one time; and
where the method optionally further comprises step (6), where step (6) is recovering the aryl-functional silane after step (2), and/or when present, step (4), and/or step (5).

2. The method of claim 1 , further comprising one or more additional steps, where the one or more steps are selected from:
purging and/or treating the metal combination, before contacting the metal combination with the ingredient comprising the halosilane in step (1); and/or
purging and/or treating the silicon alloy catalyst, before contacting the silicon alloy catalyst with the reactant comprising the aryl halide in step (2); and/or
purging and/or treating, the spent reactant before contacting the spent reactant with the additional ingredient in step (3); and/or
purging and/or treating the reactant re-formed in step (3), before contacting the reactant re-formed in step (3) with the additional reactant in step (4); and/or
purging and/or treating the additional spent reactant.

3. The method of claim 1 , where a mole ratio of the H 2 to the halosilane ranges from 20:1 to 1:1.

4. The method of claim 1 , where the at least one other metal comprises palladium.

5. The method of claim 1 , where the at least one other metal comprises nickel.

6. The method of claim 5 , where the at least one other metal further comprises palladium.

7. The method of claim 1 , where the at least one other metal comprises iron.

8. The method of claim 7 , where the at least one other metal comprises palladium.

9. The method of claim 1 , where one of conditions (A) to (D) is satisfied:
(A) the at least one other metal comprises silver, or
(B) the at least one other metal comprises cobalt, or
(C) the at least one other metal comprises chromium, or
(D) the at least one other metal comprises manganese.

10. The method of claim 1 , where the metal combination is provided on a support.

11. The method of claim 1 , where step (1) is performed at a first temperature from 500° C. to 1000° C., and step (2) is performed at a second temperature from 100° C. to 600° C., with the proviso that the second temperature is lower than the first temperature.

12. The method of claim 1 , where the halosilane (I) is silicon tetrachloride.

13. The method of claim 1 , where the aryl halide is chlorobenzene.

14. The method of claim 1 , where the aryl functional silane comprises one or more of PhSiCl 3 , Ph 2 SiCl 2 , and PhHSiCl 2 .

15. The method of claim 1 , where step (2) is performed in the absence of hydrogen.

Assignees

• Dow Corning
• Dow Silicones Corp

Inventors

• Katsoulis Dimitris
• Mclaughlin Matthew J
• Morgan Robert
• Sparschu Wendy

Classifications

• C08G77/04 Primary

  Polysiloxanes · CPC title

• B01J23/8946

  with alkali or alkaline earth metals · CPC title

• B01J23/755

  Nickel · CPC title

• B01J37/0236

  Drying, e.g. preparing a suspension, adding a soluble salt and drying · CPC title

• B01J37/0205

  in several steps · CPC title