Polishing composition

Patent metadata

Field	Value
Publication number	US-10059860-B2
Application number	US-201515120605-A
Country	US
Kind code	B2
Filing date	Jan 20, 2015
Priority date	Feb 26, 2014
Publication date	Aug 28, 2018
Grant date	Aug 28, 2018

Abstract

The present invention relates to a polishing composition used in application in which a polishing object having a cobalt element-containing layer is polished, including: a cobalt dissolution inhibitor; and a pH adjusting agent, wherein the polishing composition has a pH of 4 or more and 12 or less, and the cobalt dissolution inhibitor is at least one member selected from the group consisting of an organic compound having an ether bond, an organic compound having a hydroxyl group, an organic compound having a carboxyl group and having a molecular weight of 130 or more, and salts thereof. According to the present invention, there is provided a polishing composition capable of suppressing the dissolution of a cobalt element-containing layer when a polishing object having a cobalt element-containing layer is polished.

First claim

The invention claimed is:

1. A polishing composition used in application in which a polishing object having a cobalt element-containing layer is polished, comprising:
a cobalt dissolution inhibitor;
a pH adjusting agent; and
an abrasive grain, wherein
the polishing composition has a pH of 7.5 or more and 12 or less,
the cobalt dissolution inhibitor is at least one member selected from the group consisting of an organic compound having an ether bond selected from the group consisting of diethyl ether, dipropyl ether, tert-butyl methyl ether, tert-amyl ethyl ether, dimethoxyethane, diethoxyethane, diglyme, triglyme, furan, tetrahydrofuran, tetrahydromethylfuran, dioxolane, a lactone, pullulan, glucomannan, agarose and gelatin; an organic compound having a hydroxyl group selected from the group consisting of methanol, ethanol, n-propanol, iso-propanol, n-butanol, tert-butanol, n-pentanol, n-hexanol, n-octanol, n-nonyl alcohol, n-dodecyl alcohol, n-stearyl alcohol, methoxyethanol, ethoxyethanol, butoxyethanol, and (2-ethoxy)-ethoxyethanol; an aromatic alcohol; an organic compound having a carboxyl group and having a molecular weight of 130 or more; and salts thereof, and
the abrasive grain comprises a colloidal silica having an immobilized organic acid.

2. The polishing composition according to claim 1 , wherein the organic compound having a hydroxyl group has an alcohol skeleton or a phenol skeleton.

3. The polishing composition according to claim 1 , wherein the cobalt dissolution inhibitor is an organic compound having an ether bond and a hydroxyl group.

4. A method of polishing a polishing object having a cobalt element-containing layer, wherein the cobalt element-containing layer is polished by the polishing composition according to claim 1 .

5. A method for producing a substrate, comprising,
a step of polishing a polishing object having a cobalt element-containing layer by the polishing method according to claim 4 .

6. The polishing composition according to claim 1 , wherein the cobalt dissolution inhibitor is at least one member selected from the group consisting of furan, tetrahydrofuran, γ-nonalactone, pullulan, n-propanol, iso-propanol, n-butanol, phenol, lauric acid, oleic acid, abietic acid, potassium lauryl acid, ammonium lauryl acid, and a lauryl acid triethanolamine salt.

7. The polishing composition according to claim 1 , wherein the immobilized organic acid is selected from sulfonic acid and carboxylic acid.

8. The polishing composition according to claim 1 , wherein the cobalt dissolution inhibitor comprises at least one member selected from the group consisting of a compound represented by R 1 COOH and a compound represented by HOOC—R 2 —COOH; wherein R 1 is an alkyl group, alkenyl group, alkynyl group, cycloalkyl group, cycloalkenyl group, or cycloalkynyl group having 7 to 20 carbon atoms, and R 2 is an alkylene group, alkenylene group, alkynylene group, cycloalkylene group, cycloalkenylene group, or cycloalkynylene group having 7 to 20 carbon atoms.

9. The polishing composition according to claim 1 , wherein the cobalt dissolution inhibitor comprises at least one member selected from a compound represented by R 1 COOH; wherein R 1 is an alkyl group, alkenyl group, alkynyl group, cycloalkyl group, cycloalkenyl group, or cycloalkynyl group having 7 to 20 carbon atoms.

10. The polishing composition according to claim 1 , further comprising a polishing accelerating agent, wherein the polishing accelerating agent is selected from the group consisting of methanesulfonic acid, ethanesulfonic acid, and isethionic acid.

Assignees

• Fujimi Inc

Inventors

• Yasui Akihito

Classifications

• H10P52/403

  of conductive or resistive materials · CPC title

• H01L21/3212

  Electricity · mapped topic

• C23F3/00

  Brightening metals by chemical means · CPC title

• C09G1/02 Primary

  containing abrasives or grinding agents {(abrasives as such C09K3/14; polishing of semi-conductors H10P52/40)} · CPC title

• B24B37/044

  characterised by the composition of the lapping agent · CPC title