Finding patterns in a design based on the patterns and their surroundings

Patent metadata

Field	Value
Publication number	US-10062012-B1
Application number	US-201514885859-A
Country	US
Kind code	B1
Filing date	Oct 16, 2015
Priority date	Oct 22, 2014
Publication date	Aug 28, 2018
Grant date	Aug 28, 2018

Abstract

Methods and systems for finding patterns in a design for a specimen are provided. One system includes one or more computer subsystems configured for searching for a target pattern in a design for a specimen to thereby find multiple instances of the target pattern in the design. The one or more computer subsystems are also configured for separating the multiple instances of the target pattern into different groups based on information for surrounding patterns within a predefined window around the target pattern such that each of the different groups corresponds to a different combination of the target pattern and the surrounding patterns.

First claim

What is claimed is:

1. A system configured to find patterns in a design for a specimen, comprising:
an inspection subsystem comprising at least an energy source and a detector, wherein the energy source is configured to generate energy that is directed to a specimen, and wherein the detector is configured to detect energy from the specimen and to generate output responsive to the detected energy; and
one or more computer subsystems configured for:
searching for a target pattern in a design for the specimen to thereby find multiple instances of the target pattern in the design;
separating the multiple instances of the target pattern into different groups based on information for surrounding patterns within a predefined window around the target pattern such that each of the different groups corresponds to a different combination of the target pattern and the surrounding patterns; and
setting up an inspection process for the specimen based on results of said separating and information for how the surrounding patterns affect the output generated by the detector at locations of the multiple instances on the specimen, wherein the inspection subsystem performs the inspection process on the specimen.

2. The system of claim 1 , wherein the surrounding patterns are on the same level of the design as the target pattern.

3. The system of claim 1 , wherein at least a portion of the surrounding patterns are on a level of the design other than a level on which the target pattern is located.

4. The system of claim 1 , wherein the design that is searched is design data included in a design data file.

5. The system of claim 1 , wherein the design that is searched is information for the design obtained from a physical wafer on which at least a portion of the design is printed.

6. The system of claim 1 , wherein the information for the surrounding patterns comprises a density, geometry, complexity, vertex count, statistic of perimeters of polygons, mask layer, size, type of polygons, number of polygons, or optical property of the surrounding patterns.

7. The system of claim 1 , wherein the information for the surrounding patterns comprises values for two or more characteristics of the surrounding patterns.

8. The system of claim 1 , wherein said separating comprises applying one or more rules to the information for the surrounding patterns.

9. The system of claim 1 , wherein said separating comprises performing pattern matching based on the target pattern in combination with the surrounding patterns.

10. The system of claim 1 , wherein the information for the surrounding patterns comprises values for characteristics of the surrounding patterns, and wherein said separating comprises binning the multiple instances into the different groups based on the values for the characteristics such that each of the different groups corresponds to only a subset of the values for the characteristics of the surrounding patterns.

11. The system of claim 1 , wherein said separating comprises binning the multiple instances into the different groups based on the information for the surrounding patterns and binning the multiple instances in one of the different groups into two or more subgroups based on additional information for the surrounding patterns.

12. The system of claim 1 , wherein the one or more computer subsystems are further configured for determining one or more characteristics of the multiple instances in at least one of the different groups based on all of the multiple instances in the at least one of the different groups.

13. The system of claim 1 , wherein the one or more computer subsystems are further configured for setting up the inspection process for the specimen based on the results of said separating, the information for how the surrounding patterns affect the output generated by the detector at the locations of the multiple instances on the specimen, and information for yield impact of the different combinations of the target pattern and the surrounding patterns on a device fabricated using the design.

14. The system of claim 1 , wherein the one or more computer subsystems are further configured for setting up the inspection process for the specimen based on the results of said separating such that at least one of the different groups of the multiple instances is inspected with a different sensitivity than others of the different groups.

15. The system of claim 1 , wherein the one or more computer subsystems are further configured for setting up a process to be performed on the specimen by an additional system based on the results of said separating.

16. The system of claim 1 , wherein the one or more computer subsystems are further configured for combining two or more of the different groups based on expected output of the detector for the different combinations of the target pattern and the surrounding patterns in the different groups.

17. The system of claim 1 , wherein the one or more computer subsystems are further configured for correlating the output generated by the detector at one or more of the multiple instances to output generated by a different system, wherein said correlating is separately performed for each of the different groups.

18. The system of claim 1 , wherein the one or more computer subsystems are further configured for ranking the different groups based on information from a process window qualification inspection performed for the design.

19. The system of claim 1 , wherein the one or more computer subsystems are further configured for classifying the different groups based on one or more characteristics of the different groups and information from a process window qualification inspection performed for the design.

20. A non-transitory computer-readable medium, storing program instructions executable on a computer system for performing a computer-implemented method for finding patterns in a design for a specimen, wherein the computer-implemented method comprises:
searching for a target pattern in a design for a specimen to thereby find multiple instances of the target pattern in the design;
separating the multiple instances of the target pattern into different groups based on information for surrounding patterns within a predefined window around the target pattern such that each of the different groups corresponds to a different combination of the target pattern and the surrounding patterns; and
setting up an inspection process for the specimen based on results of said separating and information for how the surrounding patterns affect the output generated by a detector of an inspection subsystem at locations of the multiple instances on the specimen, wherein the inspection subsystem performs the inspection process on the specimen.

21. A computer-implemented method for finding patterns in a design for a specimen, comprising:
searching for a target pattern in a design for a specimen to thereby find multiple instances of the target pattern in the design;
separating the multiple instances of the target pattern into different groups based on information for surrounding patterns within a predefined window around the target pattern such that each of the different groups corresponds to a different combination of the target pattern and the surrounding patterns; and
setting up an inspection process for the specimen based on results of said separating and information for how the surrounding patterns affect the output generated by a detector of an inspection subsystem at locations of the multiple insta

Assignees

• Kla Tencor Corp
• Kla Tencor Corp

Inventors

• Park Allen
• Lennek Michael

Classifications

• G06T7/001 Primary

  using an image reference approach · CPC title

• G06F18/24

  Classification techniques · CPC title

• G06T7/60

  Analysis of geometric attributes · CPC title

• G06K9/4604

  Physics · mapped topic

• G06T2207/30148

  Semiconductor; IC; Wafer · CPC title