Microelectromechanical microphone having a stationary inner region

US10045126B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10045126-B2
Application numberUS-201514962182-A
CountryUS
Kind codeB2
Filing dateDec 8, 2015
Priority dateJul 7, 2015
Publication dateAug 7, 2018
Grant dateAug 7, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A microelectromechanical microphone has a stationary region or another type of mechanically supported region that can mitigate or avoid mechanical instabilities in the microelectromechanical microphone. The stationary region can be formed in a diaphragm of the microelectromechanical microphone by rigidly attaching, via a rigid dielectric member, an inner portion of the diaphragm to a backplate of the microelectromechanical microphone. The rigid dielectric member can extend between the backplate and the diaphragm. In certain embodiments, the dielectric member can be hollow, forming a shell that is centrosymmetric or has another type of symmetry. In other embodiments, the dielectric member can define a core-shell structure, where an outer shell of a first dielectric material defines an inner opening filled with a second dielectric material. Multiple dielectric members can rigidly attach the diaphragm to the backplate. An extended dielectric member can rigidly attach a non-planar diaphragm to a backplate.

First claim

Opening claim text (preview).

What is claimed is: 1. A microelectromechanical microphone, comprising: a stationary plate comprising multiple openings; and a movable plate comprising an outer portion and an inner opening that is substantially centered at a geometric center of the movable plate, wherein the movable plate is rigidly attached, via a hollow dielectric member comprising a circular region corresponding to the inner opening and extending from a first surface of the stationary plate to a second surface of the movable plate, to the stationary plate in a vicinity of the inner opening to facilitate a reduction in buckling instability, wherein the hollow dielectric member comprises a substantially centrosymmetric shell comprising a thickness and comprising a dielectric cross-section, and wherein a ratio between a width of the dielectric cross-section and the thickness is in a range from about 3 to about 300. 2. The microelectromechanical microphone of claim 1 , wherein the stationary plate comprises silicon, and wherein the movable plate comprises silicon. 3. The microelectromechanical microphone of claim 1 , wherein each of the thickness and the width of the dielectric cross-section of the substantially centrosymmetric shell is based at least on a first material that forms the movable plate and a second material that forms the hollow dielectric member. 4. The microelectromechanical microphone of claim 1 , wherein the outer portion comprises a first cross-section, and wherein the opening comprises a second cross-section. 5. The microelectromechanical microphone of claim 4 , wherein the first cross-section is one of a first octagonal cross-section or a first circular cross-section, and wherein the second cross-section is one of a second octagonal cross-section or a second circular cross-section. 6. The microelectromechanical microphone of claim 5 , wherein the ratio is a first ratio, and wherein a second ratio between a first radius of the first circular cross-section and a second radius of the second circular cross-section ranges from about 2 to about 10. 7. The microelectromechanical microphone of claim 1 , wherein the dielectric cross-section comprises one of a circular cross-section, an oval cross-section, a square cross-section, a pentagonal cross-section, a hexagonal cross-section, a heptagonal cross-section, an octagonal cross-section, or a decagonal cross-section. 8. The microelectromechanical microphone of claim 1 , wherein the dielectric cross-section comprises one of a first cross-section comprising a polygonal perimeter or a second cross-section comprising a non-polygonal perimeter. 9. The microelectromechanical microphone of claim 1 , wherein the hollow dielectric member is a first dielectric member, wherein the movable plate is mechanically coupled to a layer proximate to the outer portion, and wherein a second dielectric member is attached to the stationary plate and overlays the layer. 10. The microelectromechanical microphone of claim 1 , wherein the hollow dielectric member is a first dielectric member, wherein the movable plate is mechanically coupled to a layer proximate to the outer portion, and wherein the layer overlays a second dielectric member that is attached to the stationary plate. 11. The microelectromechanical microphone of claim 10 , wherein the outer portion forms an interface with the layer. 12. The microelectromechanical microphone of claim 10 , wherein the outer portion is flexibly coupled to the layer. 