Pixel structure and manufacturing method thereof

US10062868B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10062868-B2
Application numberUS-201314342133-A
CountryUS
Kind codeB2
Filing dateApr 26, 2013
Priority dateFeb 6, 2013
Publication dateAug 28, 2018
Grant dateAug 28, 2018

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Abstract

Official abstract text for this publication.

Embodiments of the present invention relate to a pixel structure and a manufacturing method thereof. The pixel structure includes: a substrate; an organic light emitting layer, disposed on the substrate; and an organic light gathering layer, disposed on a light exiting side of the organic light emitting layer, wherein light emitted from the organic light emitting layer is incident on the organic light gathering layer which is configured to gather the light emitted from the organic light emitting layer.

First claim

Opening claim text (preview).

The invention claimed is: 1. A pixel structure, comprising: a substrate; an organic light emitting layer, disposed on the substrate; an organic light gathering layer, disposed on a light exiting side of the organic light emitting layer, wherein light emitted from the organic light emitting layer is incident on the organic light gathering layer which is configured to gather a first portion of the light emitted from the organic light emitting layer; and a free transmission layer configured to transmit a second portion of the light emitted from the organic light emitting layer towards various directions, wherein a projection region of the entire free transmission layer on the substrate and a projection region of the entire organic light gathering layer on the substrate are non-overlapped; and wherein the free transmission layer and the organic light gathering layer are disposed on a same layer, the entire free transmission layer being non-overlapped with the entire organic light gathering layer on the same layer; wherein the pixel structure further comprises a color filter layer disposed between the organic light emitting layer and the organic light gathering layer, and the organic light gathering layer is disposed on a light exiting side of the color filter layer; wherein the pixel structure further comprises an organic protection layer which is disposed on a light exiting side of the organic light gathering layer and has a refractive index greater than that of the organic light gathering layer; and wherein the pixel structure further comprises: a thin film transistor formed on the substrate and a passivation layer covering the thin film transistor on the thin film transistor: a reflection electrode layer formed on the passivation layer; a second contact hole penetrating the reflection electrode layer and the passivation layer and exposing a drain electrode of the thin film transistor; a transparent electrode layer connected to the drain electrode of the thin film transistor via the second contact hole on the reflection electrode layer; a pixel defining layer formed on the transparent electrode layer, wherein the organic light emitting layer is disposed on the pixel defining layer; a cathode metal layer formed on the organic light emitting layer, wherein the color filter layer is disposed on the cathode metal layer; and wherein the free transmission layer is formed directly on the pixel defining layer. 2. The pixel structure according to claim 1 , wherein the organic protection layer is closely adjacent to the organic light gathering layer. 3. The pixel structure according to claim 1 , wherein the organic light gathering layer comprises at least one second lens unit. 4. The pixel structure according to claim 3 , wherein the second lens unit is a concave lens with a cave opening of the concave lens facing towards the organic protection layer . 5. The pixel structure according to claim 4 , wherein the second lens unit is of a circular, ellipse or rectangular cross-sectional shape in a plane direction parallel to the substrate, the second lens unit is of an arc cross-sectional shape in a plane direction perpendicular to the substrate. 6. The pixel structure according to claim 1 , wherein material for the organic light gathering layer is transparent organic material. 7. The pixel structure according to claim 1 , wherein the organic light gathering layer is a transparent organic film formed of acrylic resin or derivatives of acrylic resin. 8. The pixel structure according to claim 2 , wherein the reflection electrode layer, disposed on a side of the organic light emitting layer that is opposite to a side on which the organic light gathering layer is disposed, is configured to reflect light incident on it towards the organic light gathering layer. 9. A method for manufacturing the pixel structure according to claim 1 , the method comprising: forming the organic light emitting layer on the substrate and forming the organic light gathering layer on the organic light emitting layer. 10. The method according to claim 9 , wherein the forming the organic light emitting layer on the substrate and forming the organic light gathering layer on the organic light emitting layer comprises: Forming the thin film transistor on the substrate and forming the passivation layer covering the thin film transistor on the thin film transistor; forming the reflection electrode layer on the passivation layer; forming the second contact hole penetrating the reflection electrode layer and the passivation layer and exposing the drain electrode of the thin film transistor by lithography; forming the transparent electrode layer connected to the drain electrode of the thin film transistor via the second contact hole on the reflection electrode layer; forming the pixel defining layer on the transparent electrode layer; forming the organic light emitting layer on the pixel defining layer; forming the cathode metal layer on the organic light emitting layer; forming the color filter layer on the cathode metal layer; and forming the organic light gathering layer on the color filter layer. 11. A pixel structure, comprising: a substrate; an organic light emitting layer, disposed on the substrate; an organic light gathering layer, disposed on a light exiting side of the organic light emitting layer, wherein light emitted from the organic light emitting layer is incident on the organic light gathering layer which is configured to gather a first portion of the light emitted from the organic light emitting layer; and a free transmission layer configured to transmit a second portion of the light emitted from the organic light emitting layer towards various directions, wherein a boundary of a projection region of the organic light gathering layer on the substrate is overlapped with a projection region of the free transmission layer on the substrate while a remaining portion of the projection region of the organic light gathering layer on the substrate is non-overlapped with the projection region of the free transmission layer on the substrate; and wherein the free transmission layer and the organic light gathering layer are disposed on a same layer; wherein the pixel structure further comprises a color filter layer, the organic light gathering layer is disposed between the organic light emitting layer and the color filter layer, and the organic light gathering layer is disposed on a light incident side of the color filter layer; and wherein the pixel structure further includes: a thin film transistor formed on the substrate and a first passivation layer covering the thin film transistor on the thin film transistor; a color filter layer formed on the first passivation layer, wherein the organic light gathering layer is formed on the color filter layer; a planarization layer formed on the organic light gathering layer; a second passivation layer formed on the planarization layer; a first contact hole penetrating the second passivation layer, the planarization layer, the organic light gathering laver, the color filter layer and the first passivation layer and exposing a drain electrode of the thin film transistor; a transparent electrode layer connected to the drain electrode of the thin film transistor via the first contact hole on the second passivation layer; and a pixel defining layer formed on the transparent electrode laver, wherein the organic light emitting layer is formed on the pixel defining layer. 12. The pixel structure according to claim 11 , wherein the planarization layer is disposed between the organic light emitting layer and the organic light gathering layer and i

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What does patent US10062868B2 cover?
Embodiments of the present invention relate to a pixel structure and a manufacturing method thereof. The pixel structure includes: a substrate; an organic light emitting layer, disposed on the substrate; and an organic light gathering layer, disposed on a light exiting side of the organic light emitting layer, wherein light emitted from the organic light emitting layer is incident on the organi…
Who is the assignee on this patent?
Boe Technology Group Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01L51/5275. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 28 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).