Self-assembled structures, method of manufacture thereof and articles comprising the same

US10078261B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10078261-B2
Application numberUS-201314020343-A
CountryUS
Kind codeB2
Filing dateSep 6, 2013
Priority dateSep 6, 2013
Publication dateSep 18, 2018
Grant dateSep 18, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent.

First claim

Opening claim text (preview).

What is claimed is: 1. A graft block copolymer comprising: a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a repeat unit comprising a surface energy reducing moiety chosen from a halocarbon containing moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent; where the second graft polymer comprises poly(1-ethylcyclopentyl methacrylate). 2. The copolymer of claim 1 , where the backbone polymer is a polynorbornene. 3. The copolymer of claim 1 , where the first graft polymer is a polymer derived from the polymerization of a fluorinated (meth)acrylate or a fluorinated (meth)acrylic. 4. The copolymer of claim 1 , where the first graft polymer comprises poly(5,5,5-trifluoro-4-hydroxy-2-methyl-4-(trifluoromethyl)pentyl methacrylate). 5. The copolymer of claim 1 , where the second graft polymer comprises a poly(1-tri(alkyl)methyl methacrylate). 6. The copolymer of claim 1 , where the second graft polymer is a copolymer derived from the polymerization of at least two of 1-ethylcyclopentyl methacrylate, γ-butyrolactone-2-yl methacrylate, tertiary butoxycarbonyl protected hydroxystyrene, N-phenyl maleimide and triphenylsulfonium 1,1-difluoro-2-(methacryloxy)ethanesulfonate. 7. The copolymer of claim 1 , where the second graft polymer comprises a first block copolymer and a second block copolymer; where the first block copolymer comprises poly(1-ethylcyclopentyl methacrylate) and poly(triphenylsulfonium 1,1-difluoro-2-(methacryloxy)ethanesulfonate) and where the second block copolymer comprises poly(1-ethylcyclopentyl methacrylate and poly(γ-butyrolactone-2-yl methacrylate). 8. The copolymer of claim 1 , where the first graft polymer and/or the second graft polymer each comprise a functional group that undergoes acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent and where the graft block copolymer further comprises a photoacid generator. 9. A method of manufacturing a graft block copolymer comprising: reacting a precursor to a backbone polymer with a first chain transfer agent to form a first backbone polymer precursor-chain transfer agent moiety; reacting the first backbone polymer precursor-chain transfer agent moiety with a precursor to a first graft polymer; polymerizing the precursor to the first graft polymer to form a first graft polymer; where the first graft polymer comprises a repeat unit comprising a surface energy reducing moiety chosen from a halocarbon containing moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; polymerizing the backbone polymer precursor of the first graft polymer to form the first block polymer; reacting a precursor to a backbone polymer with a second chain transfer agent to form a second backbone polymer precursor-chain transfer agent moiety; reacting the second backbone polymer precursor-chain transfer agent moiety with a precursor or precursors to a second graft copolymer; polymerizing the precursor or precursors to the second graft polymer to form the second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent; and polymerizing the backbone polymer precursor of the second graft polymer to form the second block polymer; and reacting the first block polymer with the second block polymer to form the graft block copolymer.

Assignees

Inventors

Classifications

  • the macromolecular compound having an alicyclic moiety in a side chain · CPC title

  • using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent · CPC title

  • C08G81/02Primary

    at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds · CPC title

  • the macromolecular compound having a backbone with alicyclic moieties · CPC title

  • Applications · CPC title

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Frequently asked questions

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What does patent US10078261B2 cover?
Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the…
Who is the assignee on this patent?
Texas A & M Univ Sys, Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification C08F293/005. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 18 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).