Method of forming a self-cleaning film system

US10052622B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10052622-B2
Application numberUS-201715429577-A
CountryUS
Kind codeB2
Filing dateFeb 10, 2017
Priority dateFeb 12, 2016
Publication dateAug 21, 2018
Grant dateAug 21, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of forming a self-cleaning film system includes depositing a perfluorocarbon siloxane polymer onto a substrate to form a first layer. The method includes removing a plurality of portions of the first layer to define a plurality of cavities in the first layer and form a plurality of projections that protrude from the substrate. The method includes depositing a photocatalytic material onto the plurality of projections and into the plurality of cavities to form a second layer comprising: a bonded portion disposed in the plurality of cavities and in contact with the substrate, and a non-bonded portion disposed on the plurality of projections and spaced apart from the substrate. The method also includes, after depositing the photocatalytic material, removing the non-bonded portion to thereby form the self-cleaning film system.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a self-cleaning film system, the method comprising: depositing a perfluorocarbon siloxane polymer onto a substrate to form a first layer; removing a plurality of portions of the first layer to define a plurality of cavities in the first layer and form a plurality of projections that protrude from the substrate; depositing a photocatalytic material onto the plurality of projections and into the plurality of cavities to form a second layer comprising: a bonded portion disposed in the plurality of cavities and in contact with the substrate; and a non-bonded portion disposed on the plurality of projections and spaced apart from the substrate; and after depositing the photocatalytic material, removing the non-bonded portion to thereby form the self-cleaning film system. 2. The method of claim 1 , wherein depositing the photolytic material includes chemically bonding the photocatalytic material to the substrate within the plurality of cavities. 3. The method of claim 1 , further including, after removing the non-bonded portion, removing the plurality of projections. 4. The method of claim 3 , further including, after removing the plurality of projections, redepositing the perfluorocarbon siloxane polymer. 5. The method of claim 4 , wherein redepositing includes wiping the perfluorocarbon siloxane polymer onto the substrate so that the perfluorocarbon siloxane polymer contacts the bonded portion. 6. The method of claim 1 , further including contacting the bonded portion and squalene. 7. The method of claim 6 , further including oxidizing the squalene. 8. The method of claim 6 , further including vaporizing the squalene.

Assignees

Inventors

Classifications

  • with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder · CPC title

  • involving the use of fluoropolymers · CPC title

  • Coatings comprising several layers · CPC title

  • Ionic or cathodic spraying; Electric discharge · CPC title

  • Pretreatment of the substrate before coating · CPC title

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What does patent US10052622B2 cover?
A method of forming a self-cleaning film system includes depositing a perfluorocarbon siloxane polymer onto a substrate to form a first layer. The method includes removing a plurality of portions of the first layer to define a plurality of cavities in the first layer and form a plurality of projections that protrude from the substrate. The method includes depositing a photocatalytic material on…
Who is the assignee on this patent?
Gm Global Tech Operations Llc
What technology area does this patent fall under?
Primary CPC classification C09D183/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 21 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).