Laser system

US10050408B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10050408-B2
Application numberUS-201615379192-A
CountryUS
Kind codeB2
Filing dateDec 14, 2016
Priority dateJul 11, 2014
Publication dateAug 14, 2018
Grant dateAug 14, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled laser beam, and a controller configured to control operated laser apparatuses of the plurality of laser apparatuses such that, at a change in a number representing how many laser apparatuses are operated, a beam parameter of the bundled laser beam emitted from the beam delivery device approaches a beam parameter of the bundled laser beam emitted before the change.

First claim

Opening claim text (preview).

The invention claimed is: 1. A laser system comprising: a plurality of laser apparatuses; a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled laser beam; and a controller configured to control operated laser apparatuses of the plurality of laser apparatuses such that, at a change in a number representing how many laser apparatuses are operated, a beam parameter of the bundled laser beam emitted from the beam delivery device approaches a beam parameter of the bundled laser beam emitted before the change. 2. The laser system according to claim 1 , wherein the controller is configured to control the operated laser apparatuses of the plurality of laser apparatuses such that, at a decrease in the number representing how many laser apparatuses are operated, the beam parameter of the bundled laser beam emitted from the beam delivery device approaches the beam parameter of the bundled laser beam emitted before the decrease by increasing energy of the pulse laser beam emitted from each of the operated laser apparatuses, the beam parameter of the bundled laser beam including energy of the bundled laser beam. 3. The laser system according to claim 1 , wherein the controller is configured to control the operated laser apparatuses of the plurality of laser apparatuses such that, at a decrease in the number representing how many laser apparatuses are operated, the beam parameter of the bundled laser beam emitted from the beam delivery device approaches the beam parameter of the bundled laser beam emitted before the decrease by increasing a time interval between the pulse laser beams emitted from the respective operated laser apparatuses, the beam parameter of the bundled laser beam including pulse width of the bundled laser beam. 4. The laser system according to claim 1 , wherein the controller is configured to control the operated laser apparatuses of the plurality of laser apparatuses such that, at a decrease in the number representing how many laser apparatuses are operated, the beam parameter of the bundled laser beam emitted from the beam delivery device approaches the beam parameter of the bundled laser beam emitted before the decrease by increasing energy of the pulse laser beam emitted from each of the operated laser apparatuses and increasing a time interval between the pulse laser beams emitted from the respective operated laser apparatuses, the beam parameter of the bundled laser beam including energy of the bundled laser beam and pulse width of the bundled laser beam. 5. The laser system according to claim 4 , wherein: the plurality of laser apparatuses includes first, second, and third laser apparatuses configured to emit first, second, and third pulse laser beams, respectively; the beam delivery device is configured to bundle the first, second, and third pulse laser beams, to emit the bundled laser beam in which an optical path of the second pulse laser beam is between an optical path of the first pulse laser beam and an optical path of the third pulse laser beam; and the controller is further configured to control the beam delivery device such that, to suspend operation of the second laser apparatus, at least one of the optical path of the first pulse laser beam emitted from the beam delivery device and the optical path of the third pulse laser beam emitted from the beam delivery device approaches the other one. 6. The laser system according to claim 5 , further comprising: a first mirror configured to reflect the first pulse laser beam emitted in a first direction from the first laser apparatus to a third direction; a second mirror configured to reflect the second pulse laser beam emitted in a second direction from the second laser apparatus to a direction substantially parallel to the third direction; and a third mirror configured to reflect the third pulse laser beam emitted in a direction substantially parallel to the second direction from the third laser apparatus to a direction substantially parallel to the third direction, wherein the controller is configured to control the beam delivery device such that, to suspend operation of the second laser apparatus, the optical path of the third pulse laser beam emitted from the beam delivery device approaches the optical path of the first pulse laser beam emitted from the beam delivery device by moving the third mirror in a direction substantially parallel to the second direction. 7. The laser system according to claim 6 , wherein: the second mirror is provided in vicinity of the optical path of the first pulse laser beam reflected by the first mirror, and the controller controls the beam delivery device such that, to suspend operation of the second laser apparatus, the second mirror moves away from the optical path of the first pulse laser beam reflected by the first mirror. 8. The laser system according to claim 4 , wherein: the plurality of laser apparatuses includes first and second laser apparatuses configured to emit first and second pulse laser beams in a first and second directions, respectively; the beam delivery device includes first and second mirrors, the first mirror being configured to reflect the first pulse laser beam to a third direction, the second mirror being provided in vicinity of an optical path of the first pulse laser beam reflected by the first mirror, the second mirror being configured to reflect the second pulse laser beam to a direction substantially parallel to the third direction, the first and second mirrors thus being configured to bundle the first and second pulse laser beams to emit the bundled laser beam; and the controller is further configured to control the beam delivery device such that, to suspend operation of the second laser apparatus, the second mirror moves away from the optical path of the first pulse laser beam reflected by the first mirror. 9. The laser system according to claim 1 , wherein the controller is configured to control the operated laser apparatuses of the plurality of laser apparatuses such that: when how many laser apparatuses are operated is represented by a first value, energy of the pulse laser beam emitted from each of the operated laser apparatuses has a third value; and at a change in the number representing how many laser apparatuses are operated from the first value to a second value smaller than the first value, the beam parameter of the bundled laser beam emitted from the beam delivery device approaches the beam parameter of the bundled laser beam emitted before the change by increasing the energy of the pulse laser beam emitted from each of the operated laser apparatuses from the third value to a fourth value higher than the third value, the beam parameter of the bundled laser beam including energy of the bundled laser beam. 10. The laser system according to claim 1 , wherein the controller is configured to control the operated laser apparatuses of the plurality of laser apparatuses such that: when how many laser apparatuses are operated is represented by a first value, a time interval between the pulse laser beams emitted from the respective operated laser apparatuses has a fifth value, and at a change in the number representing how many laser apparatuses are operated from the first value to a second value smaller than the first value, the beam parameter of the bundled laser beam emitted from the beam delivery device approaches the beam parameter of the bundled laser beam emitted before the change by increasing the a time interval between the pulse laser beams emitted from the respective operated laser apparatuses from the fifth value to a sixth value larger than the fifth value,

Assignees

Inventors

Classifications

  • mainly by radiation · CPC title

  • Pulsed laser beam · CPC title

  • Amorphous · CPC title

  • Silicon, silicon germanium or germanium · CPC title

  • The splitting element being a prism or prismatic array, including systems based on total internal reflection · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10050408B2 cover?
A laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled laser beam, and a controller configured to control operated laser apparatuses of the plurality of laser apparatuses such that, at a change in a number representing how many las…
Who is the assignee on this patent?
Gigaphoton Inc
What technology area does this patent fall under?
Primary CPC classification B23K26/0006. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 14 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).