Systems and methods for forming and maintaining a high performance FRC

US10049774B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10049774-B2
Application numberUS-201615078918-A
CountryUS
Kind codeB2
Filing dateMar 23, 2016
Priority dateSep 24, 2013
Publication dateAug 14, 2018
Grant dateAug 14, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber. In operation, FRC plasma parameters including plasma thermal energy, total particle numbers, radius and trapped magnetic flux, are sustainable at or about a constant value without decay during neutral beam injection.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for generating and maintaining a magnetic field with a field reversed configuration (FRC) within a confinement chamber of a system comprising: first and second diametrically opposed FRC formation sections coupled to the confinement chamber, first and second divertors coupled to the first and second formation sections, one or more of a plurality of plasma guns, one or more biasing electrodes and first and second mirror plugs, wherein the plurality of plasma guns includes first and second axial plasma guns operably coupled to the first and second divertors, the first and second formation sections and the confinement chamber, wherein the one or more biasing electrodes being positioned within one or more of the confinement chamber, the first and second formation sections, and the first and second divertors, and wherein the first and second mirror plugs being position between the first and second formation sections and the first and second divertors, a gettering system coupled to the confinement chamber and the first and second divertors, a plurality of neutral atom beam injectors coupled to the confinement chamber adjacent a midplane of the confinement chamber and oriented to inject neutral atom beams toward the mid-plane at an angle of about fifteen degrees (15°) to twenty-five degrees (25°) less than normal to a longitudinal axis of the confinement chamber, and a magnetic system comprising a plurality of quasi-de coils positioned around the confinement chamber, the first and second formation sections, and the first and second divertors, first and second set of quasi-dc mirror coils positioned between the confinement chamber and the first and second formation sections; the method comprising the steps of: forming an FRC about a plasma in the confinement chamber, wherein the FRC plasma is in spaced relation with the wall of the confinement chamber, and maintaining the FRC at or about a constant value without decay by injecting beams of fast neutral atoms from neutral beam injectors into the FRC plasma at an angle of about 15° to 25° less than normal to the longitudinal axis of the confinement chamber and towards the mid-plane of the confinement chamber. 2. The method of claim 1 further comprising the step of generating a magnetic field within the chamber with the quasi-dc coils extending about the chamber and a mirror magnetic field within opposing ends of the chamber with the quasi-dc mirror coils extending about the opposing ends of the chamber. 3. The method of claim 1 wherein the step of the forming the FRC includes forming a formation FRC in the opposing first and second formation sections coupled to opposite ends of the confinement chamber and accelerating the formation FRC from the first and second formation sections towards the mid-plane of the chamber where the two formation FRCs merge to form the FRC. 4. The method of claim 3 wherein the step of forming the FRC includes one of forming a formation FRC while accelerating the formation FRC towards the mid-plane of the chamber and forming a formation FRC then accelerating the formation FRC towards the mid-plane of the chamber. 5. The method of claim 4 further comprising the step of guiding magnetic flux surfaces of the FRC into the diverters coupled to the ends of the formation sections. 6. The method of claim 5 further comprising the step of generating a magnetic field within the formation sections and diverters with quasi-dc coils extending about the formation sections and diverters. 7. The method of claim 6 further comprising the step of generating a mirror magnetic field between the formation sections and the diverters with quasi-dc mirror coils. 8. The method of claim 6 further comprising step of generating a mirror plug magnetic field within a constriction between the formation sections and the diverters with quasi-dc mirror plug coils extending about the constriction between the formation sections and the diverters. 9. The method of claim 1 wherein the step of maintaining the FRC further comprising the step of injecting pellets of neutral atoms into the FRC. 10. The method of anyone of claim 1 further comprising the step of generating one of a magnetic dipole field and a magnetic quadrupole field within the chamber with saddle coils coupled to the chamber. 11. The method of claim 1 further comprising the step of conditioning the internal surfaces of the chamber, formation sections, and diverters with the gettering system. 12. The method of claim 11 wherein the gettering system includes one of a Titanium deposition system and a Lithium deposition system. 13. The method of claim 1 further comprising the step of axially injecting plasma into the FRC from the axially mounted plasma guns. 14. The method of claim 1 further comprising the step of controlling the radial electric field profile in an edge layer of the FRC. 15. The method of claim 14 wherein the step of controlling the radial electric field profile in an edge layer of the FRC includes applying a distribution of electric potential to a group of open flux surfaces of the FRC with the biasing electrodes. 16. A system for generating and maintaining a magnetic field with a field reversed configuration (FRC) comprising a confinement chamber, first and second diametrically opposed FRC formation sections coupled to the confinement chamber, first and second divertors coupled to the first and second formation sections, one or more of a plurality of plasma guns, one or more biasing electrodes and first and second mirror plugs, wherein the plurality of plasma guns includes first and second axial plasma guns operably coupled to the first and second divertors, the first and second formation sections and the confinement chamber, wherein the one or more biasing electrodes being positioned within one or more of the confinement chamber, the first and second formation sections, and the first and second divertors, and wherein the first and second mirror plugs being position between the first and second formation sections and the first and second divertors, a gettering system coupled to the confinement chamber and the first and second divertors, a plurality of neutral atom beam injectors coupled to the confinement chamber adjacent a midplane of the confinement chamber and oriented to inject neutral atom beams toward the mid-plane at an angle of about fifteen degrees (15°) to twenty-five degrees (25°) less than normal to a longitudinal axis of the confinement chamber, and a magnetic system comprising a plurality of quasi-dc coils positioned around the confinement chamber, the first and second formation sections, and the first and second divertors, first and second set of quasi-dc mirror coils positioned between the confinement chamber and the first and second formation sections, wherein the system is configured to generate an FRC and maintain the FRC without decay while the neutral beams are injected from neutral beam injectors into the FRC plasma at an angle of about 15° to 25° less than normal to the longitudinal axis of the confinement chamber and towards the mid-plane of the confinement chamber. 17. The system of claim 16 further comprising two or more saddle coils coupled to the confinement chamber. 18. The system of claim 17 further comprising an ion pellet injector coupled to the confinement chamber. 19. The system of claim 16 wherein the formation section comprises modularized formation systems for generating an FRC and translating it toward a midplane of the confinement chamber.

Assignees

Inventors

Classifications

  • wherein the containment vessel is straight and has magnetic mirrors · CPC title

  • using externally-applied magnetic fields only {, e.g. Q-machines, Yin-Yang, base-ball} · CPC title

  • Particle injectors for producing thermonuclear fusion reactions, e.g. pellet injectors · CPC title

  • G21B1/052Primary

    reversed field configuration · CPC title

  • Cross-Sectional Technologies · mapped topic

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What does patent US10049774B2 cover?
A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement c…
Who is the assignee on this patent?
Tae Tech Inc
What technology area does this patent fall under?
Primary CPC classification G21B1/052. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 14 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).