Non-ionic compound, resin, resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-10073343-B2
Application number	US-201514950342-A
Country	US
Kind code	B2
Filing date	Nov 24, 2015
Priority date	Nov 26, 2014
Publication date	Sep 11, 2018
Grant date	Sep 11, 2018

Abstract

A compound which is non-ionic compound, the compound has a group represented by formula (Ia):

wherein R 2 represents a group having a C 3 to C 18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf 1 and Rf 2 each independently represent a C 1 to C 4 perfluoroalkyl group, and * represents a binding site.

First claim

What is claimed is:

1. A resin consisting of a structural unit derived from a compound represented by formula (I):

wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom,
R 2 represents a group having a C 3 to C 18 polycyclic alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group,
Rf 1 and Rf 2 each independently represent a C 1 to C 4 perfluoroalkyl group,
A 1 represents **-A 2 -O—, **-A 2 -O—CO—, **-A 2 -CO—O-A 3 -CO—O—, **-A 2 -CO—O-A 3 -CO—O-A 4 -, **-A 2 -O—CO-A 3 -O—, **-A 2 -O—A 3 -CO—O—, **-A 2 -CO—or **-A 2 -O—CO-A 3 O—CO—, where ** represents a binding site to an oxygen atom,
A 2 , A 3 and A 4 each independently represent a C 1 to C 6 alkanediyl group;
or comprising the structural unit and a structural unit represented by formula (a5-1):

wherein, R 51 represents a hydrogen atom or a methyl group,
R 52 represents a C 3 to C 18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C 1 to C 8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L 51 has no aliphatic hydrocarbon group by which a hydrogen atom has been replaced, and
L 51 represents a single bond or a C 1 to C 18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group.

2. The resin according to claim 1 , wherein
R 2 is a group having an adamantyl group where a methylene group may be replaced by an oxygen atom or a carbonyl group.

3. The resin according to claim 1 , wherein
R 2 is an adamantyl group.

4. The resin according to claim 1 , wherein
A 1 is **-A 2 -O—CO—.

5. A resist composition comprising
the resin according to claim 1 ,
a resin having an acid-labile group, and
an acid generator.

6. The resist composition according to claim 5 , further comprising a salt which generates an acid weaker in acidity than an acid generated from the acid generator.

7. A method for producing a resist pattern comprising steps (1) to (5);
(1) applying the resist composition according to claim 5 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer, and
(5) developing the heated composition layer.

8. The resin according to claim 1 , consisting of the structural unit derived from the compound represented by formula (I).

9. The resin according to claim 1 , comprising the structural unit derived from the compound represented by formula (I) and the structural unit represented by formula (a5-1).

Assignees

• Sumitomo Chemical Co

Inventors

• Masuyama Tatsuro
• Mukai Yuichi
• Ichikawa Koji

Classifications

• C07C69/757

  having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, [IMAGE cpc-sch-C07C-0958.gif] groups,[IMAGE cpc-sch-C07C-0959.gif] groups, or[IMAGE cpc-sch-C07C-0960.gif] in the acid moiety · CPC title

• G03F7/0382 Primary

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• C07C69/75 Primary

  of acids with a six-membered ring · CPC title

• G03F7/38

  Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title