13. The microelectromechanical microphone of claim 1 , wherein the stationary plate comprises one of amorphous silicon; polycrystalline silicon; crystalline silicon; germanium; an alloy of silicon and germanium; a compound containing silicon, germanium, and oxygen; a III-V semiconductor; a II-VI semiconductor; a dielectric material; or a combination of two or more of the foregoing. 14. The microelectromechanical microphone of claim 1 , wherein the movable plate comprises one of amorphous silicon; polycrystalline silicon; crystalline silicon; germanium; an alloy of silicon and germanium; a compound containing silicon, germanium, and oxygen; a III-V semiconductor; a II-VI semiconductor; a dielectric material; or a combination of two or more of the foregoing. 15. The microelectromechanical microphone of claim 1 , wherein the hollow dielectric member comprises one of silicon dioxide or silicon nitride. 16. A microelectromechanical microphone, comprising: a stationary plate comprising multiple openings; and a movable plate comprising an outer portion and an inner opening substantially centered at a geometric center of the movable plate, wherein the movable plate is mechanically coupled to the stationary plate via hollow dielectric members extending from a first surface of the stationary plate to a second surface of the movable plate in a vicinity of a geometrical center of the movable plate to facilitate a reduction in buckling instability, wherein the hollow dielectric members comprise respective substantially centrosymmetric shells, wherein a hollow dielectric member of the hollow dielectric members comprises a thickness and a cross-section, and wherein a ratio between a width of the cross-section and the thickness is in a range from about 3 to about 300. 17. The microelectromechanical microphone of claim 16 , wherein the outer portion comprises a circular cross-section, and wherein the hollow dielectric members are disposed in a circular arrangement. 18. The microelectromechanical microphone of claim 16 , wherein the thickness is based at least on a first material that forms the movable plate and a second material that forms the hollow dielectric member. 19. A microelectromechanical microphone, comprising: a stationary plate comprising multiple openings; and a movable plate rigidly attached to the stationary plate via a hollow dielectric member extending from a surface of the stationary plate to a surface of the movable plate in a vicinity of a geometric center of the movable plate to facilitate a reduction in collapse of an outer portion of the movable plate, wherein the hollow dielectric member comprises a core-shell structure comprising a shell of a dielectric material and a hollow core that is bounded by the shell, and wherein a ratio between a width of a cross-section of the hollow core and a thickness of the dielectric material is in a range from about 3 to about 300. 20. The microelectromechanical microphone of claim 19 , wherein the shell of the dielectric material is substantially centrosymmetric. 21. The microelectromechanical microphone of claim 20 , wherein the width is a first width, wherein the cross-section is a first cross section, wherein the movable plate comprises an outer portion having a second cross-section, and wherein a ratio between a second width of the second cross-section and the first width of the cross-section is less than about 10. 22. The microelectromechanical microphone of claim 20 , wherein each of the thickness of the dielectric material and the width of the cross-section of the core-shell structure is based at least on a first material that forms the movable plate and a second material that forms the hollow dielectric member. 23. A device, comprising: a microelectromechanical microphone comprising a substrate comprising a first opening configured to receive an acoustic wave, a stationary plate mechanically coupled to the substrate and comprising multiple openings, and a movable plate comprising an outer portion and a second op

Assignees

Inventors

Classifications

  • Structural association of microphone with electric circuitry therefor (in electric hearing aids H04R25/00) · CPC title

  • using semiconductor materials · CPC title

  • Microphones (H04R19/01 takes precedence) · CPC title

  • Tensioning by means acting directly on free portions of diaphragm or cone · CPC title

  • H04R7/20Primary

    Securing diaphragm or cone resiliently to support by flexible material, springs, cords, or strands · CPC title

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What does patent US10045126B2 cover?
A microelectromechanical microphone has a stationary region or another type of mechanically supported region that can mitigate or avoid mechanical instabilities in the microelectromechanical microphone. The stationary region can be formed in a diaphragm of the microelectromechanical microphone by rigidly attaching, via a rigid dielectric member, an inner portion of the diaphragm to a backplate …
Who is the assignee on this patent?
Invensense Inc
What technology area does this patent fall under?
Primary CPC classification H04R7/20. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 07 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).