Method and apparatus for argon rejection and recovery

US10066871B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10066871-B2
Application numberUS-201615057150-A
CountryUS
Kind codeB2
Filing dateMar 1, 2016
Priority dateJul 31, 2015
Publication dateSep 4, 2018
Grant dateSep 4, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method and apparatus for argon rejection and recovery in which argon is separated from air within a cryogenic air separation plant having a divided wall argon rejection column arrangement and condensed using an argon condenser disposed internally within the lower pressure column. The divided wall argon rejection column arrangement may be an annular arrangement or a side-by-side arrangement (i.e. segmented or planar configuration). The resulting argon stream is subsequently rejected or recovered and optionally purified within an integrated adsorbent based argon refining and purification subsystem to produce product grade argon.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of producing an impure argon-rich stream in a cryogenic air separation plant, the method comprising the steps of: (a) directing a flow of compressed and purified feed air into a higher pressure column configured to produce an oxygen-enriched liquid and a nitrogen-rich stream by cryogenic rectification within the higher pressure column; (b) withdrawing the nitrogen rich stream from the higher pressure column and directing it to a lower pressure column configured to produce an oxygen product stream and a nitrogen waste stream and optionally a nitrogen-rich product stream by cryogenic rectification within the lower pressure column; (c) directing an argon-oxygen containing vapor stream from the lower pressure column to an argon rectification column disposed within the lower pressure column, the argon rectification column configured to produce an impure argon-rich vapor stream having oxygen impurities and an oxygen-rich bottoms liquid by cryogenic rectification within the argon rectification column; (d) directing the oxygen-rich bottoms liquid from the argon rectification column to the lower pressure column; (e) directing a portion of the impure argon rich vapor stream to an argon condensing assembly disposed within the lower pressure column at a location above the argon rectification column; (f) withdrawing the oxygen-enriched liquid from the higher pressure column, combining it with a portion of down-flowing liquid in the lower pressure column to form a combined stream as a boiling side fluid, and directing the combined stream to the argon condensing assembly, the argon condensing assembly configured to condense the impure argon-rich vapor stream against the boiling side fluid to produce an impure argon-rich liquid stream and a partially vaporized oxygen-rich stream; (g) passing the partially vaporized oxygen-rich stream from the argon condensing assembly into the lower pressure column; and (h) removing the impure argon-rich liquid stream from the argon condensing assembly disposed within the lower pressure column as an argon rejection stream; wherein the argon rejection stream contains between about 4% and 25% of oxygen impurities. 2. The method of claim 1 wherein a portion of the impure argon-rich liquid stream from the argon condensing assembly is directed to the argon rectification column as a reflux stream and a portion of the impure argon-rich liquid stream from the argon condensing assembly is taken as the argon rejection stream and directed to an argon refining and purification subsystem. 3. The method of claim 1 , wherein the argon rectification column is a partitioned section within an outer shell of the lower pressure column and comprises: a partition wall having a top section, a bottom section, a first surface, and a second surface opposite the first surface, the partition wall disposed within an outer shell of the lower pressure column; a plurality of mass transfer elements disposed adjacent to the first surface of the partitioned wall; an inlet disposed at the bottom section of the partition wall for receiving an ascending argon-oxygen containing vapor stream; an outlet disposed at the top section of the partition wall for withdrawing an ascending argon-rich vapor; an inlet disposed at the top section of the partition wall for receiving a down flowing liquid stream; and an outlet disposed at the bottom section of the partition wall for withdrawing a descending oxygen rich liquid stream. 4. The method of claim 3 , wherein the partition wall has a planar shape defining a divided column structure with one portion of the divided column structure defining an argon region containing the mass transfer elements for the argon rectification column and the adjacent portion of the divided column structure defining an oxygen region containing a portion of mass transfer elements for the lower pressure column. 5. The method of claim 4 , wherein the mass transfer elements for the argon rectification column comprise trays. 6. The method of claim 4 , wherein the mass transfer elements for the argon rectification column comprise structured packing. 7. The method of claim 4 , wherein the mass transfer elements for the argon rectification column comprise strip packing. 8. The method of claim 4 , wherein the mass transfer elements for the argon rectification column comprise silicon carbide packing. 9. The method of claim 3 , wherein the partition wall has a cylindrical shape defining a divided column structure with one portion of the divided column structure defining an annular argon region containing the mass transfer elements for the argon rectification column and the adjacent portion of the divided column structure defining an annular oxygen-nitrogen region containing a portion of mass transfer elements for the lower pressure column, and wherein the annular argon region surrounds and is concentric with the annular oxygen-nitrogen region. 10. The method of claim 9 , wherein the mass transfer elements for the argon rectification column comprise trays. 11. The method of claim 9 , wherein the mass transfer elements for the argon rectification column comprise structured packing. 12. The method of claim 9 , wherein the mass transfer elements for the argon rectification column comprise strip packing. 13. The method of claim 9 , wherein the mass transfer elements for the argon rectification column comprise silicon carbide packing. 14. The method of claim 1 , wherein the argon condensing assembly is a once through argon condenser. 15. A method of producing an impure argon-rich stream in a cryogenic air separation plant, the method comprising the steps of: (a) directing a flow of compressed and purified feed air into a higher pressure column configured to produce an oxygen-enriched liquid and a nitrogen-rich stream by cryogenic rectification within the higher pressure column; (b) withdrawing the nitrogen rich stream from the higher pressure column and directing it to a lower pressure column configured to produce an oxygen product stream and a nitrogen waste stream and optionally a nitrogen-rich product stream by cryogenic rectification within the lower pressure column; (c) directing an argon-oxygen containing vapor stream from the lower pressure column to an argon rectification column disposed within the lower pressure column, the argon rectification column configured to produce an impure argon-rich vapor stream having oxygen impurities and an oxygen-rich bottoms liquid by cryogenic rectification within the argon rectification column; (d) directing the oxygen-rich bottoms liquid from the argon rectification column to the lower pressure column; (e) directing a portion of the impure argon rich vapor stream to an argon condensing assembly disposed within the lower pressure column at a location above the argon rectification column; (f) withdrawing the oxygen-enriched liquid from the higher pressure column, combining it with a portion of down-flowing liquid in the lower pressure column to form a combined stream as a boiling side fluid, and directing the combined stream to the argon condensing assembly, the argon condensing assembly configured to condense the impure argon-rich vapor stream against the boiling side fluid to produce an impure argon-rich liquid stream and a partially vaporized oxygen-rich stream; (g) passing the partially vaporized oxygen-rich stream from the argon condensing assembly into the lower pressure column; (h) removing a portion of the impure argon-rich vapor stream from the argon rectification column as an argon rejection stream; (i) directing the argon rejection st

Assignees

Inventors

Classifications

  • using a hybrid system, e.g. using adsorption, permeation or catalytic reaction · CPC title

  • using solely hydrostatic liquid head · CPC title

  • Pressure swing adsorption · CPC title

  • in combination with an auxiliary pure argon column · CPC title

  • in a classical double column flowsheet, i.e. with thermal coupling by a main reboiler-condenser in the bottom of low pressure respectively top of high pressure column · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10066871B2 cover?
A method and apparatus for argon rejection and recovery in which argon is separated from air within a cryogenic air separation plant having a divided wall argon rejection column arrangement and condensed using an argon condenser disposed internally within the lower pressure column. The divided wall argon rejection column arrangement may be an annular arrangement or a side-by-side arrangement (i…
Who is the assignee on this patent?
Prosser Neil M, Luo Yang, Larson Kirk F, and 1 more
What technology area does this patent fall under?
Primary CPC classification F25J3/04412. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Sep 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).