Scaffold-free 3D porous electrode and method of making a scaffold-free 3D porous electrode

Patent metadata

Field	Value
Publication number	US-10062904-B2
Application number	US-201615163003-A
Country	US
Kind code	B2
Filing date	May 24, 2016
Priority date	May 26, 2015
Publication date	Aug 28, 2018
Grant date	Aug 28, 2018

Abstract

A scaffold-free 3D porous electrode comprises a network of interconnected pores, where each pore is surrounded by a multilayer film including a first layer of electrochemically active material, one or more monolayers of graphene on the first layer of electrochemically active material, and a second layer of electrochemically active material on the one or more monolayers of graphene. A method of making a scaffold-free 3D porous electrode includes depositing one or more monolayers of graphene onto a porous scaffold to form a graphene coating on the porous scaffold, and depositing a first layer of an electrochemically active material onto the graphene coating. The porous scaffold is removed to expose an underside of the graphene coating, and a second layer of the electrochemically active material is deposited onto the underside of the graphene coating, thereby forming the scaffold-free 3D porous electrode.

First claim

The invention claimed is:

1. A method of making a scaffold-free 3D porous electrode, the method comprising:
depositing one or more monolayers of graphene onto a porous scaffold to form a graphene coating on the porous scaffold;
depositing a first layer of electrochemically active material onto the graphene coating;
removing the porous scaffold, thereby exposing an underside of the graphene coating;
depositing a second layer of electrochemically active material onto the underside of the graphene coating, thereby forming a 3D porous electrode comprising a network of interconnected pores, where each pore is surrounded by a multilayer film having a sandwich structure comprising the graphene coating sandwiched between the first and second layers of electrochemically active material.

2. The method of claim 1 , wherein, during deposition of the second layer of electrochemically active material onto the underside of the graphene coating, an additional amount of the electrochemically active material is deposited on the first layer.

3. The method of claim 1 , further comprising, prior to removing the porous scaffold, heat treating the first layer of electrochemically active material.

4. The method of claim 3 , wherein the heat treating comprises heating to a temperature sufficient to induce crystallization and/or sintering of the electrochemically active material.

5. The method of claim 1 , wherein depositing the one or more monolayers of graphene comprises chemical vapor deposition, electrochemical deposition, and atomic layer deposition.

6. The method of claim 1 , wherein depositing the first layer of electrochemically active material comprises solvothermal deposition, electrochemical deposition or atomic layer deposition.

7. The method of claim 1 , wherein removing the porous scaffold comprises etching.

8. The method of claim 1 , wherein depositing the second layer of electrochemically active material comprises solvothermal deposition, electrochemical deposition, or atomic layer deposition.

9. The method of claim 1 , further comprising heat treating the second layer of electrochemically active material.

10. The method of claim 9 , wherein the heat treating comprises heating to a temperature sufficient to induce crystallization and/or sintering of the electrochemically active material.

11. The method of claim 1 , wherein the electrochemically active material is selected from the group consisting of: V 2 O 5 , lithiated MnOOH, cobalt oxide, lithium cobalt oxide, lithium nickel cobalt aluminum oxide, lithium nickel manganese cobalt oxide, lithium iron phosphate, lithium vanadium phosphate, vanadium(IV) oxide, and/or iron fluoride, the 3D porous electrode being a 3D porous cathode.

12. The method of claim 1 , wherein the electrochemically active material is selected from the group consisting of: silicon, tin, iron oxide, copper oxide, tin oxide, nickel phosphide, titanium oxide, a nickel-tin alloy, and a copper-tin alloy, the 3D porous electrode being a 3D porous anode.

13. A scaffold-free 3D porous electrode comprising:
a network of interconnected pores, each pore being surrounded by a multilayer film comprising a first layer of electrochemically active material, one or more monolayers of graphene on the first layer of electrochemically active material, and a second layer of electrochemically active material on the one or more monolayers of graphene, the multilayer film thereby having a sandwich structure comprising the one or more monolayers of graphene sandwiched between the first and second layers of electrochemically active material.

14. The scaffold-free 3D porous electrode of claim 13 , wherein the multilayer film is not attached to a porous scaffold.

15. The scaffold-free 3D porous electrode of claim 13 , wherein adjacent pores comprise shared second layers of electrochemically active material.

16. The scaffold-free 3D porous electrode of claim 13 , wherein each of the first and second layers of electrochemically active material comprise a thickness from 5 to 20,000 times greater than the one or more monolayers of graphene.

17. The scaffold-free 3D porous electrode of claim 13 , wherein the one or more monolayers of graphene exhibit a uniform thickness having a spatial variation of about 50% or less.

18. The scaffold-free 3D porous electrode of claim 13 , wherein each of the first and second layers of electrochemically active material are nanocrystalline.

19. The scaffold-free 3D porous electrode of claim 13 , wherein the electrochemically active material is selected from the group consisting of: V 2 O 5 , lithiated MnOOH, cobalt oxide, lithium cobalt oxide, lithium nickel cobalt aluminum oxide, lithium nickel manganese cobalt oxide, lithium iron phosphate, lithium vanadium phosphate, vanadium(IV) oxide, and/or iron fluoride, the 3D porous electrode being a 3D porous cathode.

20. The scaffold-free 3D porous electrode of claim 13 , wherein the electrochemically active material is selected from the group consisting of: silicon, tin, iron oxide, copper oxide, tin oxide, nickel phosphide, titanium oxide, a nickel-tin alloy, and a copper-tin alloy, the 3D porous electrode being a 3D porous anode.

21. The scaffold-free 3D porous electrode of claim 13 , wherein the electrochemically active material comprises V 2 O 5 , and wherein the scaffold-free 3D porous electrode exhibits a full electrode basis capacity of about 230 mAh g −1 at 5 C after 200 cycles.

Assignees

• Univ Illinois

Inventors

• Braun Paul V
• Liu Jinyun

Classifications

• H01M2004/021

  Physical characteristics, e.g. porosity, surface area · CPC title

• H01M4/505

  of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy · CPC title

• H01M4/0421 Primary

  involving vapour deposition · CPC title

• H01M4/525

  of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy · CPC title

• H01M4/485

  of mixed oxides or hydroxides for inserting or intercalating light metals, e.g. LiTi2O4 or LiTi2OxFy (H01M4/505, H01M4/525 take precedence) · CPC title