Methods and devices for driving micromirrors

Patent metadata

Field	Value
Publication number	US-10061202-B2
Application number	US-201213687887-A
Country	US
Kind code	B2
Filing date	Nov 28, 2012
Priority date	Oct 8, 2008
Publication date	Aug 28, 2018
Grant date	Aug 28, 2018

Abstract

A micromirror of a micromirror array in an illumination system of a microlithographic projection exposure apparatus can be tilted through a respective tilt angle about two tilt axes. The micromirror is assigned three actuators which can respectively be driven by control signals in order to tilt the micromirror about the two tilt axes. Two control variables are specified, each of which is assigned to one tilt axis and which are both assigned to unperturbed tilt angles. For any desired combinations of the two control variables, as a function of the two control variables, one of the three actuators is selected and its control signal is set to a constant value, in particular zero. The control signals are determined so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables.

First claim

What is claimed is:

1. A method, comprising:
providing a micromirror array arranged in a microlithographic illumination system, the micromirror array comprising more than two micromirrors; and
switching the micromirrors from a first illumination setting to a second illumination setting,
wherein:
the second illumination setting is different from the first illumination setting;
when the micromirrors are in the first setting, after impinging on the micromirror array, light impinges on an illumination field;
when the micromirrors are in in the second setting, after impinging on the micromirror array, light impinges on the illumination field; and
switching from the first illumination setting to the second illumination setting takes less than 50 milliseconds for each of the micromirrors.

2. The method of claim 1 , wherein the micromirror array comprises more than 1000 micromirrors.

3. The method of claim 2 , wherein:
each micromirror is tiltable through a respective tilt angle about two tilt axes; and
for at least some of the micromirrors, switching the micromirror from the first illumination setting to the second illumination setting comprises changing the tilt angle of the micromirror.

4. The method of claim 2 , wherein for at least some of the micromirrors:
the micromirror is assigned three actuators; and
each of the three actuators is driven by control signals to tilt the micromirror about two tilt axes when changing the micromirror from the first illumination setting to the second illumination setting.

5. The method of claim 1 , wherein:
each micromirror is tiltable through a respective tilt angle about two tilt axes; and
for at least some of the micromirrors, switching the micromirror from the first illumination setting to the second illumination setting comprises changing the tilt angle of the micromirror.

6. The method of claim 1 , wherein for at least some of the micromirrors:
the micromirror is assigned three actuators; and
each of the three actuators is driven by control signals to tilt the micromirror about two tilt axes when changing the micromirror from the first illumination setting to the second illumination setting.

7. The method of claim 6 , further comprising, for at least some of the micromirrors:
specifying two control variables, each of the two control variables being assigned to one tilt axis, and both of the two control variables being assigned to unperturbed tilt angles;
for any desired combinations of the two control variables, as a function of the two control variables, selecting one of the three actuators whose control signal is set to a constant value;
determining the control signals so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables; and
applying the control signals to the actuators.

8. The method of claim 1 , further comprising using the microlithographic illumination system to illuminate a mask.

9. The method of claim 8 , further comprising using a projection objective to project an image of the mask into a resist.

10. An illumination system, comprising:
a micromirror array comprising more than two micromirrors; and
drive electronics configured to drive each of the micromirrors,
wherein:
for at least some of the micromirrors, the drive electronics are configured to switch the micromirror from a first illumination setting to a second illumination setting in less than 50 milliseconds;
the second illumination setting is different from the first illumination setting;
for each of the at least some micromirrors, the illumination system is configured so that during use:
when the micromirrors are in the first setting, after impinging on the micromirror array, light impinges on an illumination field; and
when the micromirrors are in the second setting, after impinging on the micromirror array, light impinges on the illumination field; and

the illumination system is a microlithographic illumination system.

11. The illumination system of claim 10 , wherein the micromirror array comprises more than 1000 micromirrors.

12. The illumination system of claim 11 , wherein:
the drive electronics are configured to tilt each micromirror through a respective tilt angle about two tilt axes; and
for at least some of the micromirrors, the drive electronics are configured to change the tilt angle of the micromirror to switch the micromirror from the first illumination setting to the second illumination setting.

13. The illumination system of claim 11 , wherein for at least some of the micromirrors:
the micromirror is assigned three actuators; and
the drive electronics are configured to send control signals to each of the three actuators so that the actuators tilt the micromirror about two tilt axes when changing the micromirror from the first illumination setting to the second illumination setting.

14. The illumination system of claim 10 , wherein:
the drive electronics are configured to tilt each micromirror through a respective tilt angle about two tilt axes; and
for at least some of the micromirrors, the drive electronics are configured to change the tilt angle of the micromirror to switch the micromirror from the first illumination setting to the second illumination setting.

15. The illumination system of claim 10 , wherein for at least some of the micromirrors:
the micromirror is assigned three actuators; and
the drive electronics are configured to send control signals to each of the three actuators so that the actuators tilt the micromirror about two tilt axes when changing the micromirror from the first illumination setting to the second illumination setting.

16. The illumination system of claim 15 , wherein, for at least some of the micromirrors, the illumination system is configured to:
specify two control variables, each of the two control variables being assigned to one tilt axis, and both of the two control variables being assigned to unperturbed tilt angles;
for any desired combinations of the two control variables, as a function of the two control variables, select one of the three actuators whose control signal is set to a constant value;
determine the control signals so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables; and
apply the control signals to the actuators.

17. An apparatus, comprising:
a projection objective having an object plane and an image plane; and
an illumination system configured to illuminate the object plane of the projection objective,
wherein:
the illumination system comprises:
a micromirror array comprising more than two micromirrors; and
drive electronics configured to drive each of the micromirrors;

for at least some of the micromirrors, the drive electronics are configured to switch the micromirror from a first illumination setting to a second illumination setting in less than 50 milliseconds;
the second illumination setting is different from the first illumination setting;
for each of the at least some micromirros, the illumination system is configured so that during use:
when the micromirrors are in the first setting, after impinging on the micromirror array, light impinges on an illumination field; and
when the micromirrors are in the second setting, after impinging on the micromirror array, light impinges on the illumination field;

the illumination system is a microlithographic illumination system; and
the apparatu

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Horn Jan
• Kempter Christian

Classifications

• G02B26/0841

  the reflecting element being moved or deformed by electrostatic means · CPC title

• G03F7/702

  Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems · CPC title

• G02B27/0043

  in projection exposure systems, e.g. microlithographic systems · CPC title

• G03F7/70116 Primary

  Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets · CPC title

• G03F7/70075

  Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection · CPC title