Pressure differentiated exhaust aftertreatment device

US10066529B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10066529-B2
Application numberUS-201514746537-A
CountryUS
Kind codeB2
Filing dateJun 22, 2015
Priority dateJun 27, 2014
Publication dateSep 4, 2018
Grant dateSep 4, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The disclosure relates to an exhaust gas aftertreatment device for purification of exhaust gas emissions. The exhaust gas aftertreatment device is arranged in an exhaust gas passage subsequently of an internal combustion engine and includes an encapsulating portion, a first catalytic substrate and a second catalytic substrate. The second catalytic substrate may be of SCR type. The exhaust gas aftertreatment device includes a reductant injecting device, a pipe and an obstructing portion, where the reductant injecting device is arranged such that reductant is injectable within the pipe and the exhaust gas flow through the pipe can be controlled by the obstructing portion.

First claim

Opening claim text (preview).

What is claimed is: 1. An exhaust gas aftertreatment device for purification of exhaust gas emissions, the exhaust gas aftertreatment device for arrangement in an exhaust gas passage subsequently of an internal combustion engine, and for enclosure by an encapsulating portion of the exhaust gas passage, the exhaust gas aftertreatment device comprising: a first catalytic substrate and a second catalytic substrate, the first catalytic substrate for arrangement upstream of the second catalytic substrate, the first and second catalytic substrates for arrangement such that a respective catalytic substrate covers a majority of a respective flow cross sectional area of the exhaust gas passage, and the first and second catalytic substrates for arrangement to extend a respective length in a flow direction of the exhaust gas passage; a reductant injecting device; and a pipe for arrangement in the flow direction of the first catalytic substrate such that the pipe provides a passage through the first catalytic substrate, the pipe comprising an obstructing portion for arrangement such that the obstructing portion covers a cross sectional area of the pipe such that a difference in back pressure is obtainable between the pipe and the first catalytic substrate, wherein the reductant injecting device is configured to extend through the encapsulating portion upstream of the first catalytic substrate, and through the obstructing portion and into the pipe, such that reductant is injectable within the pipe and downstream of the obstructing portion. 2. An exhaust gas aftertreatment device according to claim 1 wherein the obstructing portion creates a higher back pressure than the first catalytic substrate. 3. An exhaust gas aftertreatment device according to claim 1 wherein the exhaust gas flow enters the exhaust gas aftertreatment device in a first flow direction (A) and is discharged from the exhaust gas aftertreatment device in a second flow direction (B), and the reductant injecting device is configured such that the reductant is injectable substantially in the first flow direction. 4. An exhaust gas aftertreatment device according to claim 3 wherein the encapsulating portion comprises, in the order of the exhaust gas flow: an inlet portion; a first substrate outer encapsulating portion; a turnaround surface portion; a mixing area encapsulating portion; a second substrate encapsulating portion; and an outlet portion; wherein the exhaust gas flow enters the exhaust gas aftertreatment device at the inlet portion in the first flow direction and is discharged from the exhaust gas aftertreatment device at the outlet portion in the second flow direction, and wherein the turnaround surface portion provides a turnaround surface between the first catalytic substrate and the second catalytic substrate such that the exhaust gas flow is redirected from the first flow direction to the second flow direction. 5. A vehicle comprising the exhaust gas aftertreatment device according to claim 1 .

Assignees

Inventors

Classifications

  • having two or more separate purifying devices arranged in series · CPC title

  • Selective catalytic reduction [SCR] · CPC title

  • Sprayers or atomisers; Arrangement thereof in the exhaust apparatus · CPC title

  • the purifying devices are arranged in a single housing · CPC title

  • the substance being ammonia or urea · CPC title

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What does patent US10066529B2 cover?
The disclosure relates to an exhaust gas aftertreatment device for purification of exhaust gas emissions. The exhaust gas aftertreatment device is arranged in an exhaust gas passage subsequently of an internal combustion engine and includes an encapsulating portion, a first catalytic substrate and a second catalytic substrate. The second catalytic substrate may be of SCR type. The exhaust gas a…
Who is the assignee on this patent?
Volvo Car Corp
What technology area does this patent fall under?
Primary CPC classification F01N3/2892. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Sep 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).