Array substrate and method for preparing the same, and display device

Patent metadata

Field	Value
Publication number	US-10067377-B2
Application number	US-201314381619-A
Country	US
Kind code	B2
Filing date	Nov 6, 2013
Priority date	Jul 29, 2013
Publication date	Sep 4, 2018
Grant date	Sep 4, 2018

Abstract

The present invention discloses an array substrate and a method for preparing the same, and a display device. The array substrate comprises a substrate, and a thin-film transistor and a passivation layer formed on a side of the substrate, and the array substrate is divided into a reflective region and a transmissive region, wherein an insulating layer is formed on the reflective region on a side of the passivation layer that is far from the substrate, and a nanoparticle layer for diffuse reflecting an incident light is formed on a side of the insulating layer that is far from the substrate. Not only the viewing angle of the array substrate is enlarged, but also the performances of the array substrate such as transmittance, contrast and dark-state uniformity are guaranteed, thus the present invention is especially applicable for display devices for large-scale outdoor display.

First claim

What is claimed is:

1. An array substrate, comprising a substrate, and a thin-film transistor and a passivation layer formed on a side of the substrate, that the array substrate is divided into a reflective region and a transmissive region, wherein
an insulating layer is formed on the reflective region on a side of the passivation layer that is far from the substrate;
a nanoparticle layer with a uniform thickness for diffuse reflecting an incident light is formed from metal oxide nanoparticles on a side of the insulating layer that is far from the substrate; and
the metal oxide nanoparticles are stacked on the side of the insulating layer to form the reflective region with different radians, so that an incident light is reflected at different angles and then a viewing angle is enlarged.

2. The array substrate according to claim 1 , wherein the metal oxide nanoparticles are at least one selected from titanium dioxide nanoparticle, aluminum oxide nanoparticle and zinc oxide nanoparticle.

3. The array substrate according to claim 1 , wherein the insulating layer comprises a material of resin or silicon dioxide.

4. A display device, comprising the array substrate according to claim 1 .

5. A method for preparing an array substrate which is divided into a reflective region and a transmissive region, the method comprising steps of:
forming a thin-film transistor and a passivation layer on a substrate;
forming an insulating layer on the reflective region on a side of the passivation layer that is far from the substrate; and
forming a nanoparticle layer from metal oxide nanoparticles with a uniform thickness for diffuse reflecting an incident light on a side of the insulating layer that is far from the substrate, wherein the metal oxide nanoparticles are stacked on the side of the insulating layer to form the reflective region with different radians, so that an incident light is reflected at different angles and then a viewing angle is enlarged.

6. The method according to claim 5 , wherein the step of forming a nanoparticle layer with a uniform thickness for diffuse reflecting an incident light on a side of the insulating layer that is far from the substrate comprises:
coating a photoresist doped with nanoparticles on the insulating layer; and
exposing the photoresist to form the nanoparticle layer.

7. The method according to claim 5 , further comprising a step of removing the exposed photoresist.

8. The method according to claim 7 , wherein the step of removing the exposed photoresist comprises dissolving the exposed photoresist using a solvent.

9. The method according to claim 8 , further comprising: baking the substrate formed with the nanoparticle layer after dissolving using the solvent.

10. The method according to claim 6 , wherein the step of coating a photoresist doped with nanoparticles on the insulating layer comprises: sheltering the transmissive region of the array substrate by a mask, and coating the photoresist doped with nanoparticles on the insulating layer.

11. The method according to claim 5 , wherein the metal oxide nanoparticles are at least one selected from titanium dioxide nanoparticle, aluminum oxide nanoparticle and zinc oxide nanoparticle.

12. The method according to claim 5 , wherein the insulating layer employs a material of resin or silicon dioxide.

Assignees

• Boe Technology Group Co Ltd

Inventors

• Wang Xinxing
• You Jaegeon
• Yao Jikai

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• G02F1/1368

  in which the switching element is a three-electrode device {(G02F1/136277 takes precedence)} · CPC title

• G02F1/133555 Primary

  Transflectors · CPC title

• G02F1/133345

  Insulating layers (G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence) · CPC title

• G02F1/133504

  Diffusing, scattering, diffracting elements (associated to illuminating devices G02F1/133606) · CPC title