Adjustment assembly and substrate exposure system comprising such an adjustment assembly

Patent metadata

Field	Value
Publication number	US-10048599-B2
Application number	US-201615396032-A
Country	US
Kind code	B2
Filing date	Dec 30, 2016
Priority date	Dec 30, 2016
Publication date	Aug 14, 2018
Grant date	Aug 14, 2018

Abstract

The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.

First claim

The invention claimed is:

1. Substrate exposure system comprising:
a frame,
a substrate support module for carrying a substrate, which substrate support module is connected to said frame,
an exposure apparatus, wherein the exposure apparatus is carried by said frame and is arranged for exposing the substrate carried by the substrate support module, and
an adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module, wherein the adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system, wherein the hydraulic actuator, the hydraulic generator and the conduit, at least in use, form a closed hydraulic system defining a substantially constant volume,
wherein the exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components, wherein said series of mechanically linked components comprises a first part comprising at least the exposure apparatus, and a second part comprising at least the substrate support module, and wherein said hydraulic actuator is arranged between said first part and said second part of said series of the mechanically linked components.

2. Substrate exposure system according to claim 1 , wherein said hydraulic actuator comprises a first bellows.

3. Substrate exposure system according to claim 1 , wherein said hydraulic generator comprises a second bellows.

4. Substrate exposure system according to claim 3 , wherein the second bellows is provided with a drive unit, preferably a mechanical linear drive unit, wherein the drive unit is arranged to compress or expand the second bellows for actuating the first bellows.

5. Substrate exposure system according to claim 4 , wherein the drive unit comprises a motor, preferably a stepper motor.

6. System according to claim 1 , wherein the system comprises at least one sensor for measuring a position of said first part with respect to said second part of said series of the mechanically linked components or a change in position of the first part of said series of mechanically linked components with respect to the second part of said series of mechanically linked components.

7. System according to claim 6 , wherein the sensor is a capacitive sensor.

8. Substrate exposure system according to claim 1 , wherein the exposure apparatus is moveably connected to the frame by means of at least one spring element.

9. System according to claim 8 , wherein the first part of said series of mechanically linked components comprises said spring element.

10. Substrate exposure system according to claim 8 , wherein the hydraulic actuator is arranged between the frame and said spring element.

11. System according to claim 10 , wherein the system comprises at least one sensor, wherein the sensor is arranged for measuring a position of said first part with respect to said second part of said series of the mechanically linked components or a change in position of the exposure apparatus with respect to the second part of said series of mechanically linked components,
preferably wherein the sensor is arranged for measuring a position of exposure apparatus with respect to a frame segment which is part of the second part of said series of mechanically linked components or a change in position of the exposure apparatus with respect to a frame segment which is part of the second part of said series of mechanically linked components.

12. System according to claim 11 , wherein the sensor is arranged for measuring a vertical position of said first part with respect to said second part of said series of the mechanically linked components or a change in a vertical position of the exposure apparatus relative to the second part of said series of mechanically linked components.

13. Substrate exposure system according to claim 8 , wherein the hydraulic actuator is arranged between the frame and the substrate support module.

14. System according to claim 13 , wherein the system comprises at least one sensor, wherein the sensor is arranged for measuring a position of said first part with respect to said second part of said series of the mechanically linked components or a change in position of the substrate support module with respect to the first part of said series of mechanically linked components,
preferably wherein the sensor is arranged for measuring a position of said substrate support module with respect to a frame segment which is part of the first part of said series of mechanically linked components or a change in position of the substrate support module with respect to a frame segment which is part of the first part of said series of mechanically linked components.

15. System according to claim 14 , wherein the sensor is arranged for measuring a vertical position or a change in a vertical position of the substrate support module with respect to the first part of said series of mechanically linked components.

16. Substrate exposure system according to claim 1 , wherein hydraulic actuator is arranged for moving the exposure apparatus with respect to the substrate support module, preferably for moving the exposure apparatus with respect to the substrate support module in a substantially vertical direction.

17. Substrate exposure system according to claim 16 , wherein the hydraulic actuator comprises an end stop, preferably an internal end stop.

18. Substrate exposure system according to claim 1 , further comprising a housing, wherein the exposure apparatus and the substrate support module are at least partially arranged inside said housing, wherein the hydraulic actuator is arranged inside said housing and the hydraulic generator is arranged outside said housing.

19. Substrate exposure system according to claim 18 , wherein the housing comprises a wall, and wherein the conduit passes through said wall.

20. Substrate exposure system according to claim 18 , wherein said housing is arranged to function as a vacuum chamber, wherein the housing is coupled to a vacuum pump for, in use, creating a vacuum or a reduced pressure inside said housing, preferably wherein the hydraulic actuator is vacuum compatible.

21. Substrate exposure system according to claim 1 , wherein the frame comprises a bottom wall, side walls and an upper wall, wherein the substrate support module is arranged on said bottom wall, and wherein the exposure apparatus is connected to one or more of the side walls or to the upper wall, preferably wherein the bottom wall, side walls and upper wall of said frame are arranged to form a box or part of a box, preferably a substantially rectangular box or part of a rectangular box.

22. Substrate exposure system according to claim 21 , wherein the conduit passes through one of said bottom wall, side walls and upper wall of said box.

23. Substrate exposure system according to claim 21 , wherein the box is arranged inside a housing, and wherein at least one of said bottom wall, side walls and upper wall of said box is provided with an array of through openings.

24. Substrate exposure system according to claim 21 , wherein at least one of said bottom wall, side walls and upper wall is provided with a shielding layer for at least partially shielding a space inside said frame from external magnetic fields, wherein said shielding laye

Assignees

• Mapper Lithography Ip Bv

Inventors

• Peijster Jerry Johannes Martinus

Classifications

• H01J37/023

  Means for mechanically adjusting components not otherwise provided for · CPC title

• H01J2237/0216

  Means for avoiding or correcting vibration effects · CPC title

• G03F7/70833

  Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground · CPC title

• H01J37/3174

  Particle-beam lithography, e.g. electron beam lithography · CPC title

• H01J37/20

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title