Apparatus and method for thin-film processing applications

Patent metadata

Field	Value
Publication number	US-10066291-B2
Application number	US-201415118810-A
Country	US
Kind code	B2
Filing date	Feb 21, 2014
Priority date	Feb 21, 2014
Publication date	Sep 4, 2018
Grant date	Sep 4, 2018

Abstract

According to the present disclosure, a flexible substrate coating apparatus is provided. The flexible substrate coating apparatus includes a vacuum process chamber for processing a flexible substrate. The vacuum process chamber includes one or more deposition units and a cleaning unit positioned directly downstream of the one or more deposition units. In another aspect, a method for depositing a thin-film on a flexible substrate is provided. The method for depositing a thin-film on a flexible substrate includes vacuum coating of the flexible substrate, thereby depositing one or more layers on the flexible substrate, and cleaning the flexible substrate directly downstream of the coating.

First claim

The invention claimed is:

1. A flexible substrate coating apparatus, comprising,
a vacuum process chamber for processing a flexible substrate, the vacuum process chamber including one or more deposition units;
a coating drum having an axis of rotation; and
a cleaning unit positioned directly downstream of the one or more deposition units, wherein the cleaning unit is positioned such that it contacts the flexible substrate at a position where the flexible substrate is in contact with the coating drum.

2. The flexible substrate coating apparatus according to claim 1 , wherein the cleaning unit includes a particle displacement unit and a particle dissipation unit.

3. The flexible substrate coating apparatus according to claim 1 , further including one or more deflection rolls that are positioned downstream of the one or more deposition units, wherein all of the one or more deflection rolls that contact the flexible substrate on a coated side of the flexible substrate and positioned downstream of the one or more deposition units are positioned downstream of the cleaning unit.

4. The flexible substrate coating apparatus according to claim 1 , wherein the cleaning unit includes a first adhesive roll and a second adhesive roll.

5. The flexible substrate coating apparatus according to claim 4 , wherein the first adhesive roll is positioned so as to contact the flexible substrate in operation of the flexible substrate deposition apparatus, and the second adhesive roll is positioned such that the surface of the second adhesive roll is in contact with the surface of the first adhesive roll.

6. The flexible substrate coating apparatus according to claim 1 , wherein all of the one or more deposition units are positioned below the axis of rotation of the coating drum.

7. The flexible substrate coating apparatus according to claim 1 , further comprising one or more of a cooling unit for cooling the coating drum, a cooling unit for cooling the cleaning unit, and a heating unit for heating the coating drum.

8. The flexible substrate coating apparatus according to claim 1 , further including one or more spool chambers for receiving a flexible substrate spool, wherein the pressure in the one or more spool chambers is higher than in the vacuum process chamber.

9. The flexible substrate coating apparatus according to claim 1 , wherein the cleaning unit includes a laser.

10. The flexible substrate coating apparatus according to claim 4 , wherein the second adhesive roll has stronger adherence of particles thereto than the first adhesive roll.

11. The flexible substrate deposition apparatus according to claim 5 , wherein the second adhesive roll is positioned such that it is not in contact with the flexible substrate during operation of the flexible substrate deposition apparatus.

12. The flexible substrate coating apparatus according to claim 1 , wherein at least half of the one or more deposition units are positioned below the axis of rotation of the coating drum.

13. The flexible substrate coating apparatus according to claim 8 , wherein the one or more spool chambers are positioned adjacent to the vacuum process chamber.

14. The flexible substrate coating apparatus of claim 1 , wherein the cleaning unit includes a suction unit.

Assignees

• Applied Materials Inc

Inventors

• Deppisch Thomas

Classifications

• C23C14/562

  for coating elongated substrates · CPC title

• H01J2237/3321

  CVD [Chemical Vapor Deposition] · CPC title

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

• C23C16/56

  After-treatment · CPC title

• H01J37/32082

  Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence) · CPC title