Underfill material and method for manufacturing semiconductor device using the same

US10062625B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10062625-B2
Application numberUS-201715486663-A
CountryUS
Kind codeB2
Filing dateApr 13, 2017
Priority dateSep 27, 2013
Publication dateAug 28, 2018
Grant dateAug 28, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An underfill material enabling voidless packaging and excellent solder bonding properties, and a method for manufacturing a semiconductor device using the same are provided. An underfill material is used which contains an epoxy resin and a curing agent, and a time for a reaction rate to reach 20% at 240° C. calculated by Ozawa method using a differential scanning calorimeter is 2.0 sec or less and a time for the reaction rate to reach 60% is 3.0 sec or more. This enables voidless packaging and excellent solder connection properties.

First claim

Opening claim text (preview).

The invention claimed is: 1. An underfill material applied to a semiconductor chip having a solder-tipped electrode formed thereon before mounting the semiconductor chip onto an electronic component having a counter electrode facing the solder-tipped electrode, wherein the underfill material contains a phenoxy resin, an acrylic rubber polymer having a glycidyl group, an epoxy resin, a curing agent, an (meth) acrylate resin and an organic peroxide, the underfill material exhibiting a time for a degree of conversion to reach 20% at 240° C. calculated by Ozawa method based on data obtained by increasing temperature of samples at constant rates of 5° C./min, 10° C./min and 20° C./min using a differential scanning calorimeter is 2.0 sec or less and a time for the degree of conversion to reach 60% is 3.0 sec or more, and the time to reach a predetermined degree of conversion is calculated by creating a reaction simulation chart on the basis of an activation energy, a frequency factor and a reaction order obtained by creating Ozawa-plots that has a vertical axis represented common logarithm values of a rate of temperature increase and a horizontal axis represented reciprocal values of a peak temperature calculated based on the data. 2. The underfill material according to claim 1 , wherein a viscosity at the degree of conversion of 20% is 0.2×10 4 Pa*s or more and a viscosity at the degree of conversion of 60% is 500×10 4 Pa*s or less. 3. The underfill material according to claim 1 , wherein the epoxy resin is a dicyclopentadiene type epoxy resin, and the curing agent is a aliphatic acid anhydride or imidazole-based curing agent. 4. The underfill material according to claim 1 , wherein the (meth) acrylate resin is a bifunctional (meth)acrylate and the organic peroxide is a peroxy ester. 5. The underfill material according to claim 3 , wherein the acrylate resin is a bifunctional (meth)acrylate and the organic peroxide is a peroxy ester. 6. The underfill material according to claim 1 , wherein the acrylic rubber polymer has a glass transition temperature of −30° to 20° C.

Assignees

Inventors

Classifications

  • Subject matter not provided for in other groups of this subclass · CPC title

  • Compositions of epoxy resins; Compositions of derivatives of epoxy resins · CPC title

  • Homopolymers or copolymers of methacrylic acid esters · CPC title

  • Peroxides · CPC title

  • containing nitrogen · CPC title

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Frequently asked questions

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What does patent US10062625B2 cover?
An underfill material enabling voidless packaging and excellent solder bonding properties, and a method for manufacturing a semiconductor device using the same are provided. An underfill material is used which contains an epoxy resin and a curing agent, and a time for a reaction rate to reach 20% at 240° C. calculated by Ozawa method using a differential scanning calorimeter is 2.0 sec or less …
Who is the assignee on this patent?
Dexerials Corp
What technology area does this patent fall under?
Primary CPC classification C08G59/24. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 28 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).