Submicron wafer alignment

US10048473B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10048473-B2
Application numberUS-201615188717-A
CountryUS
Kind codeB2
Filing dateJun 21, 2016
Priority dateAug 6, 2015
Publication dateAug 14, 2018
Grant dateAug 14, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Certain aspects relate to systems and techniques for submicron alignment in wafer optics. One disclosed method of alignment between wafers to produce an integrated lens stack employs a beam splitter (that is, a 50% transparent mirror) that reflects the alignment mark of the top wafer when the microscope objective is focused on the alignment mark of the bottom wafer. Another disclosed method of alignment between wafers to produce an integrated lens stack implements complementary patterns that can produce a Moiré effect when misaligned in order to aid in visually determining proper alignment between the wafers. In some embodiments, the methods can be combined to increase precision.

First claim

Opening claim text (preview).

What is claimed is: 1. An optical wafer stack comprising: a first transparent wafer comprising a first array of lenses; a second transparent wafer comprising a second array of lenses, each lens of the second array of lenses forming a lens pair with a corresponding one of the first array of lenses; a first spacer wafer positioned between the first transparent wafer and the second transparent wafer and comprising a spacer material including an array of openings, at least one lens of each lens pair extending into an opening of the array of openings; a first alignment mark provided on the first transparent wafer, the first alignment mark comprising a first set of repeating marks positioned around a first lens of the first array of lenses; and a second alignment mark provided on the second transparent wafer, the second alignment mark comprising a second set of repeating marks complementary to the first set of repeating marks and positioned around a second lens of the second array of lenses, the first lens and the second lens forming one lens pair. 2. The optical wafer stack of claim 1 , wherein the first set of repeating marks comprises a first set of concentric annuli and the second set of repeating marks comprises a second set of concentric annuli. 3. The optical wafer stack of claim 2 , wherein, when the first alignment mark is aligned with the second alignment mark, the first and second sets of concentric annuli form a continuous circular shape when viewed from a top-down perspective orthogonal to a surface of the first transparent wafer. 4. The optical wafer stack of claim 1 , wherein the first lens, the second lens, and a portion of the spacer material around an opening of the array of openings form a lens stack having an optical axis. 5. The optical wafer stack of claim 4 , wherein, when the first alignment mark is aligned with the second alignment mark from a top-down perspective, a center of the first lens and a center of the second lens align with the optical axis of the lens stack within a tolerance of 2 microns. 6. The optical wafer stack of claim 4 , further comprising a beam splitter layer provided at an optical center point between a first plane of the first alignment mark and a second plane of the second alignment mark. 7. The optical wafer stack of claim 6 , wherein, when the first alignment mark is aligned with the second alignment mark from a top-down perspective, a center of the first lens and a center of the second lens align with the optical axis of the lens stack within a tolerance of 250 nm. 8. The optical wafer stack of claim 1 , wherein the first set of repeating marks and the second set of repeating marks comprise concentric annuli having a line thickness of 5 μm. 9. The optical wafer stack of claim 1 , further comprising: a third transparent wafer including a third array of lenses; a second spacer wafer positioned between the second transparent wafer and the third transparent wafer and comprising the spacer material including an array of openings; and a third alignment mark provided on the third transparent wafer, the third alignment mark comprising a third set of repeating marks complementary to the first and second sets of repeating marks and positioned around a third lens of the third array of lenses, the third lens forming an optical stack with the first lens and the second lens. 10. The optical wafer stack of claim 1 , further comprising: a third transparent wafer including a third array of lenses; a second spacer wafer positioned between the second transparent wafer and the third transparent wafer and comprising the spacer material including an array of openings; a third alignment mark provided on the third transparent wafer, the third alignment mark comprising a third set of repeating marks positioned around a third lens of the third array of lenses, the third lens forming a pair with a fourth lens of the second array of lenses; a fourth alignment mark provided on the second transparent wafer, the fourth alignment mark comprising a fourth set of repeating marks complementary to the third set of repeating marks and positioned around the fourth lens.

Assignees

Inventors

Classifications

  • using partially transparent surfaces without spectral selectivity (G02B27/147 takes precedence) · CPC title

  • Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems · CPC title

  • Transparent · CPC title

  • Fiducial marks and measuring scales within the optical system · CPC title

  • characterized by manufacturing or alignment methods · CPC title

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Frequently asked questions

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What does patent US10048473B2 cover?
Certain aspects relate to systems and techniques for submicron alignment in wafer optics. One disclosed method of alignment between wafers to produce an integrated lens stack employs a beam splitter (that is, a 50% transparent mirror) that reflects the alignment mark of the top wafer when the microscope objective is focused on the alignment mark of the bottom wafer. Another disclosed method of …
Who is the assignee on this patent?
Qualcomm Inc
What technology area does this patent fall under?
Primary CPC classification G02B13/0085. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 14 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).