Quantum dot color filter substrate and manufacturing method thereof

US10048412B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10048412-B2
Application numberUS-201514915890-A
CountryUS
Kind codeB2
Filing dateDec 28, 2015
Priority dateNov 13, 2015
Publication dateAug 14, 2018
Grant dateAug 14, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The invention discloses a QD CF substrate and manufacturing method thereof. The manufacturing method uses high power UV light irradiation on the QD material in the QD gel for prolonged period of time to perform selective quenching to obtain a selectively quenched QD layer, i.e., patterning the QD layer without etching process, achieve simplifying the QD CF substrate manufacturing process and reduce production cost. The QD CF substrate uses selectively quenched QD layer obtain by UV light irradiation technology to achieve improve the color gamut of display as well as simplifying manufacturing process. Moreover, the QD layer comprises no blue QD material, but uses blue backlight and organic transparent photo-resist layer to improve light utilization efficiency as well as reduce material cost.

First claim

Opening claim text (preview).

What is claimed is: 1. A manufacturing method for quantum dot (QD) color filter (CF) substrate, which comprises: Step 1 : providing a substrate, the substrate comprising: red sub-pixel areas, green sub-pixel areas, and blue sub-pixel areas; Step 2 : forming a patterned red color-resist layer and a green color-resist layer, and an organic transparent color-resist layer respectively on the corresponding red sub-pixel areas, green sub-pixel areas, and blue sub-pixel areas of the substrate to obtain a CF layer comprising a red color-resist layer, a green color-resist layer and an organic transparent layer; Step 3 : coating a layer of QD gel on the CF substrate, and curing the QD gel; the QD gel being a heat-curing gel comprising therein a red QD material and a green QD material; and Step 4 : providing a mask, the mask comprising an opaque portion corresponding to the red and green sub-pixel areas, and a transparent portion corresponding to the blue sub-pixel areas; using ultraviolet (UV) light to perform irradiation on the portion of the mask corresponding to blue sub-pixel areas for 3-40 hours, so that the irreversible fluorescence quenching occurring for the QD material in the QD gel located on the blue sub-pixel areas under long time UV light irradiation, and the QD material in the QD gel located on red sub-pixel areas and green sub-pixel areas not affected by the UV light due to shielding from the mask, thus, obtaining a selectively quenched QD layer; so as to obtain a QD CF film comprising the substrate, the CF film, and the QD layer; the QD layer comprising: a first QD layer located on the red sub-pixel areas and green sub-pixel areas, and a second QD layer located on the blue sub-pixel areas; the red QD material and the green QD material in the first QD layer emitting red and green light respectively under the excitement by blue light; and the QD material in the second QD layer not emitting light when excited. 2. The manufacturing method for QD CF substrate as claimed in claim 1 , wherein in Step 3 , the coating thickness of the QD gel on the CF layer is 0.5-20 um. 3. The manufacturing method for QD CF substrate as claimed in claim 1 , wherein the QD material in the QD gel is one or more of the II-VI group QD material and I-III-VI group QD material. 4. The manufacturing method for QD CF substrate as claimed in claim 3 , wherein the QD material in the QD gel is one or more of ZnCdSe 2 , CdSe, CdTe, CuInS 2 , and ZnCuInS 3 . 5. The manufacturing method for QD CF substrate as claimed in claim 1 , wherein the QD CF substrate is used to a display using blue backlight. 6. A quantum dot (QD) color filter (CF) substrate, which comprises: a substrate, a CF layer disposed on the substrate, and a QD layer disposed on the CF layer; the substrate comprising: red sub-pixel areas, green sub-pixel areas, and blue sub-pixel areas; the CF layer comprising a red color-resist layer, a green color-resist layer and an organic transparent layer disposed respectively on the corresponding red sub-pixel areas, green sub-pixel areas, and blue sub-pixel areas; the QD layer comprising: a first QD layer located on the red sub-pixel areas and green sub-pixel areas, and a second QD layer located on the blue sub-pixel areas; the QD layer being formed by QD gel, and the QD gel being obtained by mixing and curing a gel with a red QD material and a green QD material; the red QD material and the green QD material in the first QD layer emitting red and green light respectively under the excitement by blue light; irreversible fluorescence quenching occurring for the QD material in the second QD layer under long time UV light irradiation for 3-40 hours, and the QD material in the second QD layer not emitting light when excited; the QD CF substrate being used to a display using blue backlight. 7. The QD CF substrate as claimed in claim 6 , wherein the display is an liquid crystal display (LCD), an organic light-emitting diode (OLED) display, or a quantum dot light-emitting diode (QLED) display. 8. The QD CF substrate as claimed in claim 6 , wherein the thickness of the QD layer is 0.5-20 um. 9. The QD CF substrate as claimed in claim 6 , wherein the QD material in the QD gel is one or more of the II-VI group QD material I-III-VI and group QD material. 10. The QD CF substrate as claimed in claim 9 , wherein the QD material in the QD gel is one or more of ZnCdSe 2 , CdSe, CdTe, CuInS 2 , and ZnCuInS 3 . 11. A quantum dot (QD) color filter (CF) substrate, which comprises: a substrate, a CF layer disposed on the substrate, and a QD layer disposed on the CF layer; the substrate comprising: red sub-pixel areas, green sub-pixel areas, and blue sub-pixel areas; the CF layer comprising a red color-resist layer, a green color-resist layer and an organic transparent layer disposed respectively on the corresponding red sub-pixel areas, green sub-pixel areas, and blue sub-pixel areas; the QD layer comprising: a first QD layer located on the red sub-pixel areas and green sub-pixel areas, and a second QD layer located on the blue sub-pixel areas; the QD layer being formed by QD gel, and the QD gel being obtained by mixing and curing a gel with a red QD material and a green QD material; the red QD material and the green QD material in the first QD layer emitting red and green light respectively under the excitement by blue light; irreversible fluorescence quenching occurring for the QD material in the second QD layer under long time UV light irradiation for 3-40 hours, and the QD material in the second QD layer not emitting light when excited; the QD CF substrate being used to a display using blue backlight; wherein the display is an liquid crystal display (LCD), an organic light-emitting diode (OLED) display, or a quantum dot light-emitting diode (QLED) display; wherein the thickness of the QD layer is 0.5-20 um; wherein the QD material in the QD gel is one or more of the II-VI group QD material and I-III-VI group QD material; wherein the QD material in the QD gel is one or more of ZnCdSe 2 , CdSe, CdTe, CuInS 2 , and ZnCuInS 3 .

Assignees

Inventors

Classifications

  • Colour filters · CPC title

  • comprising particles embedded in a solid matrix · CPC title

  • providing coloured light (G02F1/133617, G02F1/133533 take precedence) · CPC title

  • Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

  • Filters, e.g. additive colour filters; Components for display devices · CPC title

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What does patent US10048412B2 cover?
The invention discloses a QD CF substrate and manufacturing method thereof. The manufacturing method uses high power UV light irradiation on the QD material in the QD gel for prolonged period of time to perform selective quenching to obtain a selectively quenched QD layer, i.e., patterning the QD layer without etching process, achieve simplifying the QD CF substrate manufacturing process and re…
Who is the assignee on this patent?
Shenzhen China Star Optoelect, Sehnzhen China Star Optoelectronics Tech Co Ltd
What technology area does this patent fall under?
Primary CPC classification G02F1/133512. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 14 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).