Laser system

Patent metadata

Field	Value
Publication number	US-10074958-B2
Application number	US-201615353235-A
Country	US
Kind code	B2
Filing date	Nov 16, 2016
Priority date	Jun 20, 2014
Publication date	Sep 11, 2018
Grant date	Sep 11, 2018

Abstract

The laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam, and a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam.

First claim

The invention claimed is:

1. A laser system comprising:
a plurality of laser apparatuses;
a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam;
a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam;
beam steering devices provided in respective optical paths between the respective laser apparatuses and the beam parameter measuring device;
a controller configured to control the beam steering devices based on measurement result of the beam parameter measuring device; and
beam divergence adjusters provided in the respective optical paths between the respective laser apparatuses and the respective beam steering devices, wherein
the controller controls the beam steering devices and the beam divergence adjusters based on the measurement result of the beam parameter measuring device.

2. The laser system according to claim 1 , wherein
the beam parameter measuring device includes a selecting mechanism, the selecting mechanism being configured to select at least one of the pulse laser beams, the beam parameter measuring device being configured to measure the beam parameter of each one of the at least one of the pulse laser beams.

3. The laser system according to claim 1 , wherein
the beam parameter measuring device includes an image sensor and a selecting mechanism, the selecting mechanism being configured to select at least one of the pulse laser beams to have the at least one of the pulse laser beams enter the image sensor, the image sensor being configured to measure the beam parameter of each one of the at least one of the pulse laser beams.

4. A laser system comprising:
a plurality of laser apparatuses;
a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam;
a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam;
beam steering devices provided in respective optical paths between the respective laser apparatuses and the beam parameter measuring device;
a controller configured to control the beam steering devices based on measurement result of the beam parameter measuring device; and
optical path length adjusters provided in the respective optical paths between the respective laser apparatuses and the respective beam steering devices, wherein
the controller controls the beam steering devices and the optical path length adjusters based on the measurement result of the beam parameter measuring device.

5. The laser system according to claim 4 , wherein
the beam parameter measuring device includes a selecting mechanism, the selecting mechanism being configured to select at least one of the pulse laser beams, the beam parameter measuring device being configured to measure the beam parameter of each one of the at least one of the pulse laser beams.

6. The laser system according to claim 4 , wherein
the beam parameter measuring device includes an image sensor and a selecting mechanism, the selecting mechanism being configured to select at least one of the pulse laser beams to have the at least one of the pulse laser beams enter the image sensor, the image sensor being configured to measure the beam parameter of each one of the at least one of the pulse laser beams.

7. A laser system comprising:
a plurality of laser apparatuses;
a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam;
a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam;
beam steering devices provided in respective optical paths between the respective laser apparatuses and the beam parameter measuring device;
a controller configured to control the beam steering devices based on measurement result of the beam parameter measuring device; and
beam divergence adjusters provided in the respective laser apparatuses, wherein
the controller controls the beam steering devices and the beam divergence adjusters based on the measurement result of the beam parameter measuring device.

8. The laser system according to claim 7 , wherein
the beam parameter measuring device includes a selecting mechanism, the selecting mechanism being configured to select at least one of the pulse laser beams, the beam parameter measuring device being configured to measure the beam parameter of each one of the at least one of the pulse laser beams.

9. The laser system according to claim 7 , wherein
the beam parameter measuring device includes an image sensor and a selecting mechanism, the selecting mechanism being configured to select at least one of the pulse laser beams to have the at least one of the pulse laser beams enter the image sensor, the image sensor being configured to measure the beam parameter of each one of the at least one of the pulse laser beams.

Assignees

• Gigaphoton Inc

Inventors

• Wakabayashi Osamu
• Arakawa Masaki
• Kakizaki Kouji

Classifications

• H01S3/1305 Primary

  Feedback control systems · CPC title

• H01S3/1394

  by using an active reference, e.g. second laser, klystron or other standard frequency source · CPC title

• H01S3/0014

  Monitoring arrangements not otherwise provided for (photometry G01J1/00, e.g. G01J1/4257; radiation pyrometry G01J5/00; measuring coherence of light G01J9/00; measuring wavelength of light G01J9/00, e.g. G01J9/0246; measuring optical pulses G01J11/00; calorimetrically measuring power of laser beams G01K17/003) · CPC title

• G01J1/4257 Primary

  applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam (monitoring arrangements for lasers in general H01S3/0014) · CPC title

• H01S3/225

  comprising an excimer or exciplex · CPC